the Microstructure and Electrical Resistivity of Cluster-Based thin Films
Keyword(s):
ABSTRACTCluster-assembled thin metal films exhibit properties which are different from those of films obtained by conventional atomic-deposition. We present TEM data on the evolution of 2-D Microstructure and SFM data on the evolution of 3-D Microstructure in thin films grown by vacuum deposition of preformed silver clusters and of preformed acetylene-silver clusters on flat SiO2, and Mica. Electrical resistivity measurements of cluster-based Ag and Ag/C2H2 films deposited on glass substrates with nominal film thicknesses of 5 nm - 50 nm are also presented and discussed.
1969 ◽
Vol 309
(1498)
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pp. 397-417
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Keyword(s):
1971 ◽
Vol 29
◽
pp. 216-217
1982 ◽
Vol 15
(8)
◽
pp. 1459-1467
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