X-Ray Double Crystal Diffraction Characterization of Epitaxial Magnetic Transiton Metal Difluorides

1990 ◽  
Vol 187 ◽  
Author(s):  
M. Lui ◽  
A. R. King ◽  
V. Jaccarino ◽  
R. F. C. Farrow ◽  
S. S. P. Parkins
Keyword(s):  
Lattice Mismatch ◽  
Magnetic Transition ◽  
Diffraction Theory ◽  
Epitaxial Films ◽  
Structural Quality ◽  
Double Crystal ◽  
Lattice Match ◽  
Rocking Curve ◽  
X Ray ◽  
Quality Material

AbstractEpitaxial films of a variety of magnetic transition metal difluoride films have been grown by molecular beam epitaxy techniques. The structural quality of these films have been characterized using X-ray double crystal rocking curve analysis. The observed rocking curve linewidths were compared to their intrinsic values as calculated by dynamical diffraction theory. The degree of crystalline perfection as judge by the rocking curves have been correlated with the amount of lattice mismatch between the various epitaxial films and substrates. In the well lattice match case (Δa/a < 0.2%) of epitaxial films of FeF2 and CoF2 grown on (001) ZnF2 substrates, the rocking curve line widths approached their intrinsic limit indicative of extremely high quality material. This work represents some of the best epitaxial magnetic insulating films grown to date.

Thermal Strain Study of Almost Lattice-Matched Epitaxial InuGa1-uAs1-vP1-v Films on InP(100) Substrates

1989 ◽  
Vol 160 ◽  
Author(s):  
G. Bai ◽  
M-A. Nicolet ◽  
S.-J. Kim ◽  
R.G. Sobers ◽  
J.W. Lee ◽  
...  
Keyword(s):  
Room Temperature ◽  
Epitaxial Film ◽  
Lattice Mismatch ◽  
Thermal Strain ◽  
Growth Direction ◽  
Epitaxial Films ◽  
Double Crystal ◽  
X Ray ◽  
Lattice Matched ◽  
Coherent Interfaces

AbstractSingle layers of ~ 0.5µm thick InuGa1-uAs1-vPv (0.52 < u < 0.63 and 0.03 < v < 0.16) were grown epitaxially on InP(100) substrates by liquid phase epitaxy at ~ 630°C. The compositions of the films were chosen to yield a constant banndgap of ~ 0.8 eV (λ = 1.55 µm) at room temperature. The lattice mismatch at room temperature between the epitaxial film and the substrate varies from - 4 × 10-3 to + 4 × 10-3. The strain in the films was characterized in air by x-ray double crystal diffractometry with a controllable heating stage from 23°C to ~ 700°C. All the samples have an almost coherent interfaces from 23°C to about ~ 330°C with the lattice mismatch accomodated mainly by the tetragonal distortion of the epitaxial films. In this temperature range, the x-ray strain in the growth direction increases linearly with temperature at a rate of (2.0 ± 0.4) × 10-6/°C and the strain state of the films is reversible. Once the samples are heated above ~ 300°C, a significant irreversible deterioration of the epitaxial films sets in.

Digital X-Ray Rocking Curve Topography

1986 ◽  
Vol 82 ◽  
Author(s):  
T. S. Ananthanarayanan ◽  
R. G. Rosemeier ◽  
W. E. Mayo ◽  
J. H. Dinan
Keyword(s):  
Bragg Reflection ◽  
Strain Tensor ◽  
Epitaxial Films ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Density Maps ◽  
First Time ◽  
Considerable Body ◽  
Double Crystal Diffractometer

SUMMARYThere is a considerable body of work available illustrating the significance of X-ray rocking curve measurements in micro-electronic applications. For the first time a high resolution (100-150µm) 2-dimensional technique called DARC (Digital Autcmated Rocking Curve) topography has been implemented. This method is an enhancement of the conventional double crystal diffractometer using a real time 2-dimensional X-ray detector.Several materials have been successfully examined using DARC topography. Same of these include: Si, GaAs, AlGaAs, InGaAs, HgMnTe, Al, Inconel, steels, etc. By choosing the appropriate Bragg reflection multi-layered micro-electronic structures have been analyzed nondestructively. Several epitaxial films, including HgCdTe and ZnCdTe, grown by molecular beam epitaxy, have also been characterized using iARC topography. The rocking curve half width maps can be translated to dislocation density maps with relative ease. This technique also allows the deconvolution of the micro-plastic lattice strain ccaponent from the total strain tensor.

Subsurface Micro-Lattice Strain Mapping

1986 ◽  
Vol 90 ◽  
Author(s):  
T. S. Ananthanarayanan ◽  
R. G. Rosemeier ◽  
W. E. Mayo ◽  
P. Becla
Keyword(s):  
Diffraction Method ◽  
Epitaxial Films ◽  
Depth Of Penetration ◽  
Ir Detector ◽  
Strain Mapping ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Microplastic Strain ◽  
Invaluable Tool

SYNOPSISDefect morphology and distribution up to depths of 20um have been shown to be critical to device performance in micro-electronic applications. A unique and novel x-ray diffraction method called DARC (Digital Automated Rocking Curve) topography has been effectively utilized to map crystalline micro-lattice strains in various substrates and epitaxial films. The spatial resolution of this technique is in the the order of 100um and the analysis time for a 2cm2 area is about 10 secs. DARC topography incorporates state-ofthe- art 1-dimensional and 2-dimensional X-ray detectors to modify a conventional Double Crystal Diffractometer to obtain color x-ray rocking curve topographs.This technique, being non-destructive and non-intrusive in nature, is an invaluable tool in materials’ quality control for IR detector fabrication. The DARC topographs clearly delineate areas of microplastic strain inhomogeniety. Materials analyzed using this technique include HgMnTe, HgCdTe, BaF2, PbSe, PbS both substrates and epitaxial films. By varying the incident x-ray beam wavelength the depth of penetration can be adjusted from a 1–2 micron up to 15–20um. This can easily be achieved in a synchrotron.

X-Ray Studies of GaAs/Si and ZnS/Si

1988 ◽  
Vol 144 ◽  
Author(s):  
H. M. Kim ◽  
Y-W Choi ◽  
S. Vernon ◽  
P. S. Moise ◽  
C. R. Wie
Keyword(s):  
Phase Contrast ◽  
Lattice Mismatch ◽  
Phase Contrast Microscopy ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Thermal Expansion Coefficients ◽  
Dislocation Densities ◽  
Contrast Microscopy ◽  
Expansion Coefficients

ABSTRACTThe MOCVD-grown layers of GaAs/Si(001), InP/GaAs/Si(001), and ZnS/Si(111) were studied using X-ray rocking curve (XRC), double crystal topography (DCT), and Nomarski phase contrast microscopy. The layer qualities of GaAs/Si, InP/GaAs, and InP/GaAs/Si from the XRC full width at half maximum (FWHM) agreed well with these determined from the Nomarski phase contrast microscopy. The in-plane lattice mismatch (parallel X-ray strain) was 3.71% for GaAs/Si. In the double heteroepitaxial layer (InP/GaAs/Si), the parallel X-ray strain of GaAs was 4.03% with respect to Si. The parallel X-ray strain was larger than the perpendicular X-ray strain in GaAs/Si, perhaps due to the mismatch in thermal expansion coefficients between GaAs and Si. Dislocation densities estimated from the rocking curve linewidth were 5.30 × 107 cm−2 for GaAs/Si, 3.27 × 108 cm−2 for InP/GaAs. We also present the double crystal X-ray topographs of the III-V/Si and II-VI/Si samples.

X-ray diffraction properties of curved crystal diffractors

1992 ◽  
Vol 50 (2) ◽  
pp. 1734-1735
Author(s):  
W. Z. Chang ◽  
D. B. Wittry
Keyword(s):  
Diffraction Theory ◽  
X Rays ◽  
Diffraction Image ◽  
X Ray Diffraction ◽  
Rocking Curve ◽  
X Ray ◽  
Bent Crystal ◽  
Diffraction Geometry ◽  
Crystal Parameter ◽  
Quantitative Procedure

Since Du Mond and Kirkpatrick first discussed the principle of a bent crystal spectrograph in 1930, curved single crystals have been widely utilized as spectrometric monochromators as well as diffractors for focusing x rays diverging from a point. Curved crystal diffraction theory predicts that the diffraction parameters - the rocking curve width w, and the peak reflection coefficient r of curved crystals will certainly deviate from those of their flat form. Due to a lack of curved crystal parameter data in current literature and the need for optimizing the choice of diffraction geometry and crystal materials for various applications, we have continued the investigation of our technique presented at the last conference. In the present abstract, we describe a more rigorous and quantitative procedure for measuring the parameters of curved crystals.The diffraction image of a singly bent crystal under study can be obtained by using the Johann geometry with an x-ray point source.

Accurate Lattice Constant and Mismatch Measurements of SiC Heterostructures by X-Ray Multiple-Order Reflections

2002 ◽  
Vol 742 ◽  
Author(s):  
XianRong Huang ◽  
Michael Dudley ◽  
Philip G. Neudeck ◽  
J. Anthony Powell
Keyword(s):  
Lattice Mismatch ◽  
Strain Relaxation ◽  
Relaxation Mechanism ◽  
X Ray Diffraction ◽  
Crystalline Perfection ◽  
Coherent Interface ◽  
Rocking Curve ◽  
X Ray ◽  
Lattice Planes ◽  
Atomically Flat

ABSTRACTHigh-resolution X-ray diffraction (HRXRD) combined with other diffraction techniques is applied to characterize 3C SiC epilayers hoteroepitaxially grown on atomically flat mesas on 4H and 6H SiC substrates. Small-beam rocking curve scan and reciprocal mapping show extremely high crystalline perfection and homogeneity of the ideally grown 3C-SiC epilayers. Accurate lattice measurements based on X-ray multiple-order reflections reveal that: 1) no misorientation between the (0001) lattice planes across the 4H/3C or 6H/3C interface is detected, confirming the 2D nucleation mechanism of the 3C epilayer from a flat coherent interface; 2) in-plane substrate/epilayer lattice mismatch always exists, but the 3C epilayers do not correspond to a completely relaxed cubic structure, indicating that the epilayers are partially strained; 3) lattice mismatch varies for different regions, implying a complicated strain relaxation mechanism of 3C epilayers on various mesas.

Defect structure analysis of polycrystalline materials by computer-controlled double-crystal diffractometer with position-sensitive detector

1983 ◽  
Vol 16 (1) ◽  
pp. 89-95 ◽  
Author(s):  
R. Yazici ◽  
W. Mayo ◽  
T. Takemoto ◽  
S. Weissmann
Keyword(s):  
Position Sensitive Detector ◽  
Polycrystalline Materials ◽  
Sensitive Detector ◽  
Double Crystal ◽  
Rocking Curve ◽  
X Ray ◽  
Local Lattice ◽  
Position Sensitive ◽  
The Individual ◽  
Double Crystal Diffractometer

The method represents an extension of a previously developed X-ray double-crystal diffractometer method when a film was used to record the crystallite reflections, each reflecting crystallite being regarded as the second crystal of a double-crystal diffractometer. By utilizing a position-sensitive detector (PSD) with interactive computer controls, the tedious and limiting task of data acquisition and analysis is greatly simplified. The specimen is irradiated with crystal-monochromated radiation and the numerous microscopic spots emanating from the reflecting crystallites are recorded separately by the position-sensitive detector and its associated multichannel analyzer at each increment of specimen rotation. An on-line minicomputer simultaneously collects these data and applies the necessary corrections. This process is then automatically repeated through the full rocking-curve range. The computer carries out the rocking-curve analysis of the individual crystallite reflections as well as that of the entire reflecting crystallite population. The instrument is provided with a specimen translation device which permits analysis of large sections of solid specimens. Thus, sites of local lattice defects induced either mechanically, chemically or by radiation can rapidly be established and quantitatively determined in terms of rocking-curve parameters as well as imaged by X-ray topography, by inserting a film in front of the PSD. The versatility and usefulness of the method is demonstrated by examples given from studies of fracture, fatigue and stress-corrosion cracking of commercial alloys.

Position of exit X-rays from rotated-inclined double-crystal monochromators

1998 ◽  
Vol 5 (3) ◽  
pp. 679-681 ◽  
Author(s):  
Yasuharu Kashihara ◽  
Hiroshi Yamazaki ◽  
Kenji Tamasaku ◽  
Tetsuya Ishikawa
Keyword(s):  
Heat Load ◽  
Diffraction Theory ◽  
Third Generation ◽  
X Rays ◽  
Double Crystal ◽  
Undulator Radiation ◽  
X Ray ◽  
Double Crystal Monochromator ◽  
Asymmetric Reflection ◽  
Wide Range

The rotated-inclined double-crystal monochromator (RIDCM) has been adopted to reduce the heat load from third-generation undulator radiation. The position of the exit X-rays from RIDCM has been calculated as a function of X-ray energy on the basis of diffraction theory including refraction effects. The results show that the positions of the exit X-rays vary over a wide range due to asymmetric reflection. Methods of fixing the exit position in RIDCM are also discussed.

TEM Study of the Morphology Of GaN/SiC (0001) Grown at Various Temperatures by MBE

1999 ◽  
Vol 595 ◽  
Author(s):  
W.L. Sarney ◽  
L. Salamanca-Riba ◽  
V. Ramachandran ◽  
R.M Feenstra ◽  
D.W. Greve
Keyword(s):  
Low Temperatures ◽  
Stacking Faults ◽  
Full Width ◽  
X Ray Diffraction ◽  
High Quality ◽  
Double Crystal ◽  
Tem Analysis ◽  
Rocking Curve ◽  
X Ray ◽  
Substrate Temperatures

AbstractGaN films grown on SiC (0001) by MBE at various substrate temperatures (600° - 750° C) were characterized by RHEED, STM, x-ray diffraction, AFM and TEM. This work focuses on the TEM analysis of the films' features, such as stacking faults and dislocations, which are related to the substrate temperature. There are several basal plane stacking faults in the form of cubic inclusions for samples grown at low temperatures compared to those grown at high temperatures. The dislocation density is greatest for the film grown at 600°C, and it steadily decreases with increasing growth temperatures. Despite the presence of various defects, x-ray analysis shows that the GaN films are of high quality. The double crystal rocking curve full width at half maximum (FWHM) for the GaN (0002) peak is less than 2 arc-minutes for all of the films we measured and it decreases with increasing growth temperature.

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