Flat Panel Display Substrates

1994 ◽  
Vol 345 ◽  
Author(s):  
Dawne M. Moffatt
Keyword(s):  
Thermal Expansion ◽  
Glass Substrate ◽  
Substrate Material ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Active Matrix ◽  
Thermal Expansion Coefficients ◽  
Field Emission Displays ◽  
Temperature Capability ◽  
Higher Temperature

AbstractThe performance of advanced flat panel displays is intrinsically linked to critical properties of the substrate material. In the manufacture of active-matrix liquid crystal displays (AMLCDs) and some emissive displays, there are certain process steps that require extreme conditions such as strong chemical washes and temperatures in excess of 600°C. As a result, the glass substrate used in these displays must be able to withstand these environments without degradation of its properties. It has become apparent that the flat panel display (FPD) manufacturers will benefit from substrates with improved acid durability, higher temperature capability, and thermal expansion coefficients consistent with other display materials.This paper focuses on one of the less-understood features of the glass substrate: the expansion characteristics as a function of temperature. Thermal expansion is important as it affects the compatibility of the glass with display materials, which, in the case of AMLCDs and some silicon-microtip field emission displays (FED), require an expansion close to that of silicon. In addition, thermal breakage during processing is directly proportional to the expansion coefficient.This study focused on the thermal expansion characteristics of two different FPD substrate glasses. The first one is code 7059, manufactured by Corning Incorporated and currently the standard in AMLCDs. A new substrate composition, Corning code 1737, with enhanced durability, temperature capability, and expansion tuned to the AMLCD applications will also be discussed.

73.2: A Novel TFT Pixel and Driving Scheme of Electrically- Suppressed-Helix FLC for Active Matrix Flat Panel Display

2015 ◽  
Vol 46 (1) ◽  
pp. 1077-1080 ◽  
Author(s):  
Tsz Kin Ho ◽  
Man Chun Tseng ◽  
Abhishek Srivastava ◽  
Wei Zhou ◽  
Lei Lei ◽  
...  
Keyword(s):  
Flat Panel Display ◽  
Flat Panel ◽  
Active Matrix

Properties of Glass Substrates for Poly-Si Amlcd Technology

1995 ◽  
Vol 377 ◽  
Author(s):  
Dawne M. Moffatt
Keyword(s):  
Thermal Expansion ◽  
Thermal Expansion Coefficient ◽  
Expansion Coefficient ◽  
Liquid Crystal Display ◽  
Thin Film Transistor ◽  
Thermal Shrinkage ◽  
Silicon Thin Film ◽  
Active Matrix ◽  
Glass Substrates ◽  
Temperature Capability

ABSTRACTA major force for change in substrate requirements in the late 90's may well be the commercialization of poly-silicon thin film transistor (TFT) Active Matrix Liquid Crystal Display (AMLCDs) technology. The processes necessary for “poly-Si” occur at temperatures that are 150–300°C higher than the current amorphous-Si LCD processes. This impacts the thermal shrinkage and thermal gravimetric warp requirements of the glass, particularly as display resolutions tighten, as enabled by poly-Si. In addition, the expected integration of more components (e.g. chip-on-glass) impacts the requirements for the thermal expansion of the substrate.One approach for meeting the poly-Si demands for greater thermal-dimensional stability is to use glasses with higher temperature capability. A new glass, Code 1737, with the highest strain point commercially available at over 660°C, now enables poly-Si processing with acceptable sag and shrinkage after annealing. A logical goal for the next significant glass advancement would be to eliminate annealing altogether, but it is unclear what temperature capability is required. In this study, various glasses with strain points ranging from 600–800°C have been evaluated in terms of their density, thermal expansion, and thermal shrinkage following poly-Si thermal process simulations. It has been confirmed that the magnitude of shrinkage decreases with increasing strain point for glasses in this compositional family. In addition, future new insight into the effect of thermal expansion coefficient has been developed; the lower the thermal expansion coefficient (for a given strain point), the lower the magnitude of the shrinkage for a given strain point and high temperature thermal cycle. This is important new learning in the area of substrates for flat panel displays that will help in further design and development of glasses for future AMLCDs.

Materials Used in Electroluminescent Displays

MRS Bulletin ◽  
1996 ◽  
Vol 21 (3) ◽  
pp. 49-58 ◽  
Author(s):  
P.D. Rack ◽  
A. Naman ◽  
P.H. Holloway ◽  
S-S. Sun ◽  
R.T. Tuenge
Keyword(s):  
Thin Film ◽  
Solid State ◽  
Liquid Crystal Display ◽  
Light Sources ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Luminance Change ◽  
Active Matrix ◽  
Human Interface ◽  
Improved Performance

The flat-panel-display (FPD) market is experiencing rapid growth due to increased demand for portable computers, communication equipment, and consumer electronic products. In all of these applications, the display is the primary human interface that conveys information. The size of the flat-panel-display market is presently estimated to be $10 billion/year and is projected to grow to over $18 billion/year by 1998. Although most current FPDs utilize either passive- or active-matrix liquid-crystal-display (LCD) technology, electroluminescent (EL) displays and light sources, because of their solid-state construction and self-emissive characteristics, can provide improved performance for many demanding display applications. Thin-film electroluminescent (TFEL) technology has been demonstrated over a broad range of display sizes from 1-in. to 18-in. diagonal with resolutions from 50 to 1,000 lines per inch. Also, because of its unique solid-state characteristic, TFEL technology is well-suited to provide a fully integrated display with the light-emitting element and electronics fabricated on the same substrate. An example of a full-color TFEL display is shown in Figure 1.Thin-film electroluminescent display panels are finding increasing applications in the FPD marketplace due to several fundamental performance advantages over LCDs. These include wide viewing angle, high contrast, wide operating-temperature range, ruggedness, and long lifetime. Alternating-current (ac)-driven monochrome TFEL displays (ACTFEL displays) have become the most reliable, longest running devices on the market. Commercial ACTFEL display panels have operated for more than 50,000 hours with less than 10% luminance change, the equivalent of 25 working years.

P‐40: Glass substrate charging in flat panel display manufacturing

2020 ◽  
Vol 51 (1) ◽  
pp. 1498-1501
Author(s):  
Robert G. Manley ◽  
Nicholas J. Smith ◽  
Nikolay Zhelev ◽  
Indrani Bhattacharyya ◽  
Dean Thelen ◽  
...  
Keyword(s):  
Glass Substrate ◽  
Flat Panel Display ◽  
Flat Panel

Performing Accurate Cathodoluminescence Measurements of Phosphor Powders and Screens

1999 ◽  
Vol 560 ◽  
Author(s):  
L. E. Shea ◽  
R. J. Walko
Keyword(s):  
Vacuum Chamber ◽  
Detection System ◽  
Preliminary Evaluation ◽  
Display Device ◽  
Flat Panel Display ◽  
Flat Panel ◽  
Electron Collection ◽  
Field Emission Displays ◽  
Improved Accuracy ◽  
Optical Detection System

ABSTRACTIn the field of display phosphors, the efficiency of the cathodoluminescence process is a characteristic that is often used to assess the potential of a phosphor for use in flat-panel display applications such as field emission displays (FEDs). Cathodoluminescence characterization in a demountable vacuum chamber is important for preliminary evaluation and lifetesting of phosphor powders and screens prior to incorporation into an actual display device. There are many experimental factors that influence accurate measurement and calculation of the cathodoluminescence efficiency. These include electron beam profile (uniform, Gaussian), current density, electron accelerating voltage, secondary electron collection, and optical detection system. This paper will present some methods for achieving improved accuracy of cathodoluminescence measurements in systems at Sandia National Laboratories, using Y2O3:Eu as a representative phosphor.

scholarly journals To the Question of the Reasons for Decrease in the Durability of Cutting Tools with a Diamond-Like Coating

2021 ◽  
Vol 346 ◽  
pp. 01008
Author(s):  
Yacov Lieberman ◽  
Svetlana Lukinskikh ◽  
Ksenia Kulpina ◽  
Yana Sarvarova
Keyword(s):  
Thermal Expansion ◽  
Carbon Coating ◽  
Cutting Tools ◽  
Substrate Material ◽  
Theory Of Elasticity ◽  
Special Technique ◽  
Diamond Like Carbon ◽  
Thermal Expansion Coefficients ◽  
End Mills ◽  
Expansion Coefficients

In this study, we investigate the reasons for the decrease in the durability of cutting tools with diamond-like carbon coating. We formulated a previously unexplored assumption that the destruction of the coating may occur due to the dissimilarity of the thermal expansion coefficients of the latter and the substrate material. To verify this assumption, we developed a special technique based on the theory of elasticity and carried out a study of several end mills and turning tools made of different materials. The results of our research confirm the validity of the hypothesis. We further propose methods of combating the discovered reason for the decrease in tool life.

The Growth of Optical Quality LiNbo3 Thin Films On Sapphire and LiTao3 Substrates Using Solid-Source Mocvd

1995 ◽  
Vol 392 ◽  
Author(s):  
S. Y. Lee ◽  
R. K. Route ◽  
R. S. Feigelson
Keyword(s):  
Thin Films ◽  
Thermal Expansion ◽  
Lithium Niobate ◽  
Growth Conditions ◽  
Substrate Material ◽  
Optical Quality ◽  
Epitaxial Thin Films ◽  
Lattice Constants ◽  
Thermal Expansion Coefficients ◽  
Optical Waveguiding

AbstractHigh quality lithium niobate (LiNbO3) epitaxial thin films have been grown on c-plane sapphire and LiTaO3 substrates by solid-source MOCVD using the tetramethyl-heptanedionate sources, Li(thd) and Nb(thd)4. Phase content was controllable, and stoichiometric films were reproducibly deposited over a broad temperature range from a Li(thd)-rich source. Using sapphire substrates, with which the occurrence of multiple in-plane orientations is typically a problem, LiNbO3 films with only one in-plane orientation could be prepared within a narrow range of growth conditions. XRD rocking curve FWHM values as low as 0.04°, and optical waveguiding losses near 2dB/cm (1200Å thick film, TMo mode, 632.8nm) were obtained. However, film thicknesses on sapphire were limited to 2000Å because of cracking caused by the large thermal expansion mismatch, and in such thin films, optical confinement is poor.In contrast, LiTaO3 has almost same lattice constants and thermal expansion coefficients as LiNbO3, making it a potentially superior substrate material. Lithium niobate films up to 6000Å were successfully deposited on LiTaO3 substrates without cracking. Film quality was greatly improved, with FWHM values as low as 0.01°, and rms surface roughness less than 10 Å. Preliminary optical waveguiding losses less than 6 dB/cm for the TEo mode have been achieved.

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