Microhardness of Thin SIO2 Films On Silicon.
AbstractHardness properties of CVD SiO2, films deposited on silicon substrates are investigated by microindentation techniques. It is found that the hardness of these films is sensitive to the thermal histories and doping and is less influenced by the residual stress levels.
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1983 ◽
Vol 130
(1)
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pp. 135-138
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2015 ◽
Vol 269
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pp. 47-53
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2008 ◽
Vol 222
(11)
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pp. 1325-1332
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