A Stable n-Channel Indium Phosphide Field-Effect Transistor with an Amorphous Hydrogenated Silicon Gate
Keyword(s):
AbstractInP field-effect transistors fabricated with an amorphous hydrogenated Si (a-Si:H) gate resulted in metal-insulator-like FET characteristics with no observable current drift and a transconductance of 30–38 mS/mm. The high stability of this gate system is attributed to the low temperature of deposition and the hydrogen passivation of the InP surface.
2018 ◽
Vol 4
(11)
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pp. 1870051
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2016 ◽
Vol 4
(37)
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pp. 8758-8764
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2000 ◽
Vol 360
(1-2)
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pp. 256-260
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