Ultra-Short Pulse Laser Annealing

1980 ◽  
Vol 1 ◽  
Author(s):  
Kenji Gamo ◽  
Kouichi Murakami ◽  
Mitsuo Kawabe ◽  
Susumu Namba ◽  
Yoshinobu Aoyagi
Keyword(s):  
Pulse Laser ◽  
Laser Annealing ◽  
Short Pulse ◽  
Picosecond Pulse ◽  
Reflectivity Measurement ◽  
Short Pulse Laser ◽  
Pulsed Laser Annealing ◽  
Tentative Model ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

ABSTRACTA single picosecond pulse laser annealing of ion-implanted Si is reviewed as ultra-short pulse laser annealing, comparing them with nanosecond pulse and picosecond-pulse train annealing. In order to clarify the physical mechanism of pulsed laser annealing, the dynamic behavior of the amorphous to crystalline transition has been investigated by means of time-dependent optical reflectivity measurement at 0.63 µm (cw) and 1.06 µm (30-ps pulse itself) under the irradiation of the annealing beam of a single 30-ps laser pulse at 1.06 µm. A tentative model is proposed for explaining the results and further problems which remain to be resolved are discussed.

Ultra short pulse laser annealing of FeB metallic glasses

1985 ◽  
Vol 50 (3) ◽  
pp. 278-286 ◽  
Author(s):  
G.L. Whittle ◽  
A. Calka ◽  
A.P. Radliński ◽  
B. Luther-Davies
Keyword(s):  
Pulse Laser ◽  
Metallic Glasses ◽  
Laser Annealing ◽  
Short Pulse ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Silicon Thinning using Ultra-Short Pulse Laser Ablation

2004 ◽  
Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Sample Preparation ◽  
Pulse Laser ◽  
Pulse Laser Ablation ◽  
Short Pulse ◽  
Special Care ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.

The study of time dependent, broadband X-ray emission from ultra-short pulse laser produced plasmas

1994 ◽  
Author(s):  
Ronnie Shepherd ◽  
Rex Booth ◽  
Dwight Price ◽  
Rosemary Walling ◽  
Richard More ◽  
...  
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Time Dependent ◽  
X Ray ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Ultra-short pulse laser safety - a challenge to materials science

2005 ◽  
Author(s):  
Andreas Hertwig ◽  
Sven Martin ◽  
Wolfgang Kautek ◽  
Jörg Krüger
Keyword(s):  
Pulse Laser ◽  
Materials Science ◽  
Short Pulse ◽  
Laser Safety ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

Damage-Free Freeform Cutting of Flexible Battery Using Ultra-Short Pulse Laser

2021 ◽  
Vol 38 (3) ◽  
pp. 195-202
Author(s):  
SeokYoung Ji ◽  
Jaegu Kim ◽  
Sung Hak Cho ◽  
Hyungjun Lim ◽  
Won Seok Chang
Keyword(s):  
Pulse Laser ◽  
Short Pulse ◽  
Short Pulse Laser ◽  
Flexible Battery ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser

scholarly journals Room temperature optical anisotropy of a LaMnO3 thin-film induced by ultra-short pulse laser

2015 ◽  
Vol 106 (9) ◽  
pp. 092907 ◽  
Author(s):  
Purevdorj Munkhbaatar ◽  
Zsolt Marton ◽  
Baatarchuluun Tsermaa ◽  
Woo Seok Choi ◽  
Sung S. Ambrose Seo ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulse Laser ◽  
Optical Anisotropy ◽  
Room Temperature ◽  
Short Pulse ◽  
Short Pulse Laser ◽  
Ultra Short Pulse ◽  
Ultra Short Pulse Laser
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