Use of Magneto-Optic Kerr Effect Measurements to Study Strain and Misfit Accommodation in Thin Films of Ni/Cu (100)

1993 ◽  
Vol 308 ◽  
Author(s):  
H.E. Inglefield ◽  
C.A. Ballentine ◽  
G. Bochi ◽  
S.S. Bogomolov ◽  
R.C. O'Handley ◽  
...  
Keyword(s):  
Thin Films ◽  
Kerr Effect ◽  
Molecular Beam ◽  
Magnetic Thin Films ◽  
Fringe Analysis ◽  
High Resolution Tem ◽  
Kinetics Of ◽  
Misfit Accommodation ◽  
Magneto Optic

ABSTRACTWe have detected magnetic transitions in Ni/Cu (100) films as a function of Ni thickness through in situ measurements of the magneto-optic Kerr effect (MOKE). Crystalline quality was monitored using in situ RHEED and Auger electron spectroscopy. Films were deposited by molecular beam epitaxy on silicon wafers and cleaved sodium chloride with varying epitaxial Ni layer thicknesses between 10 and 200 A. High-resolution TEM images of these films indicate decreasing misfit dislocation spacing and decreasing strain as measured by moiré fringe analysis with increasing Ni thickness. These observations have been correlated with changes in magnetic anisotropy as measured by MOKE. MOKE, therefore, may provide a tool for in situ monitoring of the kinetics of misfit accommodation in magnetic thin films.

Magnetic Anisotropy in Epitaxial Ni/Cu (100) Thin Films

1993 ◽  
Vol 313 ◽  
Author(s):  
G. Bochi ◽  
C. A. Ballentine ◽  
H. E. Inglefield ◽  
S. S. Bogomolov ◽  
C. V. Thompson ◽  
...  
Keyword(s):  
Thin Films ◽  
Molecular Beam Epitaxy ◽  
Magnetic Anisotropy ◽  
Kerr Effect ◽  
Molecular Beam ◽  
Misfit Strain ◽  
Ex Situ ◽  
Vibrating Sample Magnetometer ◽  
Perpendicular Magnetization

ABSTRACTEpitaxial Ni/Cu (001) films grown on Si (001) by Molecular Beam Epitaxy were studied in-situ using the Surface Magneto-optic Kerr Effect (SMOKE) and ex-situ with a Vibrating Sample Magnetometer (VSM). Perpendicular Magnetization is observed for Ni thicknesses 15 Å ≤ h ≤ 60 Å and fully in-plane magnetization for h ≥ 70 Å when the films are characterized in-situ. The reversal in magnetic anisotropy observed in-situ at 60 Å shifts to 125 Å when the films are exposed to air. 100 Å Ni films deposited on Cu1−x-Nix alloy substrates also show a reversal in magnetic anisotropy as x is changed. These results suggest that changes in magnetic anisotropy correlate with misfit strain accommodation.

In-situ X-ray diffraction studies and magneto-optic Kerr effect on RF sputtered thin films of BaTiO3 and Co, Nb co-doped BaTiO3

2016 ◽  
Vol 42 (3) ◽  
pp. 3882-3887 ◽  
Author(s):  
R. Siddheswaran ◽  
Pavol Šutta ◽  
Petr Novák ◽  
Marie Netrvalová ◽  
Aleš Hendrych ◽  
...  
Keyword(s):  
Thin Films ◽  
Kerr Effect ◽  
X Ray Diffraction ◽  
X Ray ◽  
Co Doped ◽  
Magneto Optic

Kinetics of Ion-Exchange Reactions in Hybrid Organic–Inorganic Perovskite Thin Films Studied by In Situ Real-Time X-ray Scattering

2018 ◽  
Vol 9 (23) ◽  
pp. 6750-6754 ◽  
Author(s):  
Alessandro Greco ◽  
Alexander Hinderhofer ◽  
M. Ibrahim Dar ◽  
Neha Arora ◽  
Jan Hagenlocher ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Exchange ◽  
Real Time ◽  
Exchange Reactions ◽  
Inorganic Perovskite ◽  
X Ray ◽  
X Ray Scattering ◽  
Kinetics Of ◽  
Kinetics Of Ion Exchange

Analysis of the magnetization switching in recording media thin films by magneto-optic Kerr effect vector magnetometry

2003 ◽  
Vol 433 (1-2) ◽  
pp. 259-262 ◽  
Author(s):  
G. Bottoni ◽  
D. Candolfo ◽  
A. Cecchetti ◽  
P. Vavassori
Keyword(s):  
Thin Films ◽  
Kerr Effect ◽  
Recording Media ◽  
Magnetization Switching ◽  
Magneto Optic

Magneto-optic Kerr effect of ferromagnetic semiconducting MnGeP2 thin films

2012 ◽  
Author(s):  
Jeongyong Choi ◽  
Giwan Seo ◽  
Yong Wook Lee ◽  
Bong-Jun Kim ◽  
Sungyoul Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Kerr Effect ◽  
Magneto Optic

Misfit Strain Relief Beyond the Critical Thickness Using Curvature Measurements and in Situ Characterization of the Magneto-Optic Kerr Effect

1994 ◽  
Vol 356 ◽  
Author(s):  
H. E. Inglefield ◽  
G. Bochi ◽  
C. A. Ballentine ◽  
R. C. O’Handley ◽  
C. V. Thompson
Keyword(s):  
Film Thickness ◽  
Magnetic Anisotropy ◽  
Kerr Effect ◽  
Critical Thickness ◽  
Misfit Strain ◽  
Misfit Dislocations ◽  
Wafer Curvature ◽  
Curvature Measurements ◽  
Magneto Optic

AbstractEpitaxial misfit has been characterized in Ni/Cu/Si (100) as a function of Ni film thickness using wafer curvature measurements. This strain can be related to measurements of magnetic anisotropy made in the deposition system using the magneto-optic Kerr effect. Films were deposited using molecular beam epitaxy (MBE) with varying Ni epilayer thickness between 10 and 1000Å. The change in wafer curvature due to misfit strain was measured using optical interferometry and the strain was calculated using Stoney’s equation. Transmission electron microscopy was used to characterize misfit dislocations at the Ni/Cu interface. It has been determined that misfit strain can have a very strong effect on magnetic anisotropy, particularly in the regime between the critical thickness and complete misfit accommodation, where strain has been found to decrease significantly as a function of film thickness. A critical strain has been determined at which a transition in the direction of magnetization easy axis from perpendicular to the film to in the film plane occurs. This discovery allows the use of Kerr effect measurements to characterize misfit strain in situ.

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