Modeling of the Diffusion of Hydrogen in Silicon
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P Type
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AbstractA model is proposed to describe hydrogen motion in silicon near 150°C. This model leads to a consistent view of H° behaviour in low doped n and p-type Si, with a diffusivity in agreement with the high temperature data. On the other hand, a systematic variation of DH+ with the boron concentration forces us to conclude that some still unknown interactions take place and contribute to hydrogen trapping in highly doped p-Si.
2013 ◽
Vol 551
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pp. 551-555
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1998 ◽
Vol 53
(11-12)
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pp. 1049-1054
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2009 ◽
Vol 615-617
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pp. 683-686
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2016 ◽
Vol 09
(06)
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pp. 1642005
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1995 ◽
Vol 100
(1-2)
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pp. 169-176
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2016 ◽
2021 ◽
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