The occupancy of the threading dislocation lines within n-type gallium nitride: Recent progress
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ABSTRACTWithin the framework of a grand partition function formalism, we examine the occupancy of the dangling bond dislocation defect sites and the VGa-ON dislocation defect sites within uncompensated n-type gallium nitride. The sensitivity of these results to variations in the unoccupied dislocation defect energy level is examined. We find that the VGa-ON dislocation defect sites’ greater capacity to store charge plays a large role in influencing the results, i.e., greater free electron and bulk donor concentrations are required in order to fully saturate the threading dislocation lines with charge.
2002 ◽
Vol 352
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pp. 63-69
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2001 ◽
Vol 335
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pp. 281-288
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1967 ◽
Vol 46
(7)
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pp. 2640-2643
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1974 ◽
pp. 281-297
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1984 ◽
Vol 149
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pp. 182-186
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1996 ◽
Vol 10
(06)
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pp. 683-699
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