Importance of Surface Preparation in Direct Ion Beam Deposition(Ibd)

1989 ◽  
Vol 157 ◽  
Author(s):  
Kiyoshi Miyake
Keyword(s):  
Preparation Method ◽  
Ion Beam ◽  
Surface Preparation ◽  
Hydrogen Ion ◽  
Native Oxide ◽  
Effective Surface ◽  
Ion Beam Deposition ◽  
Gas Contamination ◽  
Major Factors ◽  
Beam Deposition

ABSTRACTFundamental aspects of direct ion beam deposition (IBD) are discussed, stressing surface preparation and contamination problems. Residual gas contamination, ion beam induced metal contamination, and presence of surface native oxide before deposition are shown to be the major factors hindering low temperature epitaxial growth in IBD. A low energy hydrogen ion bombardment is demonstrated as an effective surface preparation method to remove surface native oxide in the case of silicon deposition.

Electron energy loss spectroscopy of diamond-like carbon thin films

1992 ◽  
Vol 50 (2) ◽  
pp. 1272-1273
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Loss ◽  
Electron Energy ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Deposition ◽  
Chemistry Research ◽  
Carbon Thin Films ◽  
Electron Energy Loss ◽  
Beam Deposition

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.

Ion beam deposition of alumina for recording head applications

1995 ◽  
Vol 31 (6) ◽  
pp. 2694-2696 ◽  
Author(s):  
M. Tan ◽  
S.-I. Tan ◽  
Yong Shen
Keyword(s):  
Ion Beam ◽  
Recording Head ◽  
Ion Beam Deposition ◽  
Beam Deposition

Area-selective formation of Si nanocrystals by assisted ion-beam irradiation during dual-ion-beam deposition

2004 ◽  
Vol 85 (9) ◽  
pp. 1595-1597 ◽  
Author(s):  
Jae Kwon Kim ◽  
Kyu Man Cha ◽  
Jung Hyun Kang ◽  
Yong Kim ◽  
Jae-Yel Yi ◽  
...  
Keyword(s):  
Ion Beam ◽  
Beam Irradiation ◽  
Ion Beam Irradiation ◽  
Ion Beam Deposition ◽  
Si Nanocrystals ◽  
Selective Formation ◽  
Beam Deposition

Stress relaxation and optical characterization of TiO2 and SiO2 films grown by dual ion beam deposition

2008 ◽  
Vol 516 (23) ◽  
pp. 8604-8608 ◽  
Author(s):  
C. Bundesmann ◽  
I.-M. Eichentopf ◽  
S. Mändl ◽  
H. Neumann
Keyword(s):  
Stress Relaxation ◽  
Ion Beam ◽  
Optical Characterization ◽  
Sio2 Films ◽  
Ion Beam Deposition ◽  
Beam Deposition

Multilayer growth by low energy ion beam deposition

1999 ◽  
Vol 198-199 ◽  
pp. 731-733 ◽  
Author(s):  
D.E Joyce ◽  
N.D Telling ◽  
J.A Van den Berg ◽  
D.G Lord ◽  
P.J Grundy
Keyword(s):  
Ion Beam ◽  
Low Energy ◽  
Ion Beam Deposition ◽  
Beam Deposition

Grain size of nanocrystalline YSZ buffer layers fabricated by ion beam deposition

2011 ◽  
Vol 471 (21-22) ◽  
pp. 770-773 ◽  
Author(s):  
F. Feng ◽  
K. Shi ◽  
Z. Wang ◽  
B.-J. Yan ◽  
Z.-J. Zhao ◽  
...  
Keyword(s):  
Grain Size ◽  
Ion Beam ◽  
Buffer Layers ◽  
Ion Beam Deposition ◽  
Beam Deposition

Crystal structure of TiNi nanoparticles obtained by Ar ion beam deposition

2008 ◽  
Vol 481-482 ◽  
pp. 476-478 ◽  
Author(s):  
A. Torres Castro ◽  
E. López Cuéllar ◽  
U. Ortiz Méndez ◽  
M. José Yacamán
Keyword(s):  
Crystal Structure ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Beam Deposition

Charge Assisted Deposition of Polycrystalline Silicon Thin Films by Cesium Sputter Ion Beam Deposition

2004 ◽  
Vol 43 (10) ◽  
pp. 6880-6883 ◽  
Author(s):  
Deuk Yeon Lee ◽  
Yong Hwan Kim ◽  
In Kyo Kim ◽  
Dong Joon Choi ◽  
Soon Moon Jeong ◽  
...  
Keyword(s):  
Thin Films ◽  
Polycrystalline Silicon ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Silicon Thin Films ◽  
Beam Deposition
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