Amorphous Phase Formation and Recrystallization in Ion-Implanted Silicides

1983 ◽  
Vol 27 ◽  
Author(s):  
C.A. Hewett ◽  
I. Suni ◽  
S.S. Lau ◽  
L.S. Hung ◽  
D.M. Scott
Keyword(s):  
Melting Point ◽  
Ion Implantation ◽  
Phase Transformations ◽  
Amorphous Phase ◽  
Phase Formation ◽  
Amorphous Phases ◽  
Post Annealing ◽  
Amorphous Phase Formation ◽  
Ion Implanted

ABSTRACTIon implantation induced phase transformations and recrystallization during post-annealing in CoSi2, CrSi2, and Pd2Si are studied. All three silicides are found to reorder at about 1/3 the melting point of the silicide. We speculate that ion-implanted silicides recrystallize by the same mechanism and that amorphous phases produced by implantation are unstable rather than metastable.

Binary And Ternary Amorphous Alloys of Ion-Implanted Fe-Ti-C

1985 ◽  
Vol 51 ◽  
Author(s):  
D. M. Follstaedt ◽  
J. A. Knapp
Keyword(s):  
Mechanical Properties ◽  
Amorphous Phase ◽  
Phase Formation ◽  
Ion Irradiation ◽  
Lattice Structure ◽  
Ion Beam ◽  
Iron Carbide ◽  
Complete Characterization ◽  
Amorphous Phases ◽  
Amorphous Phase Formation

ABSTRACTThe microstructure of Fe implanted with up to 50 at.% C was found to consist of hexagonal iron carbide precipitates oriented with respect to the Fe matrix. For higher C concentrations, an amorphous phase forms. This concentration dependence is explained in terms of the lattice structure of the iron carbide. In Ti-implanted Fe, substitutional Ti was found in the bcc Fe lattice for concentrations ≤ 15 at.% Ti. The work of others suggests that amorphous phases form for ≥ 33 at.% Ti. These results are discussed in terms of concentration boundaries of the ternary Fe(Ti,C) amorphous phase.Ion beam alloying methods are currently being used to form metastable alloys [1], both for fundamental investigations of such alloys as well as for potential use to improve physical properties of components [2]. An important consideration in metal alloys is what phase will form upon implantation; one aspect of this question is to determine when amorphous phases will form. Rules are currently being advanced to predict alloy systems which will yield amorphous phases. By using ion irradiation and ion beam mixing as well as ion implantation, such rules can be evaluated over entire composition ranges.To gain insight into amorphous phase formation, we have studied Fe alloys implanted with C, Ti and Ti + C. The Fe(C) alloys exhibit compound precipitation and amorphous phase formation; the precipitation and the concentrations at which the amorphous phase appears can be accounted for by considerations of the structure of the hexagonal carbide which forms. Based on conventional uses of the Fe(C) system, such alloys may be useful for improving mechanical properties by implanting C into ferrous components. Iron implanted with Ti is examined to a limited extent here, but by including ion irradiation studies by others [3], a more complete characterization of Fe(Ti) alloys is obtained. The microstructures of Fe(C) and Fe(Ti) are examined along with the known composition limits of amorphous Fe(Ti,C) alloys, which are important for their improved mechanical properties [2]. Taken together, a more complete determination of amorphous phase formation in this ternary system is obtained.

Channeling study of amorphous phase formation in Nisub3B by ion implantation

1986 ◽  
Vol 34 (7) ◽  
pp. 4464-4466 ◽  
Author(s):  
A. Benyagoub ◽  
J. C. Pivin ◽  
F. Pons ◽  
L. Thomé
Keyword(s):  
Ion Implantation ◽  
Amorphous Phase ◽  
Phase Formation ◽  
Amorphous Phase Formation

Amorphous phase formation in irradiated intermetallic compounds

1983 ◽  
Vol 77 (3-4) ◽  
pp. 273-293 ◽  
Author(s):  
J. L. Brimhall ◽  
H. E. Kissinger ◽  
L. A. Charlot
Keyword(s):  
Intermetallic Compounds ◽  
Amorphous Phase ◽  
Phase Formation ◽  
Amorphous Phase Formation

Amorphous Phase Formation During Ion Mixing of Ti/Si Bilayers at Elevated Temperature

1988 ◽  
Vol 100 ◽  
Author(s):  
K. Maex ◽  
R. F. De Keersmaecker ◽  
M. Van rossum ◽  
W. F. Van Der Weg
Keyword(s):  
Elevated Temperature ◽  
Thermal Treatment ◽  
Diffusion Couple ◽  
Amorphous Phase ◽  
Phase Formation ◽  
Multilayer Structure ◽  
Elevated Temperatures ◽  
Binary Diffusion ◽  
Amorphous Phase Formation

ABSTRACTThe amorphous phaseformation in Ti-Si bilayers upon ion mixing at elevated temperatures and in Ti-Si multilayers upon thermal treatment was studied. In the case of ion mixing with 5×1015 cm−2 Xe atoms at temperatures around 240°C a 100nm thick amorphous Ti-Si alloy is formed with a very homogeneous Ti:Si=3 :4 composition. Thermal treatment of the Ti-Si multilayer structure at similar temperatures also yields amorphous silicide layers. The results are interpreted according to the evolution in a planar binary diffusion couple, where the Si and Ti concentrations in the reacted layer are dictated by thermodynamic and kinetic arguments.

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