Cadmium Sulphide Thin Films Grown By Atomic Layer Epitaxy

1991 ◽  
Vol 222 ◽  
Author(s):  
Aimo Rautiainen ◽  
Yrjö Koskinen ◽  
Jarmo Skarp ◽  
Sven Lindfors

ABSTRACTPolycrystalline cadmium sulphide (CdS) thin films were grown by Atomic Layer Epitaxy (ALE) using indium tin oxide and tin oxide coated glass substrates. Some of the experiments were made using elemental reactants, and others with inorganic compounds as reactants. Films were characterized using various techniques such as XRD, SEM and optical transmission spectroscopy. Growth rate of CdS films was observed to be 1/4 - 1/3 monolayer per cycle with elemental reactants. A full monolayer/cycle coverage was obtained when using CdCl2 and H2S as reactants. The crystalline structure of the CdS films wis β-cubic (111) when using elemental reactants. The mixed structure was observed when inorganic compounds were used as reactants. Only the hexagonal phase was observed, when substrate surface was pretreated before CdS deposition.

1995 ◽  
Vol 142 (10) ◽  
pp. 3538-3541 ◽  
Author(s):  
Timo Asikainen ◽  
Mikko Ritala ◽  
Markku Leskelä

1993 ◽  
Vol 310 ◽  
Author(s):  
Dong Heon Lee ◽  
Yong Soo Cho ◽  
Jeon Kook Lee ◽  
Hyung Jin Jung

AbstractVarious dielectric thin films have been studied for electroluminescence display (ELD) application to improve dielectric constant and breakdown voltage. In this work, amorphous BaTiO3 thin films were deposited on indium tin oxide (ITO) - coated glass substrates by atomic layer epitaxy (ALE) using metalorganic precursors. Influences of deposition conditions on microstructure, interface characteristics and dielectric properties are investigated. It was possible to obtain dielectric films with good dielectric properties and textured, flat surface microstructure without defects due to the improvement of qualities of the grown films. These results were examined by XRD, SEM and AES analysis.


2008 ◽  
Vol 112 (6) ◽  
pp. 1938-1945 ◽  
Author(s):  
Jeffrey W. Elam ◽  
David A. Baker ◽  
Alex B. F. Martinson ◽  
Michael J. Pellin ◽  
Joseph T. Hupp

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte

1996 ◽  
Vol 6 (1) ◽  
pp. 27-31 ◽  
Author(s):  
Minna Nieminen ◽  
Lauri Niinistö ◽  
Eero Rauhala

1990 ◽  
Vol 186 (2) ◽  
pp. 349-360 ◽  
Author(s):  
G. Sberveglieri ◽  
P. Benussi ◽  
G. Coccoli ◽  
S. Groppelli ◽  
P. Nelli

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