Measurement and Modeling of Atomic Chlorine Concentrations in Plasma Processes

1988 ◽  
Vol 117 ◽  
Author(s):  
Jean-Philippe Nicolai ◽  
Kenneth D. Allen ◽  
Herbert H. Sawin
Keyword(s):  
Plasma Etching ◽  
Ground State ◽  
Surface Recombination ◽  
Gaseous Diffusion ◽  
Rf Plasmas ◽  
Two Photon ◽  
Spatially Resolved ◽  
Model Predictions ◽  
Atomic Chlorine ◽  
Order Surface

AbstractSpatially resolved concentration profiles of ground-state chlorine atoms were measured in CF3 Cl/Ar RF plasmas using two-photon laser induced fluorescence. A significant Cl gradient was found between the two electrodes under conditions typical for plasma etching. This experimental observation is consistent with previous model predictions which assumed the primary loss of Cl was a second-order surface recombination on the upper electrode which is partially limited by gaseous diffusion.

Studies of Plasma O Atom Concentration by Two-Photon Laser Induced Fluorescence and Optical Emission Spectroscopy

1984 ◽  
Vol 38 ◽  
Author(s):  
R. Walkup ◽  
K. Saenger ◽  
G. S. Selwyn
Keyword(s):  
Optical Emission ◽  
Quantitative Relationship ◽  
Laser Induced Fluorescence ◽  
Plasma Parameters ◽  
Atom Concentration ◽  
Rf Plasmas ◽  
Excited Atoms ◽  
Two Photon ◽  
Spatially Resolved ◽  
Quantitative Measurements

AbstractWe report quantitative measurements of the concentration of atomic oxygen in RF plasmas determined by two-photon laser induced fluorescence. The results are compared with concurrent measurements of spatially resolved plasma induced optical emission. These measurements establish: (1) the O atom concentration as a function of plasma parameters, (2) a semi-quantitative relationship between O* emission intensity normalized by Ar* in-tensity and O atom concentration, and (3) an understanding of the mechanisms for pro-duction of excited atoms in the plasma.

Concentration Measurements of Chlorine Atoms in A Plasma Reactor

1986 ◽  
Vol 68 ◽  
Author(s):  
Joda Wormhoudt ◽  
Alan C. Stanton ◽  
Albert D. Richards ◽  
Herbert H. Sawin
Keyword(s):  
Plasma Etching ◽  
Infrared Absorption ◽  
Ground State ◽  
Parallel Plate ◽  
Flow System ◽  
Plasma Reactor ◽  
Line Strength ◽  
Hyperfine Component ◽  
Pressure Discharge ◽  
Atomic Chlorine

AbstractInfrared absorption spectroscopy has been used to measure atomic chlorine concentrations over a range of plasma conditions in both Cl2 and CF3Cl discharges.These measurements were made utilizing the spin-orbit transitions in the ground state of atomic chlorine near 882 cm−1.The concentration studies were performed by passing light from a diode laser through a multi-pass (White) cell set in two opposed windows of a parallel plate plasma etching reactor.The plasma work was preceded by a laboratory measurement of the infrared absorption line strengths of the 2P1/2 ← 2P3/2 transition.This measurement was done in a known concentration of atomic chlorine produced in a low pressure discharge flow system by the reaction of Cl2 or HCl with excess fluorine atoms.These measurements resulted in an integrated line strength of 4.14 (±0.89) × 10−21 cm2-molecule−1-cm−1 for the strongest hyperfine component of the transition at 882.3626 cm−1.Measured atomic chlorine concentrations in Cl2 discharges varied between 0.2 and 8.0 × 1014 atoms/cm3, representing atomic chlorine fractions on the order of a few percent.The measured atomic chlorine concentrations increased approximately linearly with increasing power and pressure, and increased with increasing frequency above approximately 1 MHz.Below 1 MHz, the atomic chlorine concentration was relatively independent of frequency.

Two-photon absorption spectra of a near-infrared 2-azaazulene polymethine dye: solvation and ground-state symmetry breaking

2013 ◽  
Vol 15 (20) ◽  
pp. 7666 ◽  
Author(s):  
Honghua Hu ◽  
Olga V. Przhonska ◽  
Francesca Terenziani ◽  
Anna Painelli ◽  
Dmitry Fishman ◽  
...  
Keyword(s):  
Symmetry Breaking ◽  
Absorption Spectra ◽  
Ground State ◽  
Near Infrared ◽  
Photon Absorption ◽  
Two Photon Absorption ◽  
Two Photon ◽  
Polymethine Dye

Fluorescence anisotropy in indole under two-photon excitation in the spectral range 385–510 nm

2018 ◽  
Vol 20 (30) ◽  
pp. 19922-19931 ◽  
Author(s):  
M. E. Sasin ◽  
A. G. Smolin ◽  
K.-H. Gericke ◽  
E. Tokunaga ◽  
O. S. Vasyutinskii
Keyword(s):  
Propylene Glycol ◽  
Excited States ◽  
Spectral Range ◽  
Ground State ◽  
Fluorescence Anisotropy ◽  
Photon Absorption ◽  
Two Photon Absorption ◽  
Two Photon ◽  
Photon Excitation ◽  
Molecular Ground State

This paper presents the detailed study of two-photon excited fluorescence in indole dissolved in propylene glycol produced by two-photon absorption from the molecular ground state to several high lying excited states.

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