Fabrication of Organic Small Molecular Thin Films based on Ultrasonic Spray-Assisted Vapor-Deposition Method

2012 ◽  
Vol 1400 ◽  
Author(s):  
Jinchun Piao ◽  
Shigetaka Katori ◽  
Takumi Ikenoue ◽  
Shizuo Fujita
Keyword(s):  
Thin Films ◽  
Indium Tin Oxide ◽  
Vapor Deposition ◽  
Low Cost ◽  
Device Fabrication ◽  
Deposition Method ◽  
Material Loss ◽  
Good Surface ◽  
Low Leakage ◽  
Molecular Thin Films

ABSTRACTSmall molecular thin films using solution-based method is a challengeable subject in organic optical and electronic devices. In our previous research, we successfully deposited aluminum tris(8-hydroxyquinoline) (Alq3) films on glass substrate. In this paper, aiming at future exploration of electroluminescent devices, we deposited N, N ’-Bis(3-methylphenyl)-N,N’- diphenylbenzidine) (TPD) films on indium-tin-oxide (ITO) substrates using the vapor-deposition method. Photoluminescence characteristics evidenced the actual formation of TPD thin films. Together with the good surface morphology and low leakage current of the films, the results are promising for actual device fabrication at low cost and low material loss.

scholarly journals Direct measurement of the thermoelectric properties of electrochemically deposited Bi2Te3 thin films

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Jose Recatala-Gomez ◽  
Pawan Kumar ◽  
Ady Suwardi ◽  
Anas Abutaha ◽  
Iris Nandhakumar ◽  
...  
Keyword(s):  
Thin Films ◽  
Thermoelectric Properties ◽  
Bismuth Telluride ◽  
Indium Tin Oxide ◽  
Seed Layer ◽  
Room Temperature ◽  
Low Cost ◽  
Temperature Dependent ◽  
Temperature Heat ◽  
Electrochemically Deposited

Abstract The best known thermoelectric material for near room temperature heat-to-electricity conversion is bismuth telluride. Amongst the possible fabrication techniques, electrodeposition has attracted attention due to its simplicity and low cost. However, the measurement of the thermoelectric properties of electrodeposited films is challenging because of the conducting seed layer underneath the film. Here, we develop a method to directly measure the thermoelectric properties of electrodeposited bismuth telluride thin films, grown on indium tin oxide. Using this technique, the temperature dependent thermoelectric properties (Seebeck coefficient and electrical conductivity) of electrodeposited thin films have been measured down to 100 K. A parallel resistor model is employed to discern the signal of the film from the signal of the seed layer and the data are carefully analysed and contextualized with literature. Our analysis demonstrates that the thermoelectric properties of electrodeposited films can be accurately evaluated without inflicting any damage to the films.

Vapor deposition of parylene-F using hydrogen as carrier gas

1999 ◽  
Vol 14 (1) ◽  
pp. 246-250 ◽  
Author(s):  
D. Mathur ◽  
G-R. Yang ◽  
T-M. Lu
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Device Fabrication ◽  
New Method ◽  
Silicon Substrates ◽  
Microelectronic Device ◽  
Precursor Method ◽  
Liquid Precursor ◽  
Carrier Gas ◽  
Liquid Precursors

A new method for depositing parylene-F (PA-F) thin films on silicon substrates has been explored. Hydrogen has been used as a carrier gas along with liquid precursors, dibromotetrafluoro-p-xylene and 1,4-bis(trifluoromethyl)benzene, to deposit PA-F. The properties of this film have been compared with the films obtained by the Gorham dimer method and the liquid precursor method using FTIR, XPS, and XRD. The PA-F films deposited by the dimer or liquid precursor acquired some kind of microcrystallinity on annealing. However, the PA-F films deposited in the presence of hydrogen were amorphous on annealing. This property could be potentially exploited for application in microelectronic device fabrication.

Growth of Rhombohedral B12P2 Thin Films on 6H-SiC(0001) By Chemical Vapor Deposition

2003 ◽  
Vol 799 ◽  
Author(s):  
Peng Lu ◽  
J. H. Edgar ◽  
J. Pomeroy ◽  
M. Kuball ◽  
H. M. Meyer ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Flow Rate ◽  
Growth Rates ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Flow Rate Ratio ◽  
Good Surface ◽  
Boron Phosphide ◽  
Moderate Growth

ABSTRACTThe parameters necessary to deposit oriented rhombohedral boron phosphide (B12P2) thin films on on-axis Si-face 6H-SiC(0001) substrates by chemical vapor deposition are reported. Ultra high purity BBr3 and PBr3 were used as reactants, with hydrogen as the carrier gas. The BBr3 to PBr3 flow rate ratio was adjusted to obtain good surface morphology of the B12P2 films. BBr3 to PBr3 ratios in the range of 1 to 1.5 produced smooth surfaces and moderate growth rates of 10μm/hr. Higher growth rates were obtained by increasing the BBr3 flow rate, but the surfaces became very rough. The c-axis of the B12P2 film was aligned with the c -axis of the substrate at temperatures between 1650°C-1700°C. The surface morphologies were investigated by SEM and the crystalline properties of the films were characterized by XRD and Raman spectroscopy.

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