Structure and Properties of C-Axis Oriented AlN Films Reactively Deposited by DC Planar Magnetron Sputtering

1989 ◽  
Vol 167 ◽  
Author(s):  
Takakazu Takahashi ◽  
Fumio Takeda ◽  
Masahiko Naoe
Keyword(s):  
Magnetron Sputtering ◽  
Film Plane ◽  
Dielectric Constants ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Cross Sectional ◽  
X Ray ◽  
Planar Magnetron ◽  
Diffraction Peaks ◽  
Ambient Gas

AbstractAluminum nitride (AlN) films have been deposited by reactive DC planar magnetron sputtering at a low substrate temperature of 80°C. An Al disk and either N2 or NH3 were used as a target and an ambient gas, respectively. In films deposited in N2, the c-axis of AlN crystallites was perpendicular to the film plane. On the other hand, in NH3, X-ray diffraction peaks from (100), (110) and (200) were observed. The surface and the cross-sectional microstructures of AlN films deposited in N2 were significantly different from that deposited in NH3. The surface of films deposited in NH3 was smoother than that deposited in N2. The transmittivity of films deposited in NH3 was superior to that deposited in N2 in wavelength of 275∼450 nm. Resistivities of films deposited in N2 and in NH3 were 1014sim;1015 Ω · cm. Dielectric constants of films deposited in N2, and of that deposited in NH3, were 9.7, and 9, respectively, in a frequency range of 20 kHz to 20 MHz. The structure and the properties of AlN films deposited by this method depended on kind of ambient gas.

Deposition of aluminum Oxynitride Films by Magnetron Sputtering: Effect of Bombardment and Substrate Heating on Structural and Mechanical Properties

1995 ◽  
Vol 388 ◽  
Author(s):  
Russell V. Smilgys ◽  
Eric Takamura ◽  
Irwin L. Singer ◽  
Steven W. Robey ◽  
Douglas A. Kirkpatrick
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Aluminum Oxynitride ◽  
X Ray Diffraction ◽  
Etch Pits ◽  
X Ray ◽  
Substrate Heating ◽  
Glass Substrates ◽  
Planar Magnetron ◽  
Continuous Indentation

ABSTRACTAluminum oxynitride films, 1 μm thick, are deposited onto glass substrates by planar magnetron sputtering from an alumina target in a mixture of nitrogen and argon. one set of films is deposited onto glass substrates that are heat sunk to a holder, whose temperature is held below 100°C. a second set of films is deposited onto glass substrates that are mechanically clamped to a holder, whose temperature is allowed to rise up to 250°C. Characterization by continuous indentation testing, secondary electron microscopy, and x-ray diffraction reveals significant differences in mechanical properties and surface structure between the two sets of films. Films deposited with holder cooling have a smooth surface and no evidence of crystallinity; films deposited without holder cooling have etch pits on their surface that vary with position across the substrate. the later films show crystallinity and have twice the hardness and a 60% greater elastic modulus.

Evolution of Nanoindentation Hardness of Fe/Cu Nanometer-Scale Multilayers by Magnetron Sputtering

2008 ◽  
Vol 373-374 ◽  
pp. 104-107 ◽  
Author(s):  
J. Gao ◽  
Z.L. Wu ◽  
Z.P. Zhang ◽  
B.S. Cao ◽  
M.K. Lei
Keyword(s):  
Magnetron Sputtering ◽  
Nanometer Scale ◽  
X Ray Diffraction ◽  
Cross Sectional ◽  
X Ray ◽  
Transmission Electron ◽  
Modulus Difference ◽  
Nanoindentation Hardness ◽  
Modulation Wavelength ◽  
Peak Value

Fe/Cu nanometer-scale multilayers with nominal modulation wavelengths ranging from 5 to 40 nm are deposited by direct current magnetron sputtering on Si (100) substrates. Modulation structures of the multilayers are examined by small angle / wide angle x-ray diffraction (SA/WAXRD) and cross-sectional transmission electron microscopy (XTEM). Hardness of the multilayers is measured by using nanoindentation. All the multilayers have Fe (110) and Cu (111) textures. Interface coherency is observed in the multilayers with designed modulation wavelengths of 5 and 10 nm. The hardness increases firstly and then deceases with increasing the modulation wavelength, and reaches peak value of 7.29±0.29 GPa in the multilayers with nominal modulation wavelength of 10 nm. The evolution of the hardness of the mulitlayers is explained by interface width and modulus difference between sublayers.

Comparative Study on the Structure and Properties of Japanese and Self-Made Precursors

2011 ◽  
Vol 317-319 ◽  
pp. 292-296
Author(s):  
Bao Hua Ji
Keyword(s):  
Comparative Study ◽  
Crystal Size ◽  
Cyano Group ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Compact Structure ◽  
Cross Sectional ◽  
Xrd Pattern ◽  
X Ray ◽  
Infrared Spectrometer

In order to release the important information on the structural constitution of Japanese precursor, comparative study on structure and properties of Japanese and self-made precursors were carried out by X-ray Diffraction (XRD), infrared spectrometer (FTIR), element content analysis and the breaking tenacity. It was found that Japanese precursor contains cyano group (–CN) and may contain styrene sulfonic acid amine, while not containing the carboxyl and ester carbonyl, that is, not containing MA. The XRD pattern of Japanese precursor around 10° appears a new crystalline diffraction peak, and the crystal size becomes lower. The cross-sectional shapes of Japanese precursor are circle, with uniform and compact structure, thus its mechanical properties is superior.

Preparation of Diamond Nanocrystallites in Powder by Using a Coaxial Arc Plasma Gun

2012 ◽  
Vol 1395 ◽  
Author(s):  
Aki Tominaga ◽  
Kenji Hanada ◽  
Tomohiro Yoshida ◽  
Tsuyoshi Yoshitake
Keyword(s):  
Diamond Powder ◽  
Hydrogen Atmosphere ◽  
Arc Plasma ◽  
X Ray Diffraction ◽  
Plasma Gun ◽  
X Ray ◽  
Crystallite Sizes ◽  
Diamond Crystallite ◽  
Diffraction Peaks ◽  
Ambient Gas

ABSTRACTWe suggest a new method for fabricating diamond nanoclusters by employing a coaxial arc plasma gun. Diamond powder comprised of diamond nanoclusters and amorphous carbon was fabricated in vacuum and a hydrogen atmosphere, and the diamond crystallite sizes were estimated to be 1.8, 2.3, and 2.3 nm for the powders prepared at hydrogen pressures of 0, 53.3, and 159.6 Pa respectively, from the X-ray diffraction peaks. The hydrogen ambient gas is not necessarily required for the diamond nanoclusters formation. We consider that this method enables us to form diamond nanoclusters in nucleation owing to a supersaturated condition at a facing plate located in front of an arc plasma gun.

Control of the phase composition of advanced calcium phosphates using an x-ray diffractometer with a curved position-sensitive detector

2020 ◽  
Vol 86 (6) ◽  
pp. 29-35
Author(s):  
V. P. Sirotinkin ◽  
O. V. Baranov ◽  
A. Yu. Fedotov ◽  
S. M. Barinov
Keyword(s):  
Phase Composition ◽  
Calcium Phosphates ◽  
Position Sensitive Detector ◽  
Sensitive Detector ◽  
X Ray Diffraction ◽  
X Ray ◽  
Impurity Phases ◽  
Position Sensitive ◽  
Diffraction Peaks ◽  
Diffraction Patterns

The results of studying the phase composition of advanced calcium phosphates Ca10(PO4)6(OH)2, β-Ca3(PO4)2, α-Ca3(PO4)2, CaHPO4 · 2H2O, Ca8(HPO4)2(PO4)4 · 5H2O using an x-ray diffractometer with a curved position-sensitive detector are presented. Optimal experimental conditions (angular positions of the x-ray tube and detector, size of the slits, exposure time) were determined with allowance for possible formation of the impurity phases during synthesis. The construction features of diffractometers with a position-sensitive detector affecting the profile characteristics of x-ray diffraction peaks are considered. The composition for calibration of the diffractometer (a mixture of sodium acetate and yttrium oxide) was determined. Theoretical x-ray diffraction patterns for corresponding calcium phosphates are constructed on the basis of the literature data. These x-ray diffraction patterns were used to determine the phase composition of the advanced calcium phosphates. The features of advanced calcium phosphates, which should be taken into account during the phase analysis, are indicated. The powder of high-temperature form of tricalcium phosphate strongly adsorbs water from the environment. A strong texture is observed on the x-ray diffraction spectra of dicalcium phosphate dihydrate. A rather specific x-ray diffraction pattern of octacalcium phosphate pentahydrate revealed the only one strong peak at small angles. In all cases, significant deviations are observed for the recorded angular positions and relative intensity of the diffraction peaks. The results of the study of experimentally obtained mixtures of calcium phosphate are presented. It is shown that the graphic comparison of experimental x-ray diffraction spectra and pre-recorded spectra of the reference calcium phosphates and possible impurity phases is the most effective method. In this case, there is no need for calibration. When using this method, the total time for analysis of one sample is no more than 10 min.

X- ray diffraction and dielectric properties of PbSe thin films

2019 ◽  
Vol 15 (34) ◽  
pp. 1-14
Author(s):  
Bushra A. Hasan
Keyword(s):  
Thin Films ◽  
Thermal Activation ◽  
Thermal Evaporation ◽  
Thermal Activation Energy ◽  
Dielectric Constants ◽  
Conductivity Measurements ◽  
X Ray Diffraction ◽  
Thermal Evaporation Method ◽  
X Ray ◽  
Glass Substrates

Lead selenide PbSe thin films of different thicknesses (300, 500, and 700 nm) were deposited under vacuum using thermal evaporation method on glass substrates. X-ray diffraction measurements showed that increasing of thickness lead to well crystallize the prepared samples, such that the crystallite size increases while the dislocation density decreases with thickness increasing. A.C conductivity, dielectric constants, and loss tangent are studied as function to thickness, frequency (10kHz-10MHz) and temperatures (293K-493K). The conductivity measurements confirm confirmed that hopping is the mechanism responsible for the conduction process. Increasing of thickness decreases the thermal activation energy estimated from Arhinus equation is found to decrease with thickness increasing. The increase of thickness lead to reduce the polarizability α while the increasing of temperature lead to increase α.

scholarly journals Multi-Scale Studies of 3D Printed Mn–Na–W/SiO2 Catalyst for Oxidative Coupling of Methane

Catalysts ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 290
Author(s):  
Tim Karsten ◽  
Vesna Middelkoop ◽  
Dorota Matras ◽  
Antonis Vamvakeros ◽  
Stephen Poulston ◽  
...  
Keyword(s):  
Oxidative Coupling ◽  
Oxidative Coupling Of Methane ◽  
Operating Conditions ◽  
Homogeneous Distribution ◽  
Silica Support ◽  
X Ray Diffraction ◽  
Cross Sectional ◽  
X Ray ◽  
Multi Scale ◽  
3D Printed

This work presents multi-scale approaches to investigate 3D printed structured Mn–Na–W/SiO2 catalysts used for the oxidative coupling of methane (OCM) reaction. The performance of the 3D printed catalysts has been compared to their conventional analogues, packed beds of pellets and powder. The physicochemical properties of the 3D printed catalysts were investigated using scanning electron microscopy, nitrogen adsorption and X-ray diffraction (XRD). Performance and durability tests of the 3D printed catalysts were conducted in the laboratory and in a miniplant under real reaction conditions. In addition, synchrotron-based X-ray diffraction computed tomography technique (XRD-CT) was employed to obtain cross sectional maps at three different positions selected within the 3D printed catalyst body during the OCM reaction. The maps revealed the evolution of catalyst active phases and silica support on spatial and temporal scales within the interiors of the 3D printed catalyst under operating conditions. These results were accompanied with SEM-EDS analysis that indicated a homogeneous distribution of the active catalyst particles across the silica support.

scholarly journals Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO4 Thin Films

Surfaces ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 106-114
Author(s):  
Yannick Hermans ◽  
Faraz Mehmood ◽  
Kerstin Lakus-Wollny ◽  
Jan P. Hofmann ◽  
Thomas Mayer ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Fast Method ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Post Annealing ◽  
Rf Signal ◽  
First Time

Thin films of ZnWO4, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was changed so that it would match the sputtering rate of the W target operated at 25 W. The effects of the process parameters were characterized using optical spectroscopy, X-ray diffraction, and scanning electron microscopy, including energy dispersive X-ray spectroscopy as well as X-ray photoelectron spectroscopy. It was found that stoichiometric microcrystalline ZnWO4 thin films could be obtained, by operating the ZnO target during the sputtering procedure at a power of 55 W and by post-annealing the resulting thin films for at least 10 h at 600 °C. As FTO coated glass substrates were used, annealing led as well to the incorporation of Na, resulting in n+ doped ZnWO4 thin films.

scholarly journals Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering

Materials ◽  
2021 ◽  
Vol 14 (12) ◽  
pp. 3191
Author(s):  
Arun Kumar Mukhopadhyay ◽  
Avishek Roy ◽  
Gourab Bhattacharjee ◽  
Sadhan Chandra Das ◽  
Abhijit Majumdar ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Photoelectron Spectroscopy ◽  
Film Surface ◽  
Grazing Incidence ◽  
X Ray Diffraction ◽  
X Ray ◽  
Relative Composition ◽  
Transmission Electron ◽  
Deposited Film ◽  
Deposited Films

We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.

scholarly journals Effects of Thermal Annealing on the Properties of Zirconium-Doped MgxZn1−XO Films Obtained through Radio-Frequency Magnetron Sputtering

Membranes ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 373
Author(s):  
Wen-Yen Lin ◽  
Feng-Tsun Chien ◽  
Hsien-Chin Chiu ◽  
Jinn-Kong Sheu ◽  
Kuang-Po Hsueh
Keyword(s):  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Photoelectron Spectroscopy ◽  
Annealing Temperature ◽  
Radio Frequency Magnetron ◽  
Radio Frequency Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Free Electrons ◽  
X Ray ◽  
Mg Content

Zirconium-doped MgxZn1−xO (Zr-doped MZO) mixed-oxide films were investigated, and the temperature sensitivity of their electric and optical properties was characterized. Zr-doped MZO films were deposited through radio-frequency magnetron sputtering using a 4-inch ZnO/MgO/ZrO2 (75/20/5 wt%) target. Hall measurement, X-ray diffraction (XRD), transmittance, and X-ray photoelectron spectroscopy (XPS) data were obtained. The lowest sheet resistance, highest mobility, and highest concentration were 1.30 × 103 Ω/sq, 4.46 cm2/Vs, and 7.28 × 1019 cm−3, respectively. The XRD spectra of the as-grown and annealed Zr-doped MZO films contained MgxZn1−xO(002) and ZrO2(200) coupled with Mg(OH)2(101) at 34.49°, 34.88°, and 38.017°, respectively. The intensity of the XRD peak near 34.88° decreased with temperature because the films that segregated Zr4+ from ZrO2(200) increased. The absorption edges of the films were at approximately 348 nm under 80% transmittance because of the Mg content. XPS revealed that the amount of Zr4+ increased with the annealing temperature. Zr is a potentially promising double donor, providing up to two extra free electrons per ion when used in place of Zn2+.

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