In Situ FTIR Investigations Of Polymer Surface Modification In Downstream Microwave Plasma Etching

1989 ◽  
Vol 154 ◽  
Author(s):  
Jihperng Leu ◽  
K.F. Jensen
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Polymer Surface ◽  
Absorption Bands ◽  
Air Exposure ◽  
Modified Polymers ◽  
Treatment Conditions ◽  
Fluorine Compounds ◽  
Surface Fluorination

AbstractIn situ Fourier transform infrared (FTIR) reflection-absorption spectroscopy investigations of etching of thin polyimide and poly(methyl methacrylate) films (200–1500Å) in downstream microwave NF3/O2/Ar plasmas are reported. Etch rates and surface chemistry are monitored as a function of gas phase composition, plasma treatment conditions and time. NF3/Ar plasma treatment leads to significant surface fluorination characterized by the formation of aliphatic fluorine compounds (CFx), acyl fluorides, benzoyl fluoride, and polyfluorinated benzene. Addition of oxygen to the etching gas reduces the degree of surface fluorination and modifies the chemical structure. The absorption bands due to CFx structures decrease gradually while polyfluorinated benzene rings and benzoyl fluoride are absent for NF3/O2 mixtures with more than 20% oxygen. The effect of humidity on the plasma-modified polymers is studied by comparing infrared spectra collected in situ with those after air exposure. For NF3/O2 plasma-treated polyimides significant changes are observed while samples fluorinated in NF3 show no changes after exposure to air overnight. The FTIR data are supplemented by XPS analysis.

In Situ Ftir Investigations of Polymer Surface Modification in Downstream Microwave Plasma Etching

1989 ◽  
Vol 153 ◽  
Author(s):  
Jihperng Leu ◽  
K.F. Jensen
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Polymer Surface ◽  
Absorption Bands ◽  
Air Exposure ◽  
Modified Polymers ◽  
Treatment Conditions ◽  
Fluorine Compounds ◽  
Surface Fluorination

AbstractIn situ Fourier transform infrared (FTIR) reflection-absorption spectroscopy investigations of etching of thin polyimide and poly(methyl methacrylate) films (200-1500Å) in downstream microwave NF3/O2/Ar plasmas are reported. Etch rates and surface chemistry are monitored as a function of gas phase composition, plasma treatment conditions and time. NF3/Ar plasma treatment leads to significant surface fluorination characterized by the formation of aliphatic fluorine compounds (CFx), acyl fluorides, benzoyl fluoride, and polyfluorinated benzene. Addition of oxygen to the etching gas reduces the degree of surface fluorination and modifies the chemical structure. The absorption bands due to CFx structures decrease gradually while polyfluorinated benzene rings and benzoyl fluoride are absent for NF3/O2 mixtures with more than 20% oxygen. The effect of humidity on the plasma-modified polymers is studied by comparing infrared spectra collected in situ with those after air exposure. For NF3/O2 plasma-treated polyimides significant changes are observed while samples fluorinated in NF3 show no changes after exposure to air overnight. The FTIR data are supplemented by XPS analysis.

Microwave plasma treatment of polymer surface for irreversible sealing of microfluidic devices

Lab on a Chip ◽  
2005 ◽  
Vol 5 (10) ◽  
pp. 1173 ◽  
Author(s):  
Alex Y. N. Hui ◽  
Gang Wang ◽  
Bingcheng Lin ◽  
Wing-Tat Chan
Keyword(s):  
Plasma Treatment ◽  
Microwave Plasma ◽  
Polymer Surface ◽  
Microfluidic Devices

OPTIMIZATION OF MICROWAVE PLASMA TREATMENT CONDITIONS ON POLYDIMETHYLSILOXANE FILMS FOR FURTHER SURFACE FUNCTIONALIZATION

2021 ◽  
pp. 110416
Author(s):  
Caroline Aymes-Chodur ◽  
Hanène Salmi-Mani ◽  
Diana Dragoe ◽  
Nadine Aubry-Barroca ◽  
Marie Buchotte ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Surface Functionalization ◽  
Microwave Plasma ◽  
Treatment Conditions ◽  
Polydimethylsiloxane Films

Ftir Investigations of Plasma Modified Polymer Surfaces and Their Interfaces with Plasma Deposited Tungsten

1989 ◽  
Vol 165 ◽  
Author(s):  
Jihperng Leu ◽  
Manoj Dalvie ◽  
Klavs F. Jensen
Keyword(s):  
Microwave Plasma ◽  
Polymer Surface ◽  
Chemical Vapor ◽  
Surface Modifications ◽  
Polymer Surfaces ◽  
Ex Situ ◽  
Rf Plasma ◽  
Polyimide Films ◽  
Modified Polymer ◽  
Surface Fluorination

AbstractSurface modifications of thin polyimide films (100–2000 A˚) in downstream microwave CF4/NF3/Ar plasmas and radio-frequency (RF) CF4 plasmas have been studied in situ by Fourier transform infrared (FTIR) reflection-absorption spectroscopy. The downstream microwave plasma treatment produced significant surface fluorination in terms of polyfluorinated alkyl and aryl compounds as well as acyl and benzoyl fluorides. The depth of fluorination was approximately 500 Å. Similar changes in polymer surface functionalities were observed for RF plasma surface modifications, but the depth of fluorination was reduced to 30Å because of ion-bombardment. The interface between the tungsten film and polyimide surfaces has been characterized by ex situ FTIR reflection-absorption technique through the silicon side of Si/polymer/W structures. The observed spectral changes relative to polyimide-gold interfaces were interpreted in terms of interactions of tungsten with functionalities of the polyimde backbone. Tungsten deposited by both sputtering and plasma enhanced chemical vapor deposition (PECVD) showed significant chemical interactions, strongest for PECVD tungsten.

Investigation of Plasma Treatment Conditions for Wafer-Scale Room-Temperature Bonding Using Ultrathin Au Films in Ambient Air

2019 ◽  
Vol 139 (7) ◽  
pp. 217-218
Author(s):  
Michitaka Yamamoto ◽  
Takashi Matsumae ◽  
Yuichi Kurashima ◽  
Hideki Takagi ◽  
Tadatomo Suga ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Room Temperature ◽  
Ambient Air ◽  
Wafer Scale ◽  
Treatment Conditions

THE MODIFICATION OF PAPER INDUCED BY RADIO FREQUENCY AND MICROWAVE PLASMA TREATMENT

2007 ◽  
Vol 11 (4) ◽  
pp. 593-600
Author(s):  
V. V. Azharonok ◽  
I. I. Filatova ◽  
A. P. Dostanko ◽  
S. V. Bordusov ◽  
Yu. S. Shynkevich
Keyword(s):  
Radio Frequency ◽  
Plasma Treatment ◽  
Microwave Plasma

X-Ray Photoelectron-Spectroscopic Studies of Carbon Fiber Surfaces. Part IX: The Effect of Microwave Plasma Treatment on Carbon Fiber Surfaces

1989 ◽  
Vol 43 (7) ◽  
pp. 1153-1158 ◽  
Author(s):  
Yaoming Xie ◽  
Peter M. A. Sherwood
Keyword(s):  
Carbon Fiber ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Prolonged Exposure ◽  
Microwave Plasma ◽  
Spectroscopic Studies ◽  
X Ray ◽  
Fiber Damage ◽  
Surface Functionality ◽  
Fiber Treatment

X-ray photoelectron spectroscopy has been used to monitor the surface chemical changes occurring on type II carbon fibers exposed to air, oxygen, and nitrogen plasmas. In all cases the plasmas caused changes in surface functionality, in terms of both C-O and C-N functionality. Prolonged exposure to the plasmas caused loss of surface functionality for air and oxygen plasmas, and extended treatment caused fiber damage. Plasma treatment of fibers promises to be an effective method of fiber treatment.

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