Recombination of Excess Carriers at High Excitation Density in Amorphous Silicon
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Excess electron-hole recombination at high excitation densities in a-Si:H is investigated by comparison of the transient photoconductivity during and just after excitation in the nanosecond time range to numerical models. A simple one parameter recombination model fits the experimental data satisfactorily. An extension of the model where deep trapping is taken into account explains also the transient photoconductivity in Boron doped a-Si:H.
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1999 ◽
Vol 40
(4-5)
◽
pp. 123-130
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2021 ◽
Vol 12
(2)
◽
pp. 835-842