Monte Carlo Simulations of Film Profile Evolution During Nonplanar CVD Processes

1992 ◽  
Vol 280 ◽  
Author(s):  
Daniel G. Coronell ◽  
Klavs F. Jensen
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Systematic Study ◽  
Rarefied Gas ◽  
Gas Flows ◽  
Simulation Approach ◽  
Sticking Coefficient ◽  
Rarefied Gas Flows ◽  
Feature Geometry ◽  
Film Profile

ABSTRACTA Monte Carlo simulation approach has been developed to model transport and film profile evolution for rarefied gas flows during nonplanar CVD over trenches and contact holes. A systematic study of the effect of various parameters on the film conformality including intermolecular collisions, reactant sticking coefficient and feature geometry is reported.

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