The Interpretation of the Constant Photocurrent Method in Terms of Deep Defect Density of States in A-SI.H

1994 ◽  
Vol 336 ◽  
Author(s):  
Frank Siebke ◽  
Helmut Stiebig

ABSTRACTThe constant photocurrent Method (CPM) is often used to measure the sub-bandgap absorption for the determination of the defect density. However, the absolute value of the derived defect density depends on the method of data analysis and the calibration factor. Normally the calibration factor is obtained from electron spin resonance (ESR) but the defect pool model gives rise to doubt whether ESR detects the same defects as CPm. Therefore, we propose combined total-yield photoelectron spectroscopy (TYPES) and CPM Measurements on n-type a-Si:H to determine the calibration factor. Furthermore, we calculate CPM spectra by extending an approach to simulate photoconductivity, taking into account the full set of optical transitions, and compare the results with standard evaluation Methods.

1996 ◽  
Vol 39 (3) ◽  
pp. 173-178 ◽  
Author(s):  
Atsushi Masuda ◽  
Yasuto Yonezawa ◽  
Akiharu Morimoto ◽  
Minoru Kumeda ◽  
Tatsuo Shimizu

1990 ◽  
Vol 41 (4) ◽  
pp. 2046-2048 ◽  
Author(s):  
Horacio A. Farach ◽  
Eduardo Quagliata ◽  
Taha Mzoughi ◽  
Manuel A. Mesa ◽  
Charles P. Poole ◽  
...  

1990 ◽  
Vol 209 ◽  
Author(s):  
Shu Jin ◽  
Lothar Ley

ABSTRACTTotal yield photoelectron spectroscopy has been used to study the electronic structure change of UHV evaporated a-Ge subjected to posthydrogenation and various annealing cycles. We identify in R.T. hydrogenated a-Ge:H a new hydrogen induced defect at about Ev + 0.45eV, which can be healed upon 300°C annealing. This new defect accounts for the defect density gradient of hydrogenated amorphous semiconductors, spanning the range from ∼ 1018 cm−3 at the growing surface to 1018−1015 cm−3 in the bulk, depending on growth condition and time. The origin of this new defect is discussed.


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