Combined focused ion beam deposition system and scanning probe microscope for metal nanostructure fabrication and characterization

1999 ◽  
Vol 17 (6) ◽  
pp. 3075 ◽  
Author(s):  
R. G. Woodham ◽  
H. Ahmed
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Scanning Probe Microscope ◽  
Scanning Probe ◽  
Nanostructure Fabrication ◽  
Ion Beam Deposition ◽  
Metal Nanostructure ◽  
Probe Microscope ◽  
Fabrication And Characterization ◽  
Beam Deposition

A Brief Review of the Current Technologies Used for the Fabrication of Metal-Molecule-Metal Junction Electrodes

2012 ◽  
Vol 626 ◽  
pp. 867-877 ◽  
Author(s):  
Q. Humayun ◽  
U. Hashim
Keyword(s):  
Focused Ion Beam ◽  
Electron Tunneling ◽  
Ion Beam ◽  
Break Junction ◽  
Intrinsic Properties ◽  
Biomolecular Sensing ◽  
Ion Beam Deposition ◽  
Sensing Applications ◽  
Electrochemical Plating ◽  
Beam Deposition

Fabrication techniques for Metal-molecule-metal junction electrodes suitable to study electron tunneling through metal junctions are reviewed. The applications of current technologies such as mechanical break junction, electromigration, shadow mask lithography, focused ion beam deposition, chemical and electrochemical plating, electron-beam lithography, in fabricating vacant junction electrodes are briefly described. For biomolecular sensing applications, the size of the junction electrodes must be small enough to allow the biomolecule inserted into the junction space to connect both leads to keep the molecules in a relaxed and undistorted state. A significant advantage of using Metal-molecule-metal junction electrodes devices is that the junction can be characterized with and without the molecule in place. Any electrical artifacts introduced by the electrode fabrication process are more easily deconvoluted from the intrinsic properties of the molecule.

Nanoscale coating on tip geometry by cryogenic focused ion beam deposition

2021 ◽  
pp. 150355
Author(s):  
Shuo Zhang ◽  
Gediminas Gervinskas ◽  
Yang Liu ◽  
Ross K.W. Marceau ◽  
Jing Fu
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Beam Deposition ◽  
Nanoscale Coating ◽  
Beam Deposition

Fabrication of single Ga-doped ZnS nanowires as high-gain photosensors by focused ion beam deposition

2017 ◽  
Vol 28 (39) ◽  
pp. 395201 ◽  
Author(s):  
Shih-Hsiang Yen ◽  
Yu-Chen Hung ◽  
Ping-Hung Yeh ◽  
Ya-Wen Su ◽  
Chiu-Yen Wang
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
High Gain ◽  
Ion Beam Deposition ◽  
Beam Deposition

scholarly journals Monitoring Carbon in Electron and Ion Beam Deposition within FIB-SEM

Materials ◽  
2021 ◽  
Vol 14 (11) ◽  
pp. 3034
Author(s):  
Nicholas T.H. Farr ◽  
Gareth M. Hughes ◽  
Cornelia Rodenburg
Keyword(s):  
Secondary Electron ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Surface ◽  
Bonding State ◽  
Ion Beam Deposition ◽  
Electron Microscopes ◽  
Scanning Electron Microscopes ◽  
Beam Deposition

It is well known that carbon present in scanning electron microscopes (SEM), Focused ion beam (FIB) systems and FIB-SEMs, causes imaging artefacts and influences the quality of TEM lamellae or structures fabricated in FIB-SEMs. The severity of such effects depends not only on the quantity of carbon present but also on its bonding state. Despite this, the presence of carbon and its bonding state is not regularly monitored in FIB-SEMs. Here we demonstrated that Secondary Electron Hyperspectral Imaging (SEHI) can be implemented in different FIB-SEMs (ThermoFisher Helios G4-CXe PFIB and Helios Nanolab G3 UC) and used to observe carbon built up/removal and bonding changes resulting from electron/ion beam exposure. As well as the ability to monitor, this study also showed the capability of Plasma FIB Xe exposure to remove carbon contamination from the surface of a Ti6246 alloy without the requirement of chemical surface treatments.

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