Photopatterneable Block Co-Polymers for Laser Interference Lithography

ABSTRACTWe report on the laser interference patterning of as-spun block copolymer films on silicon and silicon dioxide substrates. Our process involves the use of a pulsed laser light source of 266 nm wavelength and any type of diblock copolymer as a positive tone photoresist, resulting in the generation of sub-micron domains of different geometries and periodicity. This non-solvent based method is robust, and when combined with the inherent nano-scaled periodicity in block copolymers, can produce hierarchical patterns on substrates with potential use in the electronics and semiconductor industries.