Electron Beam Induced Decomposition of Palladium Acetate

1991 ◽  
Vol 236 ◽  
Author(s):  
T.J. Stark ◽  
T.M. Mayer ◽  
P.E. Russell
Keyword(s):  
Electron Beam ◽  
Thick Films ◽  
Gas Analysis ◽  
Palladium Acetate ◽  
Metallic State ◽  
Xps Analysis ◽  
Volatile Products ◽  
Residual Gas ◽  
Induced Decomposition

AbstractA focused electron beam has been used to selectively decompose sub micron thick films of palladium acetate, Pd(OOCCH3)2, resulting in the formation of <0.1μm wide Pd rich features. Resistivity of the palladium acetate film decreased when exposed to doses above 500μC/cm2. Annealing to 160°C further reduces the resistivity of the exposed areas to as low as 100μΔcm. XPS analysis of the exposed areas indicate that the Pd is reduced to a metallic state and that the ratio of C and 0 to Pd drops to 1.5 and 0.6, respectively, after exposure. Residual gas analysis during exposure indicates that CO2 and CH3 are the primary volatile products of the decomposition.

Residual Gas Reactions in the Electron Microscope: I. Qualitative Observations on the Water Gas Reaction

1968 ◽  
Vol 26 ◽  
pp. 292-293
Author(s):  
Richard E. Hartman ◽  
Roberta S. Hartman ◽  
Peter L. Ramos
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Gas Phase ◽  
Absolute Temperature ◽  
Residual Gas ◽  
Gas Reactions ◽  
Image Position ◽  
The Right ◽  
Water Gas ◽  
Thinning Rate

The action of water and the electron beam on organic specimens in the electron microscope results in the removal of oxidizable material (primarily hydrogen and carbon) by reactions similar to the water gas reaction .which has the form:The energy required to force the reaction to the right is supplied by the interaction of the electron beam with the specimen.The mass of water striking the specimen is given by:where u = gH2O/cm2 sec, PH2O = partial pressure of water in Torr, & T = absolute temperature of the gas phase. If it is assumed that mass is removed from the specimen by a reaction approximated by (1) and that the specimen is uniformly thinned by the reaction, then the thinning rate in A/ min iswhere x = thickness of the specimen in A, t = time in minutes, & E = efficiency (the fraction of the water striking the specimen which reacts with it).

Thermal soak compatibility test and residual gas analysis on 4130 steel and methanol thermosyphons

1997 ◽  
Author(s):  
Q. He ◽  
Pon Ponnappan ◽  
J. Brown ◽  
Q. He ◽  
Pon Ponnappan ◽  
...  
Keyword(s):  
Gas Analysis ◽  
Compatibility Test ◽  
Residual Gas

scholarly journals Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer

Materials ◽  
2021 ◽  
Vol 14 (11) ◽  
pp. 3026
Author(s):  
Woo-Jae Kim ◽  
In-Young Bang ◽  
Ji-Hwan Kim ◽  
Yeon-Soo Park ◽  
Hee-Tae Kwon ◽  
...  
Keyword(s):  
Greenhouse Gas ◽  
Silicon Oxide ◽  
Gas Analysis ◽  
Gas Analyzer ◽  
Dc Offset ◽  
Cleaning Performance ◽  
Oxide Etching ◽  
Residual Gas ◽  
Etch Rates ◽  
Very High

The use of NF3 is significantly increasing every year. However, NF3 is a greenhouse gas with a very high global warming potential. Therefore, the development of a material to replace NF3 is required. F3NO is considered a potential replacement to NF3. In this study, the characteristics and cleaning performance of the F3NO plasma to replace the greenhouse gas NF3 were examined. Etching of SiO2 thin films was performed, the DC offset of the plasma of both gases (i.e., NF3 and F3NO) was analyzed, and a residual gas analysis was performed. Based on the analysis results, the characteristics of the F3NO plasma were studied, and the SiO2 etch rates of the NF3 and F3NO plasmas were compared. The results show that the etch rates of the two gases have a difference of 95% on average, and therefore, the cleaning performance of the F3NO plasma was demonstrated, and the potential benefit of replacing NF3 with F3NO was confirmed.

Comparative Study of Time-Dependent PAES and XPS on a Ni/Pd Surface

2017 ◽  
Vol 373 ◽  
pp. 313-316 ◽  
Author(s):  
Samantha Zimnik ◽  
Christian Piochacz ◽  
Sebastian Vohburger ◽  
Christoph Hugenschmidt
Keyword(s):  
Photoelectron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Structural Changes ◽  
Time Dependent ◽  
Xps Analysis ◽  
Time Constants ◽  
X Ray ◽  
Residual Gas ◽  
Rule Out

We report on time-dependent Positron annihilation induced Auger Electron Spectroscopy (PAES) study on 0.5 monolayers (ML) Ni on polycrystalline Pd accompanied by complementary X-ray induced Photoelectron Spectroscopy (XPS). The normalized PAES spectra showed a significant decrease in the Ni intensity and an increase in the Pd intensity as a function of time. To rule out varying influence on the elements e.g. from surface contaminates due to the residual gas, a time-dependent XPS analysis was performed on pure Ni and Pd as well as to analyze the main contaminants C and O. The O fraction was found to be constant within the measurement time and the time constants for C significantly differ from those of Ni and Pd in the PAES data. Consequently, it was concluded that the PAES data show a superposition of C contamination and structural changes at the surface of Ni/Pd.

scholarly journals Laser power meters as an X-ray power diagnostic for LCLS-II

2018 ◽  
Vol 25 (1) ◽  
pp. 72-76 ◽  
Author(s):  
Philip Heimann ◽  
Stefan Moeller ◽  
Sergio Carbajo ◽  
Sanghoon Song ◽  
Georgi Dakovski ◽  
...  
Keyword(s):  
Free Electron Laser ◽  
Laser Power ◽  
High Vacuum ◽  
Average Power ◽  
Gas Analysis ◽  
Ultra High Vacuum ◽  
Beam Path ◽  
X Ray ◽  
High Repetition ◽  
Residual Gas

For the LCLS-II X-ray instruments, laser power meters are being developed as compact X-ray power diagnostics to operate at soft and tender X-ray photon energies. These diagnostics can be installed at various locations along an X-ray free-electron laser (FEL) beamline in order to monitor the transmission of X-ray optics along the beam path. In addition, the power meters will be used to determine the absolute X-ray power at the endstations. Here, thermopile power meters, which measure average power, and have been chosen primarily for their compatibility with the high repetition rates at LCLS-II, are evaluated. A number of characteristics in the soft X-ray range are presented including linearity, calibrations conducted with a photodiode and a gas monitor detector as well as ultra-high-vacuum compatibility tests using residual gas analysis. The application of these power meters for LCLS-II and other X-ray FEL sources is discussed.

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