ArF Laser Induced Photochemical Substitution of OH Radicals into Teflon Surface Using Al(OH)3 Solution

1992 ◽  
Vol 279 ◽  
Author(s):  
M. Okoshi ◽  
H. Kashiura ◽  
T. Miyokawa ◽  
K. Toyoda ◽  
M. Murahara

ABSTRACTOH radicals were photochemically substituted for fluorine atoms in the teflon surface by using an ArF excimer laser light and an Al(OH)3 solution. This method is simple and can be performed in air atmosphere. In the process, the teflon film was placed on the Al(OH)3 which were dissolved in NaOH water solution; the ArF excimer laser light was irradiated the sample surface and the solution. By irradiating the laser, the surface was defluorinated by the aluminium atoms photodissociated from the Al(OH)3 solution, and the dangling bonds which were formed in the defluorinated surface combined with the OH radicals also photodissociated. The hydrophilic property of the photomodified surface was evaluated by the measurement of the contact angle with water. The defluorination and the OH radicals substitution were inspected by the XPS analysis and the ATR-FTIR measurement.

1998 ◽  
Vol 544 ◽  
Author(s):  
Shinsuke Ito ◽  
Masataka Murahara

AbstractInner pores of porous PTFE was modified photochemically by using ArF excimer laser for improvement of water permeability. In this study, two modification methods are described. One is using ethanol solution, and another is H20 vapor as a reaction gas. These reaction sources were employed for modification of inner pores. In the case of using ethanol solution, the modified sample indicates both hydrophilication and oleophilication. On the contrary, the hydrophilic groups are substituted into the inner pore with H20 vapor. The hydrophilication of modified samples were evaluated by the measurement of contact angle with water and water permeability. The substituted OH radicals were inspected by ATR-FTIR measurement.


2002 ◽  
Vol 735 ◽  
Author(s):  
Hitoshi Omuro ◽  
Masato Nakagawa ◽  
Hiroaki Fukuda ◽  
Masataka Murahara

ABSTRACTPET has been widely used for medical materials such as an artificial ligament. However, the affinity of tissues is no good. To compensate this, the mesh formed PET has clinically been used for artificial ligament intruding tissue into mesh. However, this method has not shown sufficient affinity with the tissue; that is, the initial adapting strength of the material and tissue is weak. · The artificial ligament must be biocompatible to contact blood and tissue. The foregoing artificial ligament, however, doesn't satisfy the biocompatibility. ·Thus, we have modified the PET surface into hydrophilic by substituting NH2 or OH functional groups. Firstly, an ArF excimer laser light was irradiated the PET with water on top. The OH functional group was substituted on the PET surface by this photochemical reaction. Secondly, the ArF excimer laser light was irradiated the PET in ammonia gas ambient. In this photochemical reaction, the NH2 functional group was substituted on the PET surface.· In this study, the untreated sample had the contact angle with water of 80 degrees and the bonding strength with protein of only 1.0kg/cm2. The contact angle of the modified sample improved to 40 degrees and the bonding strength, to 23kg/cm2. When treated in ammonia gas, the contact angle also improved to 40 degrees; however, the bonding strength was almost the same as that of the untreated sample.It was confirmed that the affinity of the PET for water and protein could be controlled by increasing or decreasing the substitution concentration of OH and NH2 functional groups on the surface.


2005 ◽  
Vol 890 ◽  
Author(s):  
Hiroyuki Anai ◽  
Yuji Sato ◽  
Masataka Murahara

ABSTRACTThe PTFE was modified into hydrophilic with 1/100 of the shots number required to obtain the same contact angle with water by the laser irradiation alone, when irradiating an ArF excimer laser on the sample surface at the moment of applying a 6 kV to the water placed on the PTFE surface to decrease the contact angle with water.A plasma treatment method is widely used for plastic surface modification, but the hydrophilic property generated by this method fades away soon. On the other hand, we have previously reported that the ArF excimer laser light was applied on a sample surface in the presence of water to substitute hydrophilic groups, which was modified to have a long–lasting hydrophilic property. This method, however, needed 3000 to 10000 shots of the laser irradiation, and it is less economical compared with the plasma processing that requires only one–minute irradiation. There is an electro–wetting method, in which the contact angle with water decreases temporarily when a high voltage is applied between the water and the sample, but the contact angle is restored to its original position when stopping the voltage application.Thus, we demonstrated the surface modification of PTFE maintaining the hydrophilic property for a long period with only 100 shots, by irradiating the ArF excimer laser on the sample at the moment when the wettability became high by the electro–wetting method. Water was placed in the gap between the silica glass and the PTFE to create a thin liquid layer with capillary phenomenon. A high voltage (6 kV) of direct current (DC) or alternating current (AC) was applied on the gap, and the ArF excimer laser was vertically irradiated on the sample surface. The water was photo–dissociated to produce H and OH. At the same time, the C—F bond of the PTFE was also photo–dissociated, and the F atom bonded to the H atom to produce HF. The OH group united with the dangling bond of C, which resulted in modifying the PTFE surface to be hydrophilic.To evaluate the wettability of the modified sample, the contact angle with water was measured. Improving the contact angle with water from 110 degrees for the untreated sample to 50 degrees for the treated sample had needed 10000 shots at the laser fluence of 5 mJ/cm2. By combined high voltage application and ArF excimer laser irradiation treatments, however, the 50–degree contact angle was yielded with 500 shots, 1/20 of 10000, when applying the DC of 6 kV, and with 100 shots only, 1/100 of 10000, when applying the AC of 6 kV. Moreover, the modified sample was observed for a change in contact angle with passage of time. The contact angle was 60 degrees after applying the high voltage, and 110 degrees when stopped. On the other hand, the sample modified by combined the high voltage application and ArF excimer laser irradiation maintained the 50–degree contact angle for one month after stopping the voltage application.


1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.


1992 ◽  
Vol 7 (7) ◽  
pp. 1912-1916 ◽  
Author(s):  
M. Okoshi ◽  
M. Murahara ◽  
K. Toyoda

Photochemical modification of the polytetrafluoroethylene (PTFE) with incorporation of the CH3 radical released from the B(CH3)3 molecule excited by an ArF excimer laser has been demonstrated. The incorporation of CH3 radicals and the depletion of fluorine atoms of the polymer surface were studied by XPS analysis and infrared ATR spectrum measurement. In these photochemical reactions, the photoirradiated surface changed into oleophilic. The properties were studied by contact angle measurement. The stability of the oleophilic surface was examined at the elevated temperature of 200 °C for 6 h in O2 or N2 ambient and also by immersing in alkaline or acid water solutions.


1993 ◽  
Vol 334 ◽  
Author(s):  
T. Miyokawa ◽  
M. Okoshi ◽  
K. Toyoda ◽  
M. Murahara

AbstractSilicon films were deposited on a fluororesin surface. The process was divided into two steps: surface modification process and silicon CVD onto the modified parts. In the modification process, SiH4 and B(CH3)3 mixed gases were used with ArF excimer laser. Fluorine atoms of the surface were pulled out by boron atoms which were photo—dissociated from B(CH3)3 and were replaced with silicon atoms released from SiH4. In the CVD process, SiH4 gas was used with high—density excited ArF excimer laser. Silicon films were deposited onto the nuclei by photodecomposition of SiH4.Chemical compositions of the modified layers and the deposited parts were inspected by XPS analysis. 1000 Å thickness of the deposited silicon films was confirmed by the surface roughness interference–meter.


1997 ◽  
Vol 495 ◽  
Author(s):  
T. Mori ◽  
K. Hatao ◽  
M. Murahara

ABSTRACTA single-crystalline 3C-SiC is very difficult to etch compared with a polycrystalline SiC. Thus, a photochemical pattern etching of the SiC was demonstrated by using Xe2* excimer lamp and ArF or KrF excimer laser. To promote the surface reaction, a Xe2* excimer lamp was employed to produce many radicals on the sample surface; simultaneously, ArF or KrF laser light irradiated the surface via a circuit pattern to dissociate the Si-C bonds. The Si and C reacted with the F and N radicals photo-dissociated from NF3 gas to form SiF4, CFn and CN, which diffused in the reaction cell. As a result, the single-crystalline 3C-SiC was photo-chemically etched effectively. With the NF3 gas of 200Torr, the Xe2* excimer lamp of 7mW/cm2, and the KrF excimer laser of 650mJ/cm2, 20Hz and 10,000shots, the etch depth of 700 Å was successfully achieved.


2010 ◽  
Vol 2010.23 (0) ◽  
pp. 437-438
Author(s):  
Yuta KITAMURA ◽  
Noriyuki MIYAZAKI ◽  
Takahito KUMAZAKI ◽  
Naoto NAGAKURA ◽  
Yasuhiro HASHIMOTO ◽  
...  

2000 ◽  
Author(s):  
Jochen Alkemper ◽  
Joerg Kandler ◽  
Lorenz Strenge ◽  
Ewald Moersen ◽  
Christian Muehlig ◽  
...  

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