Ohmic Contacts To p+-GaAs and Al0.26Ga0.74As
Keyword(s):
ABSTRACTOhmic contacts, with metallization scheme of Pd/Ge/Ti/Pt, were formed on heavily carbon doped GaAs and AlxGa1-xAs. The lowest specific contact resistances were 4.7x10-7 and 8.9x 10-6 Ω-cm2 for the p+-GaAs and Al0.26Ga0.74As. The p+-GaAs and Al0.26Ga0.74As were doped with carbon to 5x1019 and 2x1019 cm-3 respectively. Interfacial reactions and elemental diffusion of the contacts were investigated via transmission electron microscopy and Auger electron spectrometry with depth profiles.
1989 ◽
pp. 129-135
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1992 ◽
Vol 7
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pp. 2765-2773
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2010 ◽
Vol 237
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pp. 347-351
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