Planarization Ability of Chemical Mechanical Planarization (Cmp) Processes

1994 ◽  
Vol 337 ◽  
Author(s):  
Matt Stell ◽  
Rahul Jairath ◽  
Mukesh Desai ◽  
Robert Tolles
Keyword(s):  
Film Thickness ◽  
Chemical Mechanical Planarization ◽  
Silica Particles ◽  
The Other ◽  
Ph Values ◽  
Enhanced Solubility ◽  
Experimental Approaches ◽  
Thickness Measurements

ABSTRACTMethods for determining planarization ability of CMP were explored. Options included film thickness measurements of the dielectric over metal and field, TIR measurements using profilometry, and a combination of the two. The attempt to observe the in situ change in the topography was addressed in two distinct experimental approaches. The first approach involved processing wafers for predetermined intervals. The other approach processed different wafers for different amounts of time. The effects of down force and platen rpm on planarization ability were studied using the first approach. Results indicate that planarization is more efficient at higher down forces and higher platen rpm. Slurry property effects were examined using the second method. The planarization ability appears to suffer at elevated pH values. This is attributed to both the enhanced solubility of the silica particles and the dielectric itself.

The Effect of Wafer Shape on Slurry Film Thickness and Friction Coefficients in Chemical Mechanical Planarization

2000 ◽  
Vol 613 ◽  
Author(s):  
Joseph Lu ◽  
Jonathan Coppeta ◽  
Chris Rogers ◽  
Vincent P. Manno ◽  
Livia Racz ◽  
...  
Keyword(s):  
Film Thickness ◽  
Drag Force ◽  
Chemical Mechanical Planarization ◽  
Fluid Film ◽  
Ex Situ ◽  
Local Pressure ◽  
Dual Emission ◽  
Polishing Pad ◽  
Fluid Film Thickness

ABSTRACTThe fluid film thickness and drag during chemical-mechanical polishing are largely dependent on the shape of the wafer polished. In this study we use dual emission laser induced fluorescence to measure the film thickness and a strain gage, mounted on the polishing table, to measure the friction force between the wafer and the pad. All measurements are taken during real polishing processes. The trends indicate that with a convex wafer in contact with the polishing pad, the slurry layer increases with increasing platen speed and decreases with increasing downforce. The drag force decreases with increasing platen speed and increases with increasing downforce. These similarities are observed for both in-situ and ex-situ conditioning. However, these trends are significantly different for the case of a concave wafer in contact with the polishing pad. During ex-situ conditioning the trends are similar as with a convex wafer. However, in-situ conditioning decreases the slurry film layer with increasing platen speed, and increases it with increasing downforce in the case of the concave wafer. The drag force increases with increasing platen speed as well as increasing downforce. Since we are continually polishing, the wafer shape does change over the course of each experiment causing a larger error in repeatability than the measurement error itself. Different wafers are used throughout the experiment and the results are consistent with the variance of the wafer shape. Local pressure measurements on the rotating wafer help explain the variances in fluid film thickness and friction during polishing.

Elastohydrodynamie Lubrication of Big-End Bearings Part 2: Ratification

1991 ◽  
Vol 205 (2) ◽  
pp. 107-119 ◽  
Author(s):  
M B Aitken ◽  
H McCallion
Keyword(s):  
Film Thickness ◽  
Close Correlation ◽  
Connecting Rod ◽  
Test Rig ◽  
Collapse Mechanisms ◽  
Minimum Film Thickness ◽  
Inertial Loading ◽  
Film Collapse ◽  
Thickness Measurements

The elastohydrodynamic analysis developed in Part 1 of this work is ratified against previous Ruston and Hornsby big-end studies. Sufficiently close correlation with published in situ film-thickness measurements allows big-end bearing performance to be determined with some confidence; significant new insight was obtained. Elasticity body forces from connecting-rod motion were found to be an integral component of the big-end representation; it is a prevalent misconception that these forces can be neglected from theoretical as well as experimental test-rig works. Film collapse mechanisms, likened to vapour cavitation, were observed in the dynamically loaded elastic bearing; these were not detected in equivalent rigid bearing simulations. Cyclic minimum film thickness was observed during inertial loading, irrespective of gas force loading. Two separate minimum-film conditions were identified: one in the connecting-rod's neck and a second, at higher load, in the rod's cap. The second condition is critical from a design standpoint; significantly thinner films are predicted than by rigid bearing theory.

Refined Models for Hydrodynamic Lubrication in Axisymmetric Stretch Forming

1994 ◽  
Vol 116 (1) ◽  
pp. 101-109 ◽  
Author(s):  
Tze-Chi Hsu ◽  
William R. D. Wilson
Keyword(s):  
Film Thickness ◽  
Hydrodynamic Lubrication ◽  
The Other ◽  
Lubricant Film Thickness ◽  
Stretch Forming ◽  
Sheet Bending ◽  
Membrane Stiffness ◽  
Thickness Measurements ◽  
Sheet Deformation ◽  
Good Agreement

Two mathematical models for axisymmetric stretch forming with a spherical punch are developed. The models combine a finite element representation of the sheet deformation with a hydrodynamic lubrication model. In one model the influence of sheet bending stiffness is taken into account while in the other only the membrane stiffness is considered. Comparison of the predictions of the models with the film thickness measurements of Hector and Wilson indicates that the inclusion of elastic effects is important in predicting lubricant film thickness. The results of the bending model are in particularly good agreement with the experimental data. A useful analytical method for predicting the film thickness at the center of the conjunction at the onset of yield is also developed.

Measurement of Ultrathin Film Mechanical Properties by Integrated Nano-scratch/indentation Approach

2007 ◽  
Vol 1049 ◽  
Author(s):  
Ashraf Bastawros ◽  
Wei Che ◽  
Abhijit Chandra
Keyword(s):  
Mechanical Properties ◽  
Film Thickness ◽  
Chemical Mechanical Planarization ◽  
Apparent Modulus ◽  
Wide Range ◽  
Tangential Forces ◽  
Indentation Experiment ◽  
Planarization Process ◽  
Thickness Measurements ◽  
Thickness Independent

AbstractThe thickness and property measurements of thin films on a substrate are crucial for a wide range of applications. Classical techniques have relied on various physical properties to identify film thickness, independent of its mechanical properties. Here, a new experimental technique is devised to evaluate the film thickness, its stiffness and its flow stress. The technique utilizes the variation of the measured apparent modulus of a ductile film on a substrate from a nano-indentation experiment, in conjunction with the measured normal and tangential forces and the scratch depth in a nano-scratch experiment. These combined measurements are calibrated through a simple statically admissible model to yield the unknown quantities. The measurements reasonably agree with the finite element predictions and are ascertained by XPS film thickness measurements. The technique is applied to study the formed oxide nano-layer during copper chemical mechanical planarization process.

Different Temperature Dependencies of Magnetic Interface and Volume Anisotropies in Gd / W(110)

1995 ◽  
Vol 384 ◽  
Author(s):  
M. Farle ◽  
B. Schulz ◽  
A. Aspelmeier ◽  
G. Andre ◽  
K. Baberschke
Keyword(s):  
Film Thickness ◽  
Magnetic Anisotropy ◽  
Temperature Dependence ◽  
Ferromagnetic Resonance ◽  
Magnetocrystalline Anisotropy ◽  
The Other ◽  
Spin Interaction ◽  
Reduced Temperature ◽  
Thickness Independent

ABSTRACTThe magnetic anisotropy of epitaxial Gd(0001) films on W(110) is determined as a function of temperature (150 to 350 K) and film thickness (9 to 30 monolayers) by in situ ferromagnetic resonance. It is found that the usual analysis in terms of a thickness independent part KV and a thickness dependent contribution 2KS/d must be performed at the same reduced temperature t = T/Tc(d). Kv shows qualitatively the same temperature dependence as the magnetocrystalline anisotropy of bulk Gd. It changes in sign near 0.7 Tc and does not vanish at Tc. KS on the other hand decreases linearly from 1.2 meV/atom at 0.6.Tc to zero at Tc. It appears that the intrinsic origin for Kv and KS is fundamentally different. The vanishing of KS at Tc indicates that two-ion anisotropy (spin-spin interaction) is dominating the interface anisotropy. The non- zero KV(T≥Tc) is likely due to a single ion magnetic anisotropy which is known for bulk Gd.

scholarly journals Efficient One-Step Immobilization of CaLB Lipase over MOF Support NH2-MIL-53(Al)

Catalysts ◽  
2020 ◽  
Vol 10 (8) ◽  
pp. 918
Author(s):  
Victoria Gascón-Pérez ◽  
Mayra Belen Jiménez ◽  
Asunción Molina ◽  
Rosa María Blanco ◽  
Manuel Sánchez-Sánchez
Keyword(s):  
Room Temperature ◽  
Metal Organic Framework ◽  
The Other ◽  
Synthetic Method ◽  
Enzyme Loading ◽  
Synthesis Time ◽  
Ph Values ◽  
Metal Organic ◽  
One Step

Metal-organic framework (MOF) materials possess the widest versatility in structure, composition, and synthesis procedures amongst the known families of materials. On the other hand, the extraordinary affinity between MOFs and enzymes has led to widely investigating these materials as platforms to support these catalytic proteins in recent years. In this work, the MOF material NH2-MIL-53(Al) has been tested as a support to immobilize by one-step methodology (in situ) the enzyme lipase CaLB from Candida antarctica by employing conditions that are compatible with its enzymatic activity (room temperature, aqueous solution, and moderate pH values). Once the nature of the linker deprotonating agent or the synthesis time were optimized, the MOF material resulted in quite efficient entrapping of the lipase CaLB through this in situ approach (>85% of the present enzyme in the synthesis media) while the supported enzyme retained acceptable activity (29% compared to the free enzyme) and had scarce enzyme leaching. The equivalent post-synthetic method led to biocatalysts with lower enzyme loading values. These results make clear that the formation of MOF support in the presence of the enzyme to be immobilized substantially improves the efficiency of the biocatalysts support for retaining the enzyme and limits their leaching.

Quantitative In-Situ Measurement of Asperity Compression During Chemical Mechanical Planarization

2005 ◽  
Author(s):  
Caprice Gray ◽  
Daniel Apone ◽  
Chris Rogers ◽  
Vincent P. Manno ◽  
Chris Barns ◽  
...  
Keyword(s):  
Film Thickness ◽  
Spatial Resolution ◽  
High Spatial Resolution ◽  
Chemical Mechanical Planarization ◽  
Laser Induced Fluorescence ◽  
Calibration Factor ◽  
Dual Emission ◽  
Image Intensity ◽  
Slurry Layer

Modifications to the Dual Emission Laser Induced Fluorescence (DELIF) procedure used to collect images of the slurry layer between the polishing pad and wafer during Chemical Mechanical Planarization (CMP) have provided a means to attain instantaneous, high spatial resolution images of slurry film thickness. Presented here is a technique to determine the calibration factor that correlates image intensity to slurry film thickness. This presentation will discuss how to determine slurry layer shape near wafer features, pad roughness, and pad compressibility.

Capacitive Film Thickness Measurements in a Ventless Aero-Engine Bearing Chamber—Influence of Operating Conditions and Offtake Design

2013 ◽  
Vol 135 (11) ◽  
Author(s):  
Wolfram Kurz ◽  
Klaus Dullenkopf ◽  
Hans-Jörg Bauer
Keyword(s):  
Film Thickness ◽  
Thickness Distribution ◽  
Operating Conditions ◽  
Chamber Pressure ◽  
Shaft Speed ◽  
Suitable Parameter ◽  
Accuracy And Repeatability ◽  
Thickness Measurements ◽  
Engine Bearing

The paper presents results from film thickness measurements in a bearing chamber test rig. The measurements were performed at different operating conditions and with two offtake designs. A discussion of the measurement technique using in situ calibrated capacitive sensors shows good accuracy and repeatability. The film thickness results are first compared to measurements with the same chamber in a vented configuration. The analysis of the measurements at various operating conditions shows a strong influence of the shaft speed, the chamber pressure, and the offtake design. In contrast to that, flow rate and scavenge ratio have only minor influence. Furthermore, the momentum flux of the core air flow is proposed as a suitable parameter with which the influence of shaft speed and pressure can be correlated to the film thickness distribution.

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