Microhardness Characterization of 80/20 MOL % TiO2/SiO2 Sol-Gel Films
Keyword(s):
Sol Gel
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ABSTRACTKnoop hardness and nanoindentation studies were performed on single and multilayered 80/20 mol % TiO2/SiO2 films spin-coated onto [100] silicon wafers. The Knoop microhardness results indicated that a total sol-gel thickness (h) to indentation depth (h*) ratio of >2 was sufficient to obtain reliable thin film properties independent of substrate influence. Electron microscopy techniques were used to determine the sample's absolute film thickness, to examine the morphology of the indentations, and to determine the phase of the sol-gel thin films.
The Ferroelectric and Electrical Properties of CaBi4Ti4O15 Thin Films Prepared by Sol-Gel Technology
2011 ◽
Vol 239-242
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pp. 891-894
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2000 ◽
Vol 45
(25-26)
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pp. 4359-4371
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