In Situ Deformation Studies of Fe/Al and Fe/Si Multi-Layered Films Prepared by Ion Beam Sputtering

1991 ◽  
Vol 239 ◽  
Author(s):  
K. Kubota ◽  
M. Naoe
Keyword(s):  
Magnetic Properties ◽  
Internal Stress ◽  
Ion Beam ◽  
Soft Magnetic Properties ◽  
Ion Beam Sputtering ◽  
Soft Magnetic ◽  
Beam Sputtering ◽  
In Situ Deformation ◽  
Deformation Measurements

ABSTRACTIn situ deformation measurements of Fe/Al and Fe/Si multi-layered films on thin substrates were made by detecting the curvature of substrates during deposition. The deformation inside of Fe layers corresponding to the compressive and tensile stresses was detected for the Fe/Al and Fe/Si multi-layered films, respectively. For the Fe/Si multi-layered films, the internal stress in Fe layers became from tensile to compressive during deposition under bombardment of Ar Jons. These stresses in Fe layer were closely related to the soft magnetic properties of these multi-layered films. In situ deformation studies may be useful to make sure the effect of internal stress on the magnetic properties of these multi-layered films.

Cutoff Frequency Study on Nanocrystalline FeNbB Thin Films

2012 ◽  
Vol 465 ◽  
pp. 72-75
Author(s):  
Xiao Long Jiang ◽  
Y.J. Yao ◽  
M. Lai ◽  
K. Peng ◽  
Y.W. Du
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Room Temperature ◽  
Ion Beam ◽  
Cutoff Frequency ◽  
Magnetic Behavior ◽  
Soft Magnetic Properties ◽  
Ion Beam Sputtering ◽  
Soft Magnetic ◽  
Beam Sputtering

A series of nanocrystalline FeNbB films were fabricated using ion-beam sputtering technique from FeNbB target. Pieces of these films were annealed for 1 hour at various temperatures up to 5730C. Room temperature soft magnetic properties of these films were measured. The influence of microstructure on magnetic behavior in nanocrystalline FeNbB films is investigated in a series of specimens with different film’s thickness. For the sample 120nm and 5000C annealed, cutoff frequency was found to be 5E7 Hz, which has the μf0=5E10.

Magnetic Properties of Nanocomposites Metal-Carbon

2015 ◽  
Vol 233-234 ◽  
pp. 538-541
Author(s):  
Alexander Aleshnikov ◽  
Haider S. Mohammed Al-Azzawi ◽  
Y. Kalinin ◽  
Alexander Sitnikov ◽  
Oksana Tarasova
Keyword(s):  
Heat Treatment ◽  
Magnetic Properties ◽  
Ion Beam ◽  
Heterogeneous Systems ◽  
Soft Magnetic Properties ◽  
Ion Beam Sputtering ◽  
Ferromagnetic Alloy ◽  
Soft Magnetic ◽  
Before And After ◽  
Beam Sputtering

The films of heterogeneous systems based on ferromagnetic alloy and С were obtained by ion-beam sputtering. The concentration dependence of the resistance of composites was measured before and after heat treatment. The research of magnetostatic and magnetodynamic properties of heterogeneous metal-carbon showed that compounds (Co)Х(C)100-Х (Co40Fe40B20)Х(С)100-Х (Co45Fe45Zr10)Х(C)100-Х after the percolation threshold have good soft magnetic properties.

Magnetic and Structural Characteristics of Multi-layered Films Composed of Fe and Si Ultra-thin Layers

1991 ◽  
Vol 231 ◽  
Author(s):  
K. Kubota ◽  
M. Nagakubo ◽  
M. Naoe
Keyword(s):  
Structural Characteristics ◽  
Ion Beam ◽  
Thin Layers ◽  
Soft Magnetic Properties ◽  
Ion Beam Sputtering ◽  
Soft Magnetic ◽  
Magnetostatic Interaction ◽  
Beam Sputtering ◽  
Amorphous Si ◽  
The Relationship

AbstractFe and Si layers were deposited alternately by using ion beam sputtering apparatus and the relationship between crystal structure and soft magnetic properties of these multi-layered films have been investigated in detail. The clear periodicity of multi-layered films was confirmed even at the thicknesses of Fe and Si layers δFe and δSi as small as 8.5 Å.The saturation magnetization 4πMs for all Fe layers decreased with decrease of δFe and δSi, and the coercivity Hc of these films took minimum of 1.0 Oe at δFe of 8.5 Å.Such a significant decrease of 4TEMs may be attributed to the formation of nonmagnetic regions at both side of each Fe layers. The thickness of these nonmagnetic regions may be estimated at approximately 1.5 Å from the measured value of 4flMs. This thickness seems to be very small because it is almost equal to that of one monolayer of bcc α-Fe. The low Hc of the films with δFe and δSi of 8.5 Å may be due to the formation of ultra-fine crystallites in Fe layer by insertion of amorphous Si layer and the direct magnetostatic interaction among Fe layers.

Preparation and Gas Addition of Soft Magnetic Pure Iron Thin Film by Dual Ion Beam Sputtering

1986 ◽  
Vol 80 ◽  
Author(s):  
M. Nagakubo ◽  
A. Kawano ◽  
M. Naoe
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Pure Iron ◽  
Ion Beam ◽  
Film Surface ◽  
Iron Film ◽  
Ion Beam Sputtering ◽  
Soft Magnetic ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

AbstractPure iron thin films with soft magnetic properties and good chemical stabilities have been prepared by Dual Ion Beam Sputtering (DIBS). Four kinds of gas, that is, hydrogen, helium, nitrogen and argon were introduced respectively to the auxiliary ion source as the additional element in the film and also for the purpose of bombardment during deposition. The dependence of crystal structure and magnetic properties of the films on the preparation condition, especially, on the effect of various gases added in the films by ion bombardment onto the depositing film surface, has been investigated.Saturation magnetization 4πMs of iron film including gas atoms is usually smaller than that of bulk iron which has 4πMs of 21.5kG. For example, 4πMs of the film prepared by conventional planer magnetron sputtering remains about 15kG. Such a remarkable difference in 4πMs may be primarily attributed to the considerable amount of argon atoms included in the film due to argon pressure as high as 10mTorr. It may be also caused by high energy particles bombarding onto the iron film surface during deposition. On the other hand, pure iron thin films prepared by Dual Ion Beam Sputtering can have 47Ms as high as 21.5kG, and coercive force Hc as low as about 4 Oe by controlling the ratio of sputtering iron atoms to argon gas atoms, impinging onto the substrate, and the arrival energies both of them. Magnetic properties and crystal structures of the iron thin films depend significantly on the kind of added gas. In this study, it has been found that bombardment and addition of adequate gas atoms with proper energy results in an improvement of atomic ordering and microscopic uniformity in the films.

Direct Observations of the Epitaxial Growth of Sputtered Ag on Si

1973 ◽  
Vol 31 ◽  
pp. 122-123
Author(s):  
J. S. Maa ◽  
Thos. E. Hutchinson
Keyword(s):  
Epitaxial Growth ◽  
Film Growth ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Microscopy Technique ◽  
Direct Observations ◽  
In Situ Electron Microscopy ◽  
Beam Sputtering ◽  
The Subject

The growth of Ag films deposited on various substrate materials such as MoS2, mica, graphite, and MgO has been investigated extensively using the in situ electron microscopy technique. The three stages of film growth, namely, the nucleation, growth of islands followed by liquid-like coalescence have been observed in both the vacuum vapor deposited and ion beam sputtered thin films. The mechanisms of nucleation and growth of silver films formed by ion beam sputtering on the (111) plane of silicon comprise the subject of this paper. A novel mode of epitaxial growth is observed to that seen previously.The experimental arrangement for the present study is the same as previous experiments, and the preparation procedure for obtaining thin silicon substrate is presented in a separate paper.

In-situ epitaxial growth study of Bi/sub 2/(Sr,Ca)/sub 3/Cu/sub 2/O/sub x/ films by ion beam sputtering on cleaved MgO substrates

1991 ◽  
Vol 27 (2) ◽  
pp. 1205-1210 ◽  
Author(s):  
J. Fujita ◽  
T. Yoshitake ◽  
T. Satoh ◽  
T. Ichihashi ◽  
H. Igarashi
Keyword(s):  
Epitaxial Growth ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Growth Study ◽  
Beam Sputtering

Structural and magnetic properties of Fe-Co thin films elaborated by ion-beam sputtering

1994 ◽  
Vol 133 (1-3) ◽  
pp. 493-496 ◽  
Author(s):  
P. Pain ◽  
J.P. Eymery ◽  
M. Cahoreau ◽  
M.F. Denanot ◽  
J.F. Dinhut
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Structural And Magnetic Properties
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