Electrical Properties Of Thin Polyimide Films Prepared By Ionized Cluster Beam Deposition

1991 ◽  
Vol 227 ◽  
Author(s):  
Hyung-Jin Jung ◽  
Dong-Heon Lee ◽  
Jeon-Kook Lee ◽  
Chung-Nam Whang
Keyword(s):  
Electrical Properties ◽  
Cluster Beam ◽  
Thermal Curing ◽  
Polyimide Films ◽  
Capacitance Voltage ◽  
Silicon Structures ◽  
Clean Interface ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTThe electrical properties of gold – polyimide - silicon structures were investigated experimentally by capacitance – voltage (C – V) measurement. Polyimide films were deposited on silicon substrate by using ionized cluster beam deposition (ICBD) of PMDA-ODA followed by in-situ thermal curing in N2 atmosphere. The resulting C – V plots show hysteresis, and it was believed to be due to the injection of carriers. The interface trap density is fairly low because of the clean interface provided by ICB technique.

XPS and FTIR Study of the Thin Polyimide Films Fabricated by Ionized Cluster Beam Deposition

1991 ◽  
Vol 235 ◽  
Author(s):  
K. W. Kim ◽  
K. H. Chae ◽  
S. C. Choi ◽  
S. J. Cho ◽  
Y. W. Vahc ◽  
...  
Keyword(s):  
High Surface ◽  
Chemical Properties ◽  
Surface Cleaning ◽  
Cluster Beam ◽  
Polyimide Films ◽  
Surface Migration ◽  
Cluster Ion ◽  
Ft Ir ◽  
Cluster Beam Deposition ◽  
Beam Deposition

ABSTRACTThe ionized cluster beam deposition (ICBD) technique has been employed to fabricate high-purity polyimide (PI) films. The pyromellitic dianhydride (PMDA) and oxydianiline (ODA) were deposited using dual ionized cluster beam (ICB) sources. Fourier transform infrared spectroscopy (FT-IR) and X-ray photoemission spectroscopy (XPS) studies show that the bulk and surface chemical properties are very sensitive to the ICBD conditions such as cluster ion acceleration voltage and ionization voltage. At optimum ICBD conditions, the PI films have a maximum imidization and negligible impurities(∼;1% isoimide) probably due to the high surface migration energy and surface cleaning effect.

Mass selection of neutral clusters in Low‐Energy Cluster Beam Deposition experiments: Is it realistic?

1994 ◽  
Vol 64 (10) ◽  
pp. 1212-1214 ◽  
Author(s):  
J. F. Roux ◽  
B. Cabaud ◽  
G. Fuchs ◽  
D. Guillot ◽  
A. Hoareau ◽  
...  
Keyword(s):  
Low Energy ◽  
Mass Selection ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Energy Cluster ◽  
Selection Of ◽  
Beam Deposition

scholarly journals Flexible and biocompatible microelectrode arrays fabricated by supersonic cluster beam deposition on SU-8

2011 ◽  
Vol 21 (4) ◽  
pp. 045013 ◽  
Author(s):  
Mattia Marelli ◽  
Giorgio Divitini ◽  
Cristian Collini ◽  
Luca Ravagnan ◽  
Gabriele Corbelli ◽  
...  
Keyword(s):  
Microelectrode Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Ionized-Cluster Beam Deposition

1975 ◽  
pp. 341-346 ◽  
Author(s):  
T. Takagi ◽  
I. Yamada ◽  
K. Yanagawa
Keyword(s):  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition

Gas Sensor Arrays by Supersonic Cluster Beam Deposition

2019 ◽  
pp. 282-284
Author(s):  
E. Barborini ◽  
M. Leccardi ◽  
G. Bertolini ◽  
O. Rorato ◽  
M. Franchi ◽  
...  
Keyword(s):  
Gas Sensor ◽  
Sensor Arrays ◽  
Cluster Beam ◽  
Cluster Beam Deposition ◽  
Beam Deposition ◽  
Gas Sensor Arrays

Photoluminescence and resonant Raman spectra of silicon films produced by size-selected cluster beam deposition

1997 ◽  
Vol 56 (11) ◽  
pp. 6958-6964 ◽  
Author(s):  
M. Ehbrecht ◽  
B. Kohn ◽  
F. Huisken ◽  
M. A. Laguna ◽  
V. Paillard
Keyword(s):  
Raman Spectra ◽  
Silicon Films ◽  
Cluster Beam ◽  
Resonant Raman ◽  
Cluster Beam Deposition ◽  
Beam Deposition
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