Electron Beam Processing of Semiconductors

1982 ◽  
Vol 13 ◽  
Author(s):  
B. Ahmed ◽  
R.A. McMahon
Keyword(s):  
Electron Beam ◽  
Electron Beams ◽  
Rapid Heating ◽  
Transfer Energy ◽  
Substrate Quality ◽  
Silicon Devices ◽  
Electron Beam Processing ◽  
Wide Range ◽  
Computer Controlled ◽  
Deposited Films

ABSTRACTElectron beams can transfer energy very efficiently to semiconductors. Systems have been developed for rapid heating to temperature around 1000°C under a variety of conditions from adiabatic to isothermal. Pulsed, focused, line and synthesized shaped beams are used to obtain a wide range of thermal cycles. The following applications are described: the annealing of ion-implanted Si, particularly the activation of As implants and shallow implants (Rp<150Å), the annealing of Si and Se in GaAs, the e-beam processing of implanted silicon devices and the improvement of SOS substrate quality. Localized annealing by a computer controlled e-beam and the recrystallization of deposited films on insulators are also considered.

Pulsed Electron Beam Processing of Silicon Devices

1980 ◽  
Vol 1 ◽  
Author(s):  
A. C. Greenwald ◽  
R. P. Dolan ◽  
S. P. Tobin
Keyword(s):  
Electron Beam ◽  
Low Temperature ◽  
Low Dose ◽  
Electron Beams ◽  
Pulsed Electron Beam ◽  
Process Sequence ◽  
Pulse Processing ◽  
Silicon Devices ◽  
Electron Beam Processing ◽  
Thermal Oxide

ABSTRACTPulsed electron beams [1] were used to anneal ion-implanted diodes, transistors, and resistors. Devices were fabricated by patterning a thermal oxide on a silicon wafer, ion-implanting and pulse processing with the oxide in place, and then applying contacts. Oxide films over 0.3 micron thick were not damaged, and the silicon below these films was not melted by the pulsed electron beam. Low-dose (101311B+/cm2), implanted, pulse-annealed resistors showed no change in sheet resistance for oxide windows 2.5 to 50.0 microns wide. Diodes were fashioned with good forward and reverse I-V characteristics, with m=1.09 and IO=2.7×10−10 A/cm2 for I=IO exp(qV.mkT)−1 , when a low-temperature (550˚C, 1 hr), postpulse anneal was included in the process sequence. Both bipolar and FET types of transistors were fabricated. Results compare favorably with thermal annealing cycles.

The Optinium Space-Charge-Controlled Focus of an Electron Beam

1952 ◽  
Vol 5 (3) ◽  
pp. 430 ◽  
Author(s):  
DL Hollway
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Electron Beams ◽  
Beam Profile ◽  
Design Problems ◽  
Beam Design ◽  
Wide Range

The problem of apace-charge defocusing of circular electron beams is considered. and expressions for the condition of optimum focus are derived from the equations of the beam profile. It is shown that, over a wide range of spot radii, the optimum-focus expressions may be replaced by much simpler relationships suited to electron-beam design problems.

Soft Vacuum, Pulsed Electron Beam Processing of Polyimides

1987 ◽  
Vol 101 ◽  
Author(s):  
J. Krishnaswamy ◽  
L. Li ◽  
G. J. Collins ◽  
H. Hiraoka ◽  
Mary Ann Caolo
Keyword(s):  
Electron Beam ◽  
Low Voltage ◽  
Electron Beams ◽  
Thermal Cure ◽  
Beam Hardening ◽  
Polyamic Acid ◽  
Pulsed Electron Beam ◽  
Substrate Distance ◽  
Electron Beam Processing ◽  
Oxygen Discharge

ABSTRACTWe report on the successful patterning of polyamic acid over wide areas using 28 kV pulsed electron beams produced in 30 mTorr air. The pattern degradation during the 350°C, 1/2 hr, imidizing thermal cure is prevented by pulsed, flood electron beam hardening of the developed polyamic acid patterns using the same soft vacuum, pulsed electron beam apparatus. It is also shown that a CW, low voltage, 1 to 3 kV electron beam sustained oxygen discharge can be used to completely strip the hardened, imidized material which is difficult to remove by wet methods. We also present, dose versus thickness remaining characteristics as a function of electron source to substrate distance and some examples of polyimide patterning.

The interaction of electron beams with solids - Some new effects

1990 ◽  
Vol 48 (4) ◽  
pp. 788-789
Author(s):  
C J Humphreys ◽  
T J Bullough ◽  
R W Devenish ◽  
D M Maher ◽  
P S Turner
Keyword(s):  
Electron Beam ◽  
Field Emission ◽  
Electron Irradiation ◽  
Electron Beams ◽  
Incident Electron Beam ◽  
Surface Steps ◽  
Wide Range ◽  
Intense Electron Beams ◽  
Intense Electron ◽  
Scale Surface

It has recently been found that electron beams, of energy typically 100 keV, can damage a very wide range of solids, many of which are normally thought to be stable to electron irradiation. For example, metals, semiconductors and ceramics can all be damaged by electrons having energy less than that required for direct displacement damage. Radiation damage effects are particularly apparent when using intense electron beams from field emission guns in STEM's, TEM's and SEM's, but damage also occurs in materials thought to be stable when using electrons from LaB6, or heated W filaments. Considerable care must therefore be taken in microanalysis, etc, particularly when using field emission guns.If the incident electron beam is focussed to nanometre-scale diameter, then nanometre-scale surface and volume structures (e.g. indentations, holes and lines) can be produced in a variety of specimens. It is also possible to cut a specimen to a desired shape with nanometre precision and to remove surface steps from surfaces, leaving them atomically smooth.

Materials for Electron Beam Information Storage

1969 ◽  
Vol 27 ◽  
pp. 152-153 ◽  
Author(s):  
D. E. Speliotis
Keyword(s):  
Magnetic Field ◽  
Electron Beam ◽  
Recent Literature ◽  
Electron Beams ◽  
Information Storage ◽  
The Subject ◽  
The Magnetic Field

The interaction of electron beams with a large variety of materials for information storage has been the subject of numerous proposals and studies in the recent literature. The materials range from photographic to thermoplastic and magnetic, and the interactions with the electron beam for writing and reading the information utilize the energy, or the current, or even the magnetic field associated with the electron beam.

Energy Distribution in Electron Beams

1972 ◽  
Vol 30 ◽  
pp. 568-569
Author(s):  
Tamotsu Ohno
Keyword(s):  
Electron Beam ◽  
Energy Distribution ◽  
Cross Section ◽  
Integral Curve ◽  
Electron Beams ◽  
Electron Gun ◽  
Angular Divergence ◽  
Apparent Increase ◽  
Integral Width ◽  
The Cross

The energy distribution in an electron; beam from an electron gun provided with a biased Wehnelt cylinder was measured by a retarding potential analyser. All the measurements were carried out with a beam of small angular divergence (<3xl0-4 rad) to eliminate the apparent increase of energy width as pointed out by Ichinokawa.The cross section of the beam from a gun with a tungsten hairpin cathode varies as shown in Fig.1a with the bias voltage Vg. The central part of the beam was analysed. An example of the integral curve as well as the energy spectrum is shown in Fig.2. The integral width of the spectrum ΔEi varies with Vg as shown in Fig.1b The width ΔEi is smaller than the Maxwellian width near the cut-off. As |Vg| is decreased, ΔEi increases beyond the Maxwellian width, reaches a maximum and then decreases. Note that the cross section of the beam enlarges with decreasing |Vg|.

A Color Coded STEM/SEM Image Storage System

1981 ◽  
Vol 39 ◽  
pp. 272-273
Author(s):  
Y. Kokubo ◽  
W. H. Hardy ◽  
J. Dance ◽  
K. Jones
Keyword(s):  
Image Processing ◽  
Electron Beam ◽  
Storage System ◽  
Particle Analysis ◽  
Specific Information ◽  
X Rays ◽  
Sem Image ◽  
Backscattered Electrons ◽  
Wide Range ◽  
Scanning Electron

A color coded digital image processing is accomplished by using JEM100CX TEM SCAN and ORTEC’s LSI-11 computer based multi-channel analyzer (EEDS-II-System III) for image analysis and display. Color coding of the recorded image enables enhanced visualization of the image using mathematical techniques such as compression, gray scale expansion, gamma-processing, filtering, etc., without subjecting the sample to further electron beam irradiation once images have been stored in the memory.The powerful combination between a scanning electron microscope and computer is starting to be widely used 1) - 4) for the purpose of image processing and particle analysis. Especially, in scanning electron microscopy it is possible to get all information resulting from the interactions between the electron beam and specimen materials, by using different detectors for signals such as secondary electron, backscattered electrons, elastic scattered electrons, inelastic scattered electrons, un-scattered electrons, X-rays, etc., each of which contains specific information arising from their physical origin, study of a wide range of effects becomes possible.

A Comparison of Physiological Demand between Self-Propelled and Motorized Treadmill Exercise

2018 ◽  
Vol 7 (4) ◽  
pp. 13-21
Author(s):  
Todd Backes ◽  
Charlene Takacs
Keyword(s):  
Respiratory Exchange Ratio ◽  
Treadmill Exercise ◽  
Cardiopulmonary Exercise Testing ◽  
Mean Value ◽  
The Self ◽  
Mixing Chamber ◽  
Wide Range ◽  
The Subject ◽  
The Mean ◽  
Computer Controlled

There are a wide range of options for individuals to choose from in order to engage in aerobic exercise; from outdoor running to computer controlled and self-propelled treadmills. Recently, self-propelled treadmills have increased in popularity and provide an alternative to a motorized treadmill. Twenty subjects (10 men, 10 women) ranging in age from 19-23 with a mean of 20.4 ± 0.8 SD were participants in this study. The subjects visited the laboratory on three occasions. The purpose of the first visit was to familiarize the subject with the self-propelled treadmill (Woodway Curve 3.0). The second visit, subjects were instructed to run on the self-propelled treadmill for 3km at a self-determined pace. Speed data were collected directly from the self-propelled treadmill. The third visit used speed data collected during the self-propelled treadmill run to create an identically paced 3km run for the subjects to perform on a motorized treadmill (COSMED T150). During both the second and third visit, oxygen consumption (VO2) and respiratory exchange ratio (R) data were collected with COSMED’s Quark cardiopulmonary exercise testing (CPET) metabolic mixing chamber system. The VO2 mean value for the self-propelled treadmill (44.90 ± 1.65 SE ml/kg/min) was significantly greater than the motorized treadmill (34.38 ± 1.39 SE ml/kg/min). The mean R value for the self-propelled treadmill (0.91 ± 0.01 SE) was significantly greater than the motorized treadmill (0.86 ± 0.01 SE). Our study demonstrated that a 3km run on a self-propelled treadmill does elicit a greater physiological response than a 3km run at on a standard motorized treadmill. Self-propelled treadmills provide a mode of exercise that offers increased training loads and should be considered as an alternative to motorized treadmills.

scholarly journals Preserving quality of fresh cut watermelon cubes for vending distribution by low-dose electron beam processing

Food Control ◽  
2017 ◽  
Vol 72 ◽  
pp. 367-371 ◽  
Author(s):  
Bianca Smith ◽  
Adrienne Ortega ◽  
Shima Shayanfar ◽  
Suresh D. Pillai
Keyword(s):  
Electron Beam ◽  
Low Dose ◽  
Electron Beam Processing ◽  
Fresh Cut
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