Size-dependent Reactivity in the Functionalization of Nanostructured Silicon Surfaces

2011 ◽  
Vol 1359 ◽  
Author(s):  
Joel A. Kelly ◽  
Amber M. Shukaliak ◽  
Michael D. Fleischauer ◽  
Jonathan G.C. Veinot

ABSTRACTThe reactivity of silicon nanocrystals (Si-NCs) in near-UV photochemical hydrosilylation was evaluated as a function of size. Results show that Si-NCs with photoluminescence (PL) in the visible spectral region react faster than Si-NCs with near-IR PL. Fourier-transform infrared (FTIR) spectroscopy suggests this difference in reactivity is due to quantum size effects in the exciton-mediated mechanism proposed for this reaction. We have carried out a detailed comparison of Si-NC reactivity in photochemical and thermal hydrosilylation and determined the conditions under which Si-NCs may be size-selected based on their reactivity.

Nanoscale ◽  
2016 ◽  
Vol 8 (6) ◽  
pp. 3678-3684 ◽  
Author(s):  
Wei Sun ◽  
Chenxi Qian ◽  
Xiao Sherri Cui ◽  
Liwei Wang ◽  
Muan Wei ◽  
...  

The in-depth study of a convenient synthesis of NIR-emitting ncSi, requiring only thermal processing of commercial SiO. The size separation enabled the study of quantum size effects, pinpointing the most efficient PL wavelength.


2014 ◽  
Vol 27 (4) ◽  
pp. 746-749 ◽  
Author(s):  
Wei Sun ◽  
Chenxi Qian ◽  
Liwei Wang ◽  
Muan Wei ◽  
Melanie L. Mastronardi ◽  
...  

1991 ◽  
Vol 16 (6) ◽  
pp. 623-638 ◽  
Author(s):  
P.A. Badoz ◽  
F. Arnaud d'Avitaya ◽  
E. Rosencher

1983 ◽  
Vol 44 (C10) ◽  
pp. C10-375-C10-378 ◽  
Author(s):  
P. Ahlqvist ◽  
P. de Andrés ◽  
R. Monreal ◽  
F. Flores

1968 ◽  
Vol 96 (9) ◽  
pp. 61-86 ◽  
Author(s):  
B.A. Tavger ◽  
V.Ya. Demikhovskii

1997 ◽  
Vol 229 (6) ◽  
pp. 401-405 ◽  
Author(s):  
A. Crépieux ◽  
C. Lacroix ◽  
N. Ryzhanova ◽  
A. Vedyayev

2006 ◽  
Vol 100 (11) ◽  
pp. 114905 ◽  
Author(s):  
M. Cattani ◽  
M. C. Salvadori ◽  
A. R. Vaz ◽  
F. S. Teixeira ◽  
I. G. Brown

1993 ◽  
Vol 97 (37) ◽  
pp. 9493-9498 ◽  
Author(s):  
Ladislav Kavan ◽  
Tiziana Stoto ◽  
Michael Graetzel ◽  
Donald Fitzmaurice ◽  
Valery Shklover

1992 ◽  
Vol 283 ◽  
Author(s):  
R. Tsu ◽  
L. Ioriatti ◽  
J. F. Harvey ◽  
H. Shen ◽  
R. A. Lux

ABSTRACTThe reduction of the dielectric constant due to quantum confinement is studied both experimentally and theoretically. Angle resolved ellipsometry measurements with Ar- and He-Ne-lasers give values for the index of refraction far below what can be accounted for from porosity alone. A modified Penn model to include quantum size effects has been used to calculate the reduction in the static dielectric constant (ε) with extreme confinement. Since the binding energy of shallow impurities depends inversely on ε2, the drastic decrease in the carrier concentration as a result of the decrease in ε leads to a self-limiting process for the electrochemical etching of porous silicon.


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