Ag Films Deposited by Ionized Cluster Beam Deposition

1994 ◽  
Vol 343 ◽  
Author(s):  
Zhong-Min Ren ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Xia-Xing Xiong ◽  
Mao-Qi He ◽  
...  
Keyword(s):  
Cluster Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Surface Flatness ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTIonized cluster beam deposition (ICBD) technique has been used to deposit Ag films on both Si(111) and Si(100) substrates. Sizes of clusters in ionized cluster beam are found to distribute in a range of 100–600 atoms/cluster. X-ray diffraction (XRD), and α-step profile methods are used to analyze the properties of Ag films. As a comparison, Ag films deposited by conventional evaporation are also investigated. Highly textured Ag films with strong (111) orientation on Si (111) have been obtained at high accelerating voltage Va=4kV. The crystallinity and surface flatness of Ag films can be improved by ICBD at high accelerating voltages.

Fragmentation of C60 Molecules in Partially Ionized Fullerene Beam Deposition

1994 ◽  
Vol 359 ◽  
Author(s):  
Zhong-Min Ren ◽  
Xia-Xing Xiong ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Liang-Yao Chen ◽  
...  
Keyword(s):  
Raman Spectra ◽  
Amorphous Carbon ◽  
Experimental Results ◽  
Cluster Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Partially Ionized ◽  
Almost All ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTC60 films have been deposited using a partially ionized cluster beam deposition (PIBD) technique. The experimental results show that as Va. exceeds about 400 V almost all the C60 molecules fragmentate at collision with the substrate and the obtained films turn to be amorphous carbon layers at elevated Va, indicated by measurements of Raman spectra, X-ray diffraction, and ellipsometry.

Studies of C60 Films Deposited Using Ionized Cluster Beam Deposition Technique

1994 ◽  
Vol 349 ◽  
Author(s):  
Zhong-Min Ren ◽  
Yuan-Cheng Du ◽  
Zhi-Feng Ying ◽  
Xia-Xing Xiong ◽  
Mao-Qi He ◽  
...  
Keyword(s):  
Raman Spectra ◽  
Photoelectron Spectroscopy ◽  
Carbon Films ◽  
Cluster Beam ◽  
Visible Absorption ◽  
Carbon Allotrope ◽  
X Ray ◽  
Hexagonal Close Packed Structure ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTFilms (with thicknesses about thousands A) of a new form of carbon allotrope, CIO also known as Fullerenes, are deposited on Si(111) substrates using ionized cluster beam deposition (ICBD) technique at low (65V) accelerating voltage V. X-ray &-20 diffraction (XRD) have been used to investigate the structural properties of C6Ofi lms, indicating hexagonal close-packed structure with strong (002) XRD assignment together with weak (100), (112) and(004) assignments. Raman spectra, X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) are carried out to make detailed studies of the electronic properties of the films and to illustrate differences between CO films and amorphous carbon films which are deposited by ICBD at high accelerating voltage V >400V. Cio soccer-balls are found to be broken into fragments as accelerating field overtakes about 400V, indicated by the results of XPS, Raman spectra, XRD, and UV/visible absorption spectra.

Oxidation of nanostructured Ti films produced by low energy cluster beam deposition: An X-ray Photoelectron Spectroscopy characterization

2012 ◽  
Vol 520 (14) ◽  
pp. 4803-4807 ◽  
Author(s):  
Monica de Simone ◽  
Elena Snidero ◽  
Marcello Coreno ◽  
Gero Bongiorno ◽  
Luca Giorgetti ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Low Energy ◽  
Cluster Beam ◽  
X Ray ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Beam Deposition ◽  
Ti Films

Mass selection of neutral clusters in Low‐Energy Cluster Beam Deposition experiments: Is it realistic?

1994 ◽  
Vol 64 (10) ◽  
pp. 1212-1214 ◽  
Author(s):  
J. F. Roux ◽  
B. Cabaud ◽  
G. Fuchs ◽  
D. Guillot ◽  
A. Hoareau ◽  
...  
Keyword(s):  
Low Energy ◽  
Mass Selection ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Selection Of ◽  
Beam Deposition

scholarly journals Flexible and biocompatible microelectrode arrays fabricated by supersonic cluster beam deposition on SU-8

2011 ◽  
Vol 21 (4) ◽  
pp. 045013 ◽  
Author(s):  
Mattia Marelli ◽  
Giorgio Divitini ◽  
Cristian Collini ◽  
Luca Ravagnan ◽  
Gabriele Corbelli ◽  
...  
Keyword(s):  
Microelectrode Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Ionized-Cluster Beam Deposition

1975 ◽  
pp. 341-346 ◽  
Author(s):  
T. Takagi ◽  
I. Yamada ◽  
K. Yanagawa
Keyword(s):  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Gas Sensor Arrays by Supersonic Cluster Beam Deposition

2019 ◽  
pp. 282-284
Author(s):  
E. Barborini ◽  
M. Leccardi ◽  
G. Bertolini ◽  
O. Rorato ◽  
M. Franchi ◽  
...  
Keyword(s):  
Gas Sensor ◽  
Sensor Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition ◽  
Gas Sensor Arrays
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