Comparison of Doping of Gey Si1-y:H (y>0.95) Films Deposited by Low Frequency PECVD at High (300°C) and Low (160°C) Temperatures

2012 ◽  
Vol 1426 ◽  
pp. 295-299
Author(s):  
Ismael Cosme ◽  
Andrey Kosarev ◽  
Francisco Temoltzi Avila ◽  
Adrian Itzmoyotl
Keyword(s):  
Activation Energy ◽  
Deposition Temperature ◽  
Solid Phase ◽  
Low Frequency ◽  
General Effect ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
High Deposition Temperature ◽  
B Doping ◽  
Low Deposition Temperature

ABSTRACTIn this work we present the results of comparative study n- and p-doping of Ge:H and Ge0.96Si0.04 :H films deposited by LF PECVD at high deposition temperature (HT) Td=300°C and low deposition temperature (LT) Td=160°C. The concentration of boron and phosphorus in solid phase was measured by means of SIMS technique. Such parameters as spectral dependence of absorption coefficient, room temperature conductivity σRT and activation energy Ea for both intrinsic and doped films were obtained. The doping range studied in gas phase was for boron [B]gas= 0 to 0.15% and for phosphorus [P]gas= 0 to 0.2%. In general effect of deposition temperature on P and B doping has been demonstrated. For LT films changes of [P]gas=0.04% to 0.22% resulted in more than 2 orders increasing conductivity and reducing activation energy from Ea=0.28 to 0.16 eV. HT films in the range of [P]gas=0.04% to 0.2% demonstrated saturation of conductivity. HT films showed continuous reducing Ea with increase of [P]gas. In the case of boron doping both HT and LT films had a minimum of conductivity at certain values of [B]gas=0.05% (LT films) and 0.04% (HT films) and related maximums of activation energy Ea(max) at the same doping with Ea(max)=0.47 eV for HT and Ea(max)=0.53 eV for LT films. It suggests a compensation of electron conductivity in un-doped films for low B doping. Further raising [B]gas leads to reducing Ea and the smallest Ea=0.27 eV was obtained at [B]gas=0.18% for HT films and Ea=0.33 eV at [B]gas=0.14% for LH films.

Amorphous Si1-YGeY:H, F films obtained by Low Frequency PECVD for uncooled microbolometers

2004 ◽  
Vol 808 ◽  
Author(s):  
R. Ambrosio ◽  
A. Torres ◽  
A. Kosarev ◽  
A. S. Abramov ◽  
A. Heredia ◽  
...  
Keyword(s):  
Activation Energy ◽  
Room Temperature ◽  
Solid Phase ◽  
Low Frequency ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
Sensing Material ◽  
Temperature Dependence Of Conductivity ◽  
Ir Transmission ◽  
High Absorption

ABSTRACTIn this work, we report the composition, optical, and electrical properties of a- Si1-YGeY: H, F films to be used as sensing layer in uncooled microbolometers. The a-Si1-YGeY films where Y is Ge content in solid phase were deposited by low frequency PECVD from SiH4 and GeF4 feed gases, and H2 and Ar were used for dilution. The film composition, IR transmission and temperature dependence of conductivity were measured. The reduction of conductivity activation energy from 0.86 eV to 0.39 eV and the increase of room temperature conductivity from 1x10−9 to 2.1×10−3 Ohm−1cm−1 were observed with the change of Y from 0 (Si) to 1(Ge). These results demonstrate this material to be a good candidate as a sensing material in uncooled micro-bolometers, due to its high absorption in the range of λ = 10-13 μm, its relatively high activation energy, Ea=0.4 eV, consequently, a high temperature coefficient of resistance (TCR), and moderate resistivity at room temperature.

Hydrogenation of B and P Implanted LPCVD Amorphous Silicon

1992 ◽  
Vol 258 ◽  
Author(s):  
Stanislaw M. Pietruszko
Keyword(s):  
Ion Implantation ◽  
Amorphous Silicon ◽  
Room Temperature ◽  
Silicon Films ◽  
Conductivity Measurements ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
B Doping ◽  
Doping Range

ABSTRACTThe results of the investigation of doping by B and P ion implantation into LPCVD amorphous silicon films in the range from 2*1015 to 2*1021 atoms/cm3 are presented. The room temperature conductivity increases to 10-2 Ω-1 cm-1 and to 10-2 Ω-1 cm-1 for the highest B and P doping, respectively. The subsequent hydrogenation (2.5 and 5 at%) by ion implantation increases the doping efficiency for P doping. For B doping efficiency increases at the low and decreases for the high doping range. The results of conductivity measurements vs temperature of doped and hydrogenated films are presented.

Phosphorus and Boron Doping of a-Si:H Effects of Deposition Temperature

1987 ◽  
Vol 95 ◽  
Author(s):  
M. J. M. Pruppers ◽  
K. H. M. Maessen ◽  
J. Bezemer ◽  
F. H. P. M. Habraken ◽  
W. F. van der Weg
Keyword(s):  
Deposition Temperature ◽  
Room Temperature ◽  
Hydrogenated Amorphous Silicon ◽  
Boron Doping ◽  
Dark Conductivity ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
Boron Doped ◽  
Hydrogenated Amorphous ◽  
Deposited Films

AbstractHeavily phosphorus and boron doped hydrogenated amorphous silicon films were deposited in the temperature range 50 to 300 °C. Concentrations of P, B and H, IR spectra and room temperature conductivity have been measured. When the deposition temperature is raised from 50 to 300 °C the concentration of P increases, while the concentration of B decreases. The dark conductivity of both P and B doped films decreases dramatically when the deposition temperature is lowered. We interpret these results on the basis of assumptions concerning the microstructure of the deposited films, and especially the variation of this structure with deposition temperature.

Amorphous silicon-germanium (a-Si0.01Ge0.99:H) doped with phosphorous deposited by LF PECVD and its electrical and optical characteristics

2012 ◽  
Vol 1426 ◽  
pp. 409-414
Author(s):  
N. Delgadillo ◽  
A. Kosarev ◽  
A. Torres ◽  
B. Gonzales
Keyword(s):  
Activation Energy ◽  
Amorphous Silicon ◽  
Silicon Germanium ◽  
Solid Phase ◽  
Low Frequency ◽  
Localized State ◽  
Temperature Dependence Of Conductivity ◽  
P Content ◽  
Amorphous Silicon Germanium ◽  
Preferential Incorporation

ABSTRACTAmorphous silicon-germanium (a-Si0.01Ge0.99:H) thin film, practically amorphous germanium with small concentration of silicon, were deposited by the low frequency PECVD technique under different flow gas of phosphine in the range of QPH3 = 20 to 100 sccm. In this range the phosphorous concentration in gas phase was calculated as XP= 4 to 20 % which resulted in a content in solid phase [P]sol=0.12% - 0.4%. The P content of the solid phase was measured by SIMS profiling and it was also observed a preferential incorporation of phosphorous in the range of [P]sol=0.12% - 0.3%. Hydrogen concentration in the films was determined from FTIR and SIMS measurements. The activation energy was determined by measuring the temperature dependence of conductivity in DC regime in a vacuum thermostat. For the a-Si0.01Ge0.99:H films it is found that the activation energy have a minimum, (Ea= 0.15eV), its conductivity at room temperature have a maximum and there is a minimum of of both band tail and deep localized state for a phosphorous incorporation in solid phase [P] =0.28%.

Noise Spectra of Six Gey Bz:H Thermo-sensing Films for Micro-bolometers

2009 ◽  
Vol 1153 ◽  
Author(s):  
Andrey Kosarev ◽  
Ismael Cosme ◽  
Alfonso Torres
Keyword(s):  
Room Temperature ◽  
Low Frequency ◽  
Noise Spectrum ◽  
Frequency Range ◽  
Conductivity Activation Energy ◽  
Entire Frequency Range ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
Increasing Temperature ◽  
Noise Spectra

AbstractNoise spectra in plasma deposited SixGeyBz:H thermo-sensing films for micro-bolometers have been studied. The samples were characterized by SIMS (composition) and conductivity (room temperature conductivity, activation energy) measurements. The noise spectra were measured in the temperature range from T= 300 K to T=400 K and in the frequency range from f=2 Hz to f=2×104 Hz. The noise spectra SI(f) for the samples Si0.11Ge0.88:H and Si0.04Ge0.71B0.23 can be described by SI(f) ˜ f– β with β = 1 and β = 0.4, respectively. For the sample Si0.06Ge0.67B0.26 two slopes were observed: in low frequency region f≤ 103 Hz β1= 0.7 and at higher frequencies f>103 Hz β2= 0.13. Increasing temperature resulted in an increase of noise magnitude and a change of β values. The latter depended on film composition. The correlation observed between noise and conductivity activation energies suggests that noise is due to bulk rather than interface processes. Noise spectrum of the thermo-sensing film Si0.11Ge0.88:H was compared with that for micro-bolometer structure with the same thermo-sensing film. The micro-bolometer structure showed higher noise value in entire frequency range that assumed additional processes inducing noise.

Dielectric Relaxation Studies of Silver Nanoparticles dispersed Liquid Crystal

2015 ◽  
Vol 8 (3) ◽  
pp. 2176-2188 ◽  
Author(s):  
Keisham Nanao Singh
Keyword(s):  
Activation Energy ◽  
Silver Nanoparticles ◽  
Liquid Crystal ◽  
Dielectric Relaxation ◽  
Relaxation Process ◽  
Relaxation Times ◽  
Low Frequency ◽  
Bulk Liquid ◽  
Molecular Rearrangement ◽  
Relaxation Studies

This article reports on the Dielectric Relaxation Studies of two Liquid Crystalline compounds - 7O.4 and 7O.6 - doped with dodecanethiol capped Silver Nanoparticles. The liquid crystal molecules are aligned homeotropically using CTAB. The low frequency relaxation process occurring above 1 MHz is fitted to Cole-Cole formula using the software Dielectric Spectra fit. The effect of the Silver Nanoparticles on the molecular dipole dynamics are discussed in terms of the fitted relaxation times, Cole-Cole distribution parameter and activation energy. The study indicate a local molecular rearrangement of the liquid crystal molecules without affecting the order of the bulk liquid crystal molecules but these local molecules surrounding the Silver Nanoparticles do not contribute to the relaxation process in the studied frequency range. The observed effect on activation energy suggests a change in interaction between the nanoparticles/liquid crystal molecules.

scholarly journals Old Donors for New Molecular Conductors: Combining TMTSF and BEDT-TTF with Anionic (TaF6)1−x/(PF6)x Alloys

Crystals ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 386
Author(s):  
Magali Allain ◽  
Cécile Mézière ◽  
Pascale Auban-Senzier ◽  
Narcis Avarvari
Keyword(s):  
Single Crystal ◽  
Room Temperature ◽  
Density Wave ◽  
Spin Density Wave ◽  
Orthorhombic Phase ◽  
Molecular Conductors ◽  
Bechgaard Salts ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
Resistivity Measurements

Tetramethyl-tetraselenafulvalene (TMTSF) and bis(ethylenedithio)-tetrathiafulvalene (BEDT-TTF) are flagship precursors in the field of molecular (super)conductors. The electrocrystallization of these donors in the presence of (n-Bu4N)TaF6 or mixtures of (n-Bu4N)TaF6 and (n-Bu4N)PF6 provided Bechgaard salts formulated as (TMTSF)2(TaF6)0.84(PF6)0.16, (TMTSF)2(TaF6)0.56(PF6)0.44, (TMTSF)2(TaF6)0.44(PF6)0.56 and (TMTSF)2(TaF6)0.12(PF6)0.88, together with the monoclinic and orthorhombic phases δm-(BEDT-TTF)2(TaF6)0.94(PF6)0.06 and δo-(BEDT-TTF)2(TaF6)0.43(PF6)0.57, respectively. The use of BEDT-TTF and a mixture of (n-Bu4N)TaF6/TaF5 afforded the 1:1 phase (BEDT-TTF)2(TaF6)2·CH2Cl2. The precise Ta/P ratio in the alloys has been determined by an accurate single crystal X-ray data analysis and was corroborated with solution 19F NMR measurements. In the previously unknown crystalline phase (BEDT-TTF)2(TaF6)2·CH2Cl2 the donors organize in dimers interacting laterally yet no organic-inorganic segregation is observed. Single crystal resistivity measurements on the TMTSF based materials show typical behavior of the Bechgaard phases with room temperature conductivity σ ≈ 100 S/cm and localization below 12 K indicative of a spin density wave transition. The orthorhombic phase δo-(BEDT-TTF)2(TaF6)0.43(PF6)0.57 is semiconducting with the room temperature conductivity estimated to be σ ≈ 0.16–0.5 S/cm while the compound (BEDT-TTF)2(TaF6)2·CH2Cl2 is also a semiconductor, yet with a much lower room temperature conductivity value of 0.001 to 0.0025 S/cm, in agreement with the +1 oxidation state and strong dimerization of the donors.

scholarly journals Synthesis and Characterization of Lithium-Ion Conductive LATP-LaPO4 Composites Using La2O3 Nano-Powder

Materials ◽  
2021 ◽  
Vol 14 (13) ◽  
pp. 3502
Author(s):  
Fangzhou Song ◽  
Masayoshi Uematsu ◽  
Takeshi Yabutsuka ◽  
Takeshi Yao ◽  
Shigeomi Takai
Keyword(s):  
Room Temperature ◽  
Conduction Mechanism ◽  
Lithium Ion ◽  
X Ray Diffraction ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
X Ray ◽  
Nano Powder ◽  
Powder Addition

LATP-based composite electrolytes were prepared by sintering the mixtures of LATP precursor and La2O3 nano-powder. Powder X-ray diffraction and scanning electron microscopy suggest that La2O3 can react with LATP during sintering to form fine LaPO4 particles that are dispersed in the LATP matrix. The room temperature conductivity initially increases with La2O3 nano-powder addition showing the maximum of 0.69 mS∙cm−1 at 6 wt.%, above which, conductivity decreases with the introduction of La2O3. The activation energy of conductivity is not largely varied with the La2O3 content, suggesting that the conduction mechanism is essentially preserved despite LaPO4 dispersion. In comparison with the previously reported LATP-LLTO system, although some unidentified impurity slightly reduces the conductivity maximum, the fine dispersion of LaPO4 particles can be achieved in the LATP–La2O3 system.

scholarly journals A Study of the Impact of Graphite on the Kinetics of SPS in Nano- and Submicron WC-10%Co Powder Compositions

Ceramics ◽  
2021 ◽  
Vol 4 (2) ◽  
pp. 331-363
Author(s):  
Eugeniy Lantcev ◽  
Aleksey Nokhrin ◽  
Nataliya Malekhonova ◽  
Maksim Boldin ◽  
Vladimir Chuvil'deev ◽  
...  
Keyword(s):  
Activation Energy ◽  
Solid Phase ◽  
Continuous Heating ◽  
Diffusion Creep ◽  
Hard Alloys ◽  
Fine Grained ◽  
Plasma Sintering ◽  
Spark Plasma ◽  
The Impact ◽  
Kinetics Of

This study investigates the impact of carbon on the kinetics of the spark plasma sintering (SPS) of nano- and submicron powders WC-10wt.%Co. Carbon, in the form of graphite, was introduced into powders by mixing. The activation energy of solid-phase sintering was determined for the conditions of isothermal and continuous heating. It has been demonstrated that increasing the carbon content leads to a decrease in the fraction of η-phase particles and a shift of the shrinkage curve towards lower heating temperatures. It has been established that increasing the graphite content in nano- and submicron powders has no significant effect on the SPS activation energy for “mid-range” heating temperatures, QS(I). The value of QS(I) is close to the activation energy of grain-boundary diffusion in cobalt. It has been demonstrated that increasing the content of graphite leads to a significant decrease in the SPS activation energy, QS(II), for “higher-range” heating temperatures due to lower concentration of tungsten atoms in cobalt-based γ-phase. It has been established that the sintering kinetics of fine-grained WC-Co hard alloys is limited by the intensity of diffusion creep of cobalt (Coble creep).

Structure and Conductivity of Iodine-Doped C60 Thin Films

1994 ◽  
Vol 359 ◽  
Author(s):  
Jun Chen ◽  
Haiyan Zhang ◽  
Baoqiong Chen ◽  
Shaoqi Peng ◽  
Ning Ke ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Room Temperature ◽  
Conductivity Measurements ◽  
X Ray Diffraction ◽  
Temperature Conductivity ◽  
Room Temperature Conductivity ◽  
X Ray ◽  
Thermally Activated ◽  
Order Of Magnitude

ABSTRACTWe report here the results of our study on the properties of iodine-doped C60 thin films by IR and optical absorption, X-ray diffraction, and electrical conductivity measurements. The results show that there is no apparent structural change in the iodine-doped samples at room temperature in comparison with that of the undoped films. However, in the electrical conductivity measurements, an increase of more that one order of magnitude in the room temperature conductivity has been observed in the iodine-doped samples. In addition, while the conductivity of the undoped films shows thermally activated temperature dependence, the conductivity of the iodine-doped films was found to be constant over a fairly wide temperature range (from 20°C to 70°C) exhibiting a metallic feature.

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