Substructure-Magnetic Property Correlation in Co/ag Composite Thin Films

1991 ◽  
Vol 231 ◽  
Author(s):  
C.P Reed ◽  
R.J. Deangelis ◽  
S.H. Liou ◽  
S. Nafis ◽  
John A. Woollam ◽  
...  

AbstractThree series of nanostructured, μm thick, Co/Ag composite thin films (13, 39 and 61 volume % Co) were produced by dc magnetron sputtering at various substrate temperatures (100–600°C) to determine their magnetic properties and characterize the microstructure. The films were found to be composed of finely dispersed Ag and Co particles. The film surfaces become rougher as the substrate temperature was increased. The crystal lattice structure of the Co was found to be fcc except at the lower substrate temperatures (<300°C) in the 61 volume % films where it was found to be a mixture of fcc and some hcp. The average diffracting particle size of both the Co and Ag rich phases increase with substrate temperature. The magnetic coercivity of the films reached a maximum value when the Co particle size was between 100–150Å.

1990 ◽  
Vol 34 ◽  
pp. 557-565 ◽  
Author(s):  
C. P. Reed ◽  
R. J. DeAngelis ◽  
Y. X. Zhang ◽  
S. H. Liou ◽  
R. J. Jacob

AbstractA series of nanostructured Fe/Ag metal films were produced at various substrate temperatures to determine their magnetic characteristics. The magnetic coercivity was found to increase with the diffracting-particle size which is process controlled. The films produced at low substrate temperature (<200°C) consisted of small metallic clusters of Ag (<100 Å). As the substrate temperature was increased, the films exhibited increased crystallinity and larger diffracting-particle size. The position of the maximum in the particlesize distribution function and the width of the function increased with substrate temperature.


2000 ◽  
Vol 87 (9) ◽  
pp. 6585-6587 ◽  
Author(s):  
J. M. Song ◽  
M. Nakano ◽  
N. Ogawa ◽  
H. Fukunaga

2011 ◽  
Vol 1328 ◽  
Author(s):  
KyoungMoo Lee ◽  
Yoshio Abe ◽  
Midori Kawamura ◽  
Hidenobu Itoh

ABSTRACTCobalt hydroxide thin films with a thickness of 100 nm were deposited onto glass, Si and indium tin oxide (ITO)-coated glass substrates by reactively sputtering a Co target in H2O gas. The substrate temperature was varied from -20 to +200°C. The EC performance of the films was investigated in 0.1 M KOH aqueous solution. X-ray diffraction (XRD) and Fourier transform infrared (FTIR) spectroscopy of the samples indicated that Co3O4 films were formed at substrate temperatures above 100°C, and amorphous CoOOH films were deposited in the range from 10 to -20°C. A large change in transmittance of approximately 26% and high EC coloration efficiency of 47 cm2/C were obtained at a wavelength of 600 nm for the CoOOH thin film deposited at -20°C. The good EC performance of the CoOOH films is attributed to the low film density and amorphous structure.


1991 ◽  
pp. 557-565
Author(s):  
C. P. Reed ◽  
R. J. DeAngelis ◽  
Y. X. Zhang ◽  
S. H. Liou ◽  
R. J. Jacob

2008 ◽  
Vol 55-57 ◽  
pp. 881-884 ◽  
Author(s):  
Thitinai Gaewdang ◽  
N. Wongcharoen ◽  
P. Siribuddhaiwon ◽  
N. Promros

CdTe thin films with different substrate temperatures have been deposited by thermal evaporation method on glass substrate in vacuum chamber having low pressure about 3.0x10-5 mbar. According to XRD analysis, CdTe thin films are polycrystalline belonging to cubic structure with preferential orientation of (111) plane. The strongest peak intensity of XRD is observed in the film prepared with substrate temperature of 150°C. Band gap and band tail values of the as-deposited films were evaluated from the optical transmission spectra. The lowest dark sheet resistance value was obtained from the film prepared with substrate temperature of 150°C as well. Regarding to our experimental results, it may be indicated that the 150°C substrate temperature is the most suitable condition in preparing CdTe thin films for solar cell applications.


2014 ◽  
Vol 28 (06) ◽  
pp. 1450043 ◽  
Author(s):  
Shuyun Wang ◽  
Yuanmei Gao ◽  
Tiejun Gao ◽  
Yuan He ◽  
Hui Zhang ◽  
...  

A series of Ta (4 nm)/ ZnO (t nm )/ Ni 81 Fe 19 (20 nm)/ ZnO (t nm )/ Ta (3 nm) magnetic thin films were prepared on lower experimental conditions by magnetron sputtering method. Effects of ZnO layer thickness and substrate temperature on anisotropic magnetoresistance and magnetic properties of these Ni 81 Fe 19 films have been investigated. The experiment results show that the anisotropic magnetoresistance value of the Ni 81 Fe 19 film is enhanced with the increasing of the inserted ZnO layer thickness. When the ZnO thickness is 2 nm, the anisotropic magnetoresistance value achieves the maximum. In addition, the anisotropic magnetoresistance of the Ni 81 Fe 19 film is also enhanced with the increasing of substrate temperature, and when the temperature is 450°C, the anisotropic magnetoresistance reaches the maximum. The anisotropic magnetoresistance value of 20 nm Ni 81 Fe 19 films with 2 nm ZnO layer can achieve 3.63% at 450°C which is enhanced 11.6% compare with the films without ZnO layer.


2016 ◽  
Vol 675-676 ◽  
pp. 261-264
Author(s):  
Kasidid Chansaengsri ◽  
Korakot Onlaor ◽  
Thutiyaporn Thiwawong ◽  
Benchapol Tunhoo

In this work, cobalt oxide thin films were prepared by electrostatic spray deposition (ESD) technique. The influence of the substrate temperatures on properties of film was investigated. Phase transformation of cobalt oxide thin films due to the effect of different substrate temperature was also observed. Cyclic voltammetry was used to measure the performance of cobalt oxide supercapacitor. At higher substrate temperature, the cobalt oxide thin films exhibit the high specific capacitance due to the effect of phase transformation in cobalt oxide films.


2019 ◽  
Vol 27 (03) ◽  
pp. 1950124 ◽  
Author(s):  
MOHAMMED YARUB HANI ◽  
ADDNAN H. AL-AARAJIY ◽  
AHMED M. ABDUL-LETTIF

Nickel(II) phthalocyanine-tetrasulfonic acid tetrasodium salt (NiTsPc) thin films were deposited on glass substrates at different substrate temperatures ([Formula: see text]) by chemical spray pyrolysis (CSP) technique. The substrate temperature varied from 110∘C to 310∘C in 50∘C steps. The substrate surface temperature is the main parameter that determines the film morphology and properties of the thin films. The structural properties of the deposited NiTsPc thin films were investigated by X-ray diffraction (XRD) and from the obtained results, it was shown that depositing thin films using 210∘C as [Formula: see text] results in higher crystallinity. Atomic force microscope (AFM) was employed to obtain the surface topography and to calculate the roughness and grain size. The smoothest thin film surface was obtained when using at 160∘C, while the highest roughness was obtained at 310∘C. The optical properties were investigated by ultraviolet visible (UV-Vis) spectrophotometer and fluorescence spectrophotometer. From the absorption spectra recorded in the wavelength range 190–1100[Formula: see text]nm, two absorption bands were observed, which are known as Soret and Q-band. By observing the absorption spectrum, it can be concluded that the deposited thin films at 110∘C–310∘C have direct energy gap. From Tauc plot relation, the energy gap ([Formula: see text]) was calculated. The values of the energy gap were between 3.05 and 3.14[Formula: see text]eV. It was observed that different [Formula: see text] highly affects the structural and optical properties of the deposited thin films. The crystallinity, grain size, roughness and the optical properties were strongly affected by the different substrate temperatures.


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