scholarly journals Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors

2012 ◽  
Vol 2 (11) ◽  
pp. 1571 ◽  
Author(s):  
Alexander Arriola ◽  
Ainara Rodriguez ◽  
Noemi Perez ◽  
Txaber Tavera ◽  
Michael J. Withford ◽  
...  
Keyword(s):  
Pulsed Laser ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
High Quality

Photopatterneable Block Co-Polymers for Laser Interference Lithography

2012 ◽  
Vol 1412 ◽  
Author(s):  
Taiwo R. Alabi ◽  
Dajun Yuan ◽  
Suman Das
Keyword(s):  
Block Copolymer ◽  
Silicon Dioxide ◽  
Laser Light ◽  
Pulsed Laser ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Copolymer Films ◽  
Laser Light Source ◽  
Potential Use

ABSTRACTWe report on the laser interference patterning of as-spun block copolymer films on silicon and silicon dioxide substrates. Our process involves the use of a pulsed laser light source of 266 nm wavelength and any type of diblock copolymer as a positive tone photoresist, resulting in the generation of sub-micron domains of different geometries and periodicity. This non-solvent based method is robust, and when combined with the inherent nano-scaled periodicity in block copolymers, can produce hierarchical patterns on substrates with potential use in the electronics and semiconductor industries.

Periodic patterning using multi-facet prism based laser interference lithography

Laser Physics ◽  
2009 ◽  
Vol 19 (3) ◽  
pp. 505-510 ◽  
Author(s):  
R. Sidharthan ◽  
F. Chollet ◽  
V. M. Murukeshan
Keyword(s):  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference

Theoretical study of micro-structure fabrication by multi-beam laser interference lithography with different polarization combinations

2021 ◽  
pp. 2150459
Author(s):  
Xiangxian Wang ◽  
Tianxu Jia ◽  
Jiankai Zhu ◽  
Yingwen Su ◽  
Liping Zhang ◽  
...  
Keyword(s):  
Manufacturing Industry ◽  
Structural Parameters ◽  
Interference Lithography ◽  
Polarization Angle ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Micro Structure ◽  
Periodic Patterns ◽  
Beam Laser ◽  
Micro Structures

In this study, we systematically and comprehensively investigated the influence of polarization angle on the fabrication of micro-structures by multi-beam laser interference lithography. Using theoretical analysis and simulation, we studied the effect of different polarization combinations, i.e. transverse electric (TE) and transverse magnetic (TM) polarization combinations, on the characteristics of the micro-structures fabricated by three-, four-, and six-beam laser interference lithography. We successfully obtained micro-structures with different periodic patterns such as honeycomb dots, quasi-elliptic dots, different square dots, and quasi-triangular dots. The simulation results illustrate that polarization affects the formation of interference patterns, pattern contrasts, and periods. The methods discussed herein are simple, low cost, and allow excellent control over structural parameters, and hence are useful for the micro-structure manufacturing industry.

scholarly journals UV-Laser Interference Lithography for Local Functionalization of Plasmonic Nanostructures with Responsive Hydrogel

2020 ◽  
Vol 124 (5) ◽  
pp. 3297-3305 ◽  
Author(s):  
Nestor Gisbert Quilis ◽  
Simone Hageneder ◽  
Stefan Fossati ◽  
Simone K. Auer ◽  
Priyamvada Venugopalan ◽  
...  
Keyword(s):  
Interference Lithography ◽  
Plasmonic Nanostructures ◽  
Laser Interference Lithography ◽  
Uv Laser ◽  
Laser Interference

High-power laser interference lithography process on photoresist: Effect of laser fluence and polarisation

2009 ◽  
Vol 255 (10) ◽  
pp. 5537-5541 ◽  
Author(s):  
M. Ellman ◽  
A. Rodríguez ◽  
N. Pérez ◽  
M. Echeverria ◽  
Y.K. Verevkin ◽  
...  
Keyword(s):  
High Power ◽  
Laser Fluence ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
High Power Laser ◽  
Laser Interference ◽  
Power Laser ◽  
Lithography Process

Formation of 300 nm period pore arrays by laser interference lithography and electrochemical etching

2015 ◽  
Vol 106 (5) ◽  
pp. 053107 ◽  
Author(s):  
J. Liu ◽  
P. Kleimann ◽  
G. Laffite ◽  
C. Jamois ◽  
R. Orobtchouk
Keyword(s):  
Electrochemical Etching ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference
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