X-Ray and Raman Topographic Studies of Gaas Implanted With 28Si+ and Pulsed Laser Annealed

1989 ◽  
Vol 157 ◽  
Author(s):  
R.C. Bowman ◽  
J.F. Knudsen ◽  
P.M. Adams ◽  
H.D. Yao ◽  
A.D. Compaan

ABSTRACTDouble-crystal x-ray diffraction and topography, along with Raman spectroscopy and topography are used to study lattice reconstruction and carrier activation for pulsed laser annealed Si implanted GaAs. Although lattice strain is essentially eliminated, along with the production of carrier concentrations to about 3×1019 cm.3 at the center of laser annealed spots, incomplete removal of implant induced disorder and little dopant activation are observed in surrounding areas. Correlations of Raman and x-ray topographs suggest that concentric regions of partial melting, but without epitaxial regrowth, occur in the periphery of the laser annealed spots.

1988 ◽  
Vol 144 ◽  
Author(s):  
R. C. Bowman ◽  
P. M. Adams ◽  
M. H. Herman ◽  
S. E. Buttrill

ABSTRACTRaman scattering, double-crystal x-ray diffraction, and electron beam electroreflectance have been used to assess the damage produced in undoped (100)-GaAs by boron ion implants and the influence of post-implant anneals. Both conventional furnace and rapid thermal annealing treatments were found to remove much of the lattice strain created by the implants. However, considerable disorder also remains after these anneals.


1997 ◽  
Vol 496 ◽  
Author(s):  
D. S. Ginley ◽  
J. D. Perkins ◽  
J. M. McGraw ◽  
P. A. Parilla ◽  
M.L. Fu ◽  
...  

AbstractWe report on the use of pulsed laser depositon (PLD) to grow thin films of LiCoO2 on a number of low cost substrates including SnO2 coated Upilex, stainless steel and SnO2 coated glass. Highly textured (001) films grown on CVD deposited SnO2 films on 7059 glass, were obtained at 200 to 500 mTorr O2 and a temperature of 500 C. Similar texture was not obtained on the stainless or Upilex however dense films from crystalline to amorphous were obtained. The films were characterized by x-ray diffraction and Raman spectroscopy.


1989 ◽  
Vol 147 ◽  
Author(s):  
K. L. Kavanagh ◽  
G. S. Cargill ◽  
R. F. Boehme ◽  
J. C. P. Chang

AbstractHeavily doped Si:Ga has been prepared by liquid phase epitaxy (LPE) and by ionimplantation with rapid thermal annealing (RTA) or laser annealing (LA). Peak substitutional Ga concentrations obtained by each technique were 1.5, 2.5 and 2.9 ×1020cm-3, respectively. Substitutional fractions (>90%) were similar in the three types of samples, and the conductivity scaled with the total Ga concentration. A lattice expansion per substitutional Ga atom in Si of +0.9 ± 0. l×10-24cm3 /atom was measured by double crystal x-ray diffraction. The average nearest neighbor Si-Ga bond length measured with extended x-ray absorption fine structure (EXAFS) was 0.237 ± 0.004 nm, indistinguishable, to within experimental error, from the intrinsic Si-Si bond lngth, 0.235 nm. Combining these two results the lattice strain per hole in the Si valence band was calculated, +0.4 ± 0.8x10G-cm3. This result complements the lattice contraction per electron in the Si conduction band (-1.8 ± 0.4x10-24cm 3) already reported for Si:As [G. S. Cargill III, J. Angilelloand K. L. Kavanagh, Phys. Rev. Letters 61, 1748 (1988)].


1990 ◽  
Vol 34 ◽  
pp. 531-541
Author(s):  
P. M. Adams ◽  
J. F. Knudsen ◽  
R. C. Bowman

Ion-implantation has many applications in the fabrication and processing of microelectronic devices from semiconductors, but thermal treatments are required to remove defects produced by the implant and to electrically activate dopants. Recently, pulsed laser annealing has been used to activate surface layers of GaAs that have been heavily doped with 28Si+ by ion implantation, and carrier concentrations of > 1 x 1019 cm-3 have been achieved (Ref. 1). Double-crystal x-ray diffraction techniques are very sensitive to strains and defects in single crystals and provide a means for characterizing and quantifying the damage produced by ion-implantation and the subsequent relief of damage by pulsed laser annealing.


2020 ◽  
Vol 2020 ◽  
pp. 1-7
Author(s):  
O. A. Maslova ◽  
Yu. I. Yuzyuk ◽  
S. A. Barannikova

This work is aimed at studying asymmetric BaTiO31 − xΛ/BaZrO3xΛ ((BT) 1−xΛ/(BZ)xΛ) superlattices, grown by pulsed laser deposition onto (001) MgO substrates. The thicknesses of BT (ferroelectric) and BZ (paraelectric) layers were varied so that х ranged from 0 to 1 at a modulation period Λ of about 80 Å. The films were 400 nm thick. The out-of-plane lattice parameters of constituents were assessed using X-ray diffraction. The lattice dynamic peculiarities of superlattices were probed via Raman spectroscopy; special attention is paid to the analysis of E(1TO) and A1(2TO) ferroelectric soft modes. A comparative analysis of data acquired via both experimental techniques reveals the enhancement of stress between BT and BZ layers with a decrease in symmetry from the tetragonal to a monoclinic phase due to strains induced by the lattice parameter mismatch between the constituents.


1990 ◽  
Vol 216 ◽  
Author(s):  
H. Uekita ◽  
N. Kitamura ◽  
M. Ichimura ◽  
A. Usami ◽  
T. Wada

ABSTRACTGaSb, AlxGa1-xSb, and AlxGa1-xSb epitaxial layers were grown by the liquid-phase epitaxy and characterized by photoluminescence, Raman spectroscopy, and double-crystal X-ray diffraction. The concentration of residual acceptors which are related to structural defects decreased with lowering growth temperature, but the GaSb epitaxial layer grown at an extremely low temperature of 270°C had poor crystalline quality. The AlxGa1-xSb (x≥0.15) and AlxGa1-xSb (x=0.02) epitaxial layers grown at 270 °C, however, had much better quality than the GaSb epitaxial layer grown at the same temperature.


1991 ◽  
pp. 531-541
Author(s):  
P. M. Adams ◽  
J. F. Knudsen ◽  
R. C. Bowman ◽  
A. D. Compaan ◽  
H. D. Yao

Author(s):  
Л.С. Лунин ◽  
М.Л. Лунина ◽  
А.С. Пащенко ◽  
Д.Л. Алфимова ◽  
Д.А. Арустамян ◽  
...  

AbstractGaP/Si/Ge nanoheterostructures have been obtained using the method of pulsed laser deposition, and an energy band diagram of cascade solar cells based on these heterostructures were modeled. GaP and Ge nanolayers grown on Si substrates were studied by Raman spectroscopy and X-ray diffraction. Spectral dependences of the external quantum efficiency response of GaP/Si/Ge nanoheterostructures were determined.


2005 ◽  
Vol 126 ◽  
pp. 101-105 ◽  
Author(s):  
B. Moulin ◽  
L. Hennet ◽  
D. Thiaudière ◽  
P. Melin ◽  
P. Simon

2009 ◽  
Vol 2009 ◽  
pp. 1-4 ◽  
Author(s):  
L. Bourja ◽  
B. Bakiz ◽  
A. Benlhachemi ◽  
M. Ezahri ◽  
J. C. Valmalette ◽  
...  

A series of ceramics samples belonging to theCeO2-Bi2O3phase system have been prepared via a coprecipitation route. The crystallized phases were obtained by heating the solid precursors at600∘Cfor 6 hours, then quenching the samples. X-ray diffraction analyses show that forx<0.20a solid solutionCe1−xBixO2−x/2with fluorine structure is formed. For x ranging between 0.25 and 0.7, a tetragonalβ′phase coexisting with the FCC solid solution is observed. For x ranging between 0.8 and 0.9, a new tetragonalβphase appears. Theβ′phase is postulated to be a superstructure of theβphase. Finally, close tox=1, the classical monoclinicα Bi2O3structure is observed. Raman spectroscopy confirms the existence of the phase changes as x varies between 0 and 1.


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