The Optinium Space-Charge-Controlled Focus of an Electron Beam

1952 ◽  
Vol 5 (3) ◽  
pp. 430 ◽  
Author(s):  
DL Hollway
Keyword(s):  
Electron Beam ◽  
Space Charge ◽  
Electron Beams ◽  
Beam Profile ◽  
Design Problems ◽  
Beam Design ◽  
Wide Range

The problem of apace-charge defocusing of circular electron beams is considered. and expressions for the condition of optimum focus are derived from the equations of the beam profile. It is shown that, over a wide range of spot radii, the optimum-focus expressions may be replaced by much simpler relationships suited to electron-beam design problems.

Electron Beam Processing of Semiconductors

1982 ◽  
Vol 13 ◽  
Author(s):  
B. Ahmed ◽  
R.A. McMahon
Keyword(s):  
Electron Beam ◽  
Electron Beams ◽  
Rapid Heating ◽  
Transfer Energy ◽  
Substrate Quality ◽  
Silicon Devices ◽  
Electron Beam Processing ◽  
Wide Range ◽  
Computer Controlled ◽  
Deposited Films

ABSTRACTElectron beams can transfer energy very efficiently to semiconductors. Systems have been developed for rapid heating to temperature around 1000°C under a variety of conditions from adiabatic to isothermal. Pulsed, focused, line and synthesized shaped beams are used to obtain a wide range of thermal cycles. The following applications are described: the annealing of ion-implanted Si, particularly the activation of As implants and shallow implants (Rp<150Å), the annealing of Si and Se in GaAs, the e-beam processing of implanted silicon devices and the improvement of SOS substrate quality. Localized annealing by a computer controlled e-beam and the recrystallization of deposited films on insulators are also considered.

The interaction of electron beams with solids - Some new effects

1990 ◽  
Vol 48 (4) ◽  
pp. 788-789
Author(s):  
C J Humphreys ◽  
T J Bullough ◽  
R W Devenish ◽  
D M Maher ◽  
P S Turner
Keyword(s):  
Electron Beam ◽  
Field Emission ◽  
Electron Irradiation ◽  
Electron Beams ◽  
Incident Electron Beam ◽  
Surface Steps ◽  
Wide Range ◽  
Intense Electron Beams ◽  
Intense Electron ◽  
Scale Surface

It has recently been found that electron beams, of energy typically 100 keV, can damage a very wide range of solids, many of which are normally thought to be stable to electron irradiation. For example, metals, semiconductors and ceramics can all be damaged by electrons having energy less than that required for direct displacement damage. Radiation damage effects are particularly apparent when using intense electron beams from field emission guns in STEM's, TEM's and SEM's, but damage also occurs in materials thought to be stable when using electrons from LaB6, or heated W filaments. Considerable care must therefore be taken in microanalysis, etc, particularly when using field emission guns.If the incident electron beam is focussed to nanometre-scale diameter, then nanometre-scale surface and volume structures (e.g. indentations, holes and lines) can be produced in a variety of specimens. It is also possible to cut a specimen to a desired shape with nanometre precision and to remove surface steps from surfaces, leaving them atomically smooth.

scholarly journals Space charge electrostatic fields and focusing of a sheet electron beam with diffused edges

1999 ◽  
Vol 17 (1) ◽  
pp. 1-13
Author(s):  
JAYASHREE PANICKER ◽  
Y. CHOYAL ◽  
K.P. MAHESHWARI ◽  
U. SHARMA
Keyword(s):  
Electron Beam ◽  
Magnetic Fields ◽  
Space Charge ◽  
Electron Beams ◽  
Numerical Study ◽  
Density Variation ◽  
Beam Focusing ◽  
Electrostatic Fields ◽  
Sheet Electron Beam ◽  
The Stability

An analytical and numerical study of the stability of sheet electron beams in periodically cusped magnetic fields (PCM) is made. The beam has been considered as having edges with a prescribed density variation. In estimating the electrostatic fields, we have considered the density variation of both the edges along the width and thickness of the sheet beam. The conditions for beam focusing and beam matching are discussed.

Materials for Electron Beam Information Storage

1969 ◽  
Vol 27 ◽  
pp. 152-153 ◽  
Author(s):  
D. E. Speliotis
Keyword(s):  
Magnetic Field ◽  
Electron Beam ◽  
Recent Literature ◽  
Electron Beams ◽  
Information Storage ◽  
The Subject ◽  
The Magnetic Field

The interaction of electron beams with a large variety of materials for information storage has been the subject of numerous proposals and studies in the recent literature. The materials range from photographic to thermoplastic and magnetic, and the interactions with the electron beam for writing and reading the information utilize the energy, or the current, or even the magnetic field associated with the electron beam.

Energy Distribution in Electron Beams

1972 ◽  
Vol 30 ◽  
pp. 568-569
Author(s):  
Tamotsu Ohno
Keyword(s):  
Electron Beam ◽  
Energy Distribution ◽  
Cross Section ◽  
Integral Curve ◽  
Electron Beams ◽  
Electron Gun ◽  
Angular Divergence ◽  
Apparent Increase ◽  
Integral Width ◽  
The Cross

The energy distribution in an electron; beam from an electron gun provided with a biased Wehnelt cylinder was measured by a retarding potential analyser. All the measurements were carried out with a beam of small angular divergence (<3xl0-4 rad) to eliminate the apparent increase of energy width as pointed out by Ichinokawa.The cross section of the beam from a gun with a tungsten hairpin cathode varies as shown in Fig.1a with the bias voltage Vg. The central part of the beam was analysed. An example of the integral curve as well as the energy spectrum is shown in Fig.2. The integral width of the spectrum ΔEi varies with Vg as shown in Fig.1b The width ΔEi is smaller than the Maxwellian width near the cut-off. As |Vg| is decreased, ΔEi increases beyond the Maxwellian width, reaches a maximum and then decreases. Note that the cross section of the beam enlarges with decreasing |Vg|.

A Color Coded STEM/SEM Image Storage System

1981 ◽  
Vol 39 ◽  
pp. 272-273
Author(s):  
Y. Kokubo ◽  
W. H. Hardy ◽  
J. Dance ◽  
K. Jones
Keyword(s):  
Image Processing ◽  
Electron Beam ◽  
Storage System ◽  
Particle Analysis ◽  
Specific Information ◽  
X Rays ◽  
Sem Image ◽  
Backscattered Electrons ◽  
Wide Range ◽  
Scanning Electron

A color coded digital image processing is accomplished by using JEM100CX TEM SCAN and ORTEC’s LSI-11 computer based multi-channel analyzer (EEDS-II-System III) for image analysis and display. Color coding of the recorded image enables enhanced visualization of the image using mathematical techniques such as compression, gray scale expansion, gamma-processing, filtering, etc., without subjecting the sample to further electron beam irradiation once images have been stored in the memory.The powerful combination between a scanning electron microscope and computer is starting to be widely used 1) - 4) for the purpose of image processing and particle analysis. Especially, in scanning electron microscopy it is possible to get all information resulting from the interactions between the electron beam and specimen materials, by using different detectors for signals such as secondary electron, backscattered electrons, elastic scattered electrons, inelastic scattered electrons, un-scattered electrons, X-rays, etc., each of which contains specific information arising from their physical origin, study of a wide range of effects becomes possible.

Development of x-ray beam profile monitor based on in-house grown crystal and application in electron beam imaging

2020 ◽  
Author(s):  
Mohit Tyagi ◽  
P. S. Sarkar ◽  
R. S. Sengar ◽  
Ashwani Kumar ◽  
Jagannath ◽  
...  
Keyword(s):  
Electron Beam ◽  
Grown Crystal ◽  
Beam Profile ◽  
X Ray ◽  
Beam Profile Monitor

Powerful W-band Surface-Wave Oscillator based on High-Current Relativistic Sheet Electron Beam: Design and Simulations

2019 ◽  
Author(s):  
Nikolai Yu. Peskov ◽  
Petr V. Kalinin ◽  
Stanislav L. Sinitsky ◽  
Andrey V. Arzhannikov ◽  
Evgeny S. Sandalov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Surface Wave ◽  
High Current ◽  
W Band ◽  
Wave Oscillator ◽  
Beam Design ◽  
Sheet Electron Beam
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