The Effects of Cross Hatch Angle (CHA) on Magnetic Properties and Read/Write Characteristics of CoCrPtTaB Thin Film Media

1994 ◽  
Vol 343 ◽  
Author(s):  
Ga-Lane Chen ◽  
H. Do ◽  
T.-A. Yeh ◽  
J. M. Sivertsen ◽  
J. H. Judy

ABSTRACTCross-hatch type texturing has been widely used to replace circumferential texturing in the thin film media industry for optimizing tribology performance. However, higher “cross hatch angle” (CHA) may degrade magnetic performance. The relationship between texturing cross hatch angle (CHA) and magnetic properties and their effects on the read/write characteristics of sputtered thin film media are discussed in this paper. As the CHA increases, both the orientation ratio (OR) and the squareness ratio “S(c)/S(r)” decrease. The film with the highest OR is located at CHA=90, which has the lowest media noise. The medium has highest signal/noise ratio when CHA is equal to 90. PW50 can decrease as much as 4 nanoseconds as CHA increases to 730. By calculating a ratio of the intensity of Cr (110) + CoCrPtTaB (0002) to the intensity of Cr (200), we are able to correlate the intensity ratio to magnetic properties and read/write characteristics.

2020 ◽  
Vol 855 ◽  
pp. 208-212
Author(s):  
Putri Lailatul Bintari ◽  
Vania Rahmawaty ◽  
Endah Kinarya Palupi ◽  
Nazopatul Patonah ◽  
Irmansyah ◽  
...  

We have grown a SrTiO3 thin film from strontium acetate and titanium isopropoxide using chemical solution deposition (CSD) method using a spin coater, and furnace annealed with a temperature of 850°C for 8 hours. We have assessed the thin-film frequency, magnetic field, and electric charges using LCR meter and light intensities of 0 (dark), 4000, 8000, 12000 lux. From the data of LCR meter, it can be measured and see the relationship between the current and the angular velocity will be decreased. Also, the results of the measurements obtained the relationship between magnetic fields and angular velocity is reduced as well. Therefore, we can be assumed the higher the intensity of light shall lower the magnetic properties.


1992 ◽  
Vol 36 ◽  
pp. 197-202
Author(s):  
Po-Wen Wang

In recent years, the microstructure of Co-based alloy magnetic thin film disks has been studied extensively by using a conventional x-ray diffraction (XRD) technique(1-4). Efforts to understand the relationship between the microstructure and the magnetic properties of disk had been limited due to the lack of depth resolution in the conventional theta-2theta scanning technique. In this paper, a fixed 0.5 degree of grazing incidence(5) 2-theta scan X-ray diffraction (GIXRD) technique was used to characterize the thin film disk microstructure and therefore to correlate with the magnetic properties.


Nanoscale ◽  
2020 ◽  
Vol 12 (17) ◽  
pp. 9481-9494 ◽  
Author(s):  
Matilde Saura-Múzquiz ◽  
Anna Zink Eikeland ◽  
Marian Stingaciu ◽  
Henrik Lyder Andersen ◽  
Cecilia Granados-Miralles ◽  
...  

The relationship between nanoparticle morphology, self-induced atomic/magnetic texture and magnetic properties of high-performance hexaferrite magnets is elucidated using neutron/X-ray pole figure analysis and neutron/synchrotron powder diffraction.


2021 ◽  
Author(s):  
Jhon Enrique Zapata Rivera ◽  
Carmen J. Calzado

This work explores the relationship between the magnetic properties of salts based on the [Ni(dmit)2]− radicals and the different arrangement that these radicals can adopt in the crystals, induced by...


Nano Research ◽  
2021 ◽  
Author(s):  
Emma N. Welbourne ◽  
Tarun Vemulkar ◽  
Russell P. Cowburn

AbstractSynthetic antiferromagnetic (SAF) particles with perpendicular anisotropy display a number of desirable characteristics for applications in biological and other fluid environments. We present an efficient and effective method for the patterning of ultrathin Ruderman-Kittel-Kasuya-Yoshida coupled, perpendicularly magnetised SAFs using a combination of nanosphere lithography and ion milling. A Ge sacrificial layer is utilised, which provides a clean and simple lift-off process, as well as maintaining the key magnetic properties that are beneficial to target applications. We demonstrate that the method is capable of producing a particularly high yield of well-defined, thin film based nanoparticles.


2020 ◽  
Vol 102 (21) ◽  
Author(s):  
Stephan Geprägs ◽  
Björn Erik Skovdal ◽  
Monika Scheufele ◽  
Matthias Opel ◽  
Didier Wermeille ◽  
...  

MRS Advances ◽  
2016 ◽  
Vol 1 (37) ◽  
pp. 2635-2640 ◽  
Author(s):  
Adele Moatti ◽  
Reza Bayati ◽  
Srinivasa Rao Singamaneni ◽  
Jagdish Narayan

ABSTRACTBi-epitaxial VO2 thin films with [011] out-of-plane orientation were integrated with Si(100) substrates through TiO2/TiN buffer layers. At the first step, TiN is grown epitaxially on Si(100), where a cube-on-cube epitaxy is achieved. Then, TiN was oxidized in-situ ending up having epitaxial r-TiO2. Finally, VO2 was deposited on top of TiO2. The alignment across the interfaces was stablished as VO2(011)║TiO2(110)║TiN(100)║Si(100) and VO2(110) /VO2(010)║TiO2(011)║TiN(112)║Si(112). The inter-planar spacing of VO2(010) and TiO2(011) equal to 2.26 and 2.50 Å, respectively. This results in a 9.78% tensile misfit strain in VO2(010) lattice which relaxes through 9/10 alteration domains with a frequency factor of 0.5, according to the domain matching epitaxy paradigm. Also, the inter-planar spacing of VO2(011) and TiO2(011) equals to 3.19 and 2.50 Å, respectively. This results in a 27.6% compressive misfit strain in VO2(011) lattice which relaxes through 3/4 alteration domains with a frequency factor of 0.57. We studied semiconductor to metal transition characteristics of VO2/TiO2/TiN/Si heterostructures and established a correlation between intrinsic defects and magnetic properties.


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