Texturing of InP Surfaces for Device Applications
Keyword(s):
ABSTRACTA unique process for texturing InP (100) wafers by anisotropic etching has been developed. The process produces irregular V-grooves on the surface, which reduce the surface reflectivity. The process does not require photolithography or masking. The etching characteristics depend on doping, with etching tending to proceed more rapidly on the more heavily doped samples. Reduced reflectivity surfaces formed using this process can be applied to solar cells, photodetectors, and other optoelectronic devices.
Keyword(s):
2019 ◽
Vol 28
(01n02)
◽
pp. 1940012
2010 ◽
Vol 19
(4)
◽
pp. 473-477
◽
Keyword(s):