A New Recrystallization Technique for Large Area Thin Film Silicon on Glass Structure

1991 ◽  
Vol 224 ◽  
Author(s):  
Hiroshi Hayama ◽  
Masahito Mukainari ◽  
Takeshi Saito
Keyword(s):  
Thin Film ◽  
Grain Size ◽  
Eddy Currents ◽  
Glass Structure ◽  
Silicon Layer ◽  
Floating Zone ◽  
Large Area ◽  
Thin Film Silicon

AbstractA new recrystallization technique has been proposed, with which a large area thin film silicon on glass structure is able to be recrystallized. The technique utilizes self-heat-confinement caused by induction eddy currents, analogous to floating zone crystal refining technique. An experimental recrystallization system is shown. A recrystallized silicon layer with some hundred micron grain size was obtained with the system.

scholarly journals Silicon Thin-Film Solar Cells

2007 ◽  
Vol 2007 ◽  
pp. 1-12 ◽  
Author(s):  
Guy Beaucarne
Keyword(s):  
Thin Film ◽  
Grain Size ◽  
Solar Cells ◽  
Amorphous Silicon ◽  
Solid Phase ◽  
Active Material ◽  
Active Layer Thickness ◽  
Large Area ◽  
Bottom Cell ◽  
Thin Film Silicon

We review the field of thin-film silicon solar cells with an active layer thickness of a few micrometers. These technologies can potentially lead to low cost through lower material costs than conventional modules, but do not suffer from some critical drawbacks of other thin-film technologies, such as limited supply of basic materials or toxicity of the components. Amorphous Si technology is the oldest and best established thin-film silicon technology. Amorphous silicon is deposited at low temperature with plasma-enhanced chemical vapor deposition (PECVD). In spite of the fundamental limitation of this material due to its disorder and metastability, the technology is now gaining industrial momentum thanks to the entry of equipment manufacturers with experience with large-area PECVD. Microcrystalline Si (also called nanocrystalline Si) is a material with crystallites in the nanometer range in an amorphous matrix, and which contains less defects than amorphous silicon. Its lower bandgap makes it particularly appropriate as active material for the bottom cell in tandem and triple junction devices. The combination of an amorphous silicon top cell and a microcrystalline bottom cell has yielded promising results, but much work is needed to implement it on large-area and to limit light-induced degradation. Finally thin-film polysilicon solar cells, with grain size in the micrometer range, has recently emerged as an alternative photovoltaic technology. The layers have a grain size ranging from 1 μm to several tens of microns, and are formed at a temperature ranging from 600 to more than 1000∘C. Solid Phase Crystallization has yielded the best results so far but there has recently been fast progress with seed layer approaches, particularly those using the aluminum-induced crystallization technique.

scholarly journals Record 12.34% stabilized conversion efficiency in a large area thin-film silicon tandem (MICROMORPH™) module

2015 ◽  
Vol 23 (11) ◽  
pp. 1441-1447 ◽  
Author(s):  
Julian S. Cashmore ◽  
Marco Apolloni ◽  
Antonio Braga ◽  
Onur Caglar ◽  
Valentina Cervetto ◽  
...  
Keyword(s):  
Thin Film ◽  
Conversion Efficiency ◽  
Large Area ◽  
Thin Film Silicon

Thin film silicon PV: From R&D to large-area production equipment

2011 ◽  
Author(s):  
U. Kroll ◽  
J. Meier ◽  
S. Benagli ◽  
D. Borello ◽  
J. Steinhauser ◽  
...  
Keyword(s):  
Thin Film ◽  
Production Equipment ◽  
Large Area ◽  
Thin Film Silicon

Large area thin film silicon modules with 10% efficiency for production

2011 ◽  
Vol 8 (10) ◽  
pp. 2978-2981 ◽  
Author(s):  
Stefan Klein ◽  
Stephan Wieder ◽  
Susanne Buschbaum ◽  
Martin Rohde ◽  
Konrad Schwanitz ◽  
...  
Keyword(s):  
Thin Film ◽  
Large Area ◽  
Thin Film Silicon

Non-intrusive plasma diagnostics for the deposition of large area thin film silicon

2009 ◽  
Vol 517 (23) ◽  
pp. 6218-6224 ◽  
Author(s):  
A.A. Howling ◽  
B. Strahm ◽  
Ch Hollenstein
Keyword(s):  
Thin Film ◽  
Plasma Diagnostics ◽  
Large Area ◽  
Thin Film Silicon

Fabrication Techniques for Thin-Film Silicon Layer Transfer

2019 ◽  
Vol 3 (6) ◽  
pp. 67-73 ◽  
Author(s):  
Susan Holl ◽  
Ravi Varasala ◽  
Harshdeep Jawanda ◽  
C. A. Colinge ◽  
K. D. Hobart ◽  
...  
Keyword(s):  
Thin Film ◽  
Silicon Layer ◽  
Layer Transfer ◽  
Thin Film Silicon
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