Intrinsic Point Defects and Their Control in Silicon Crystal Growth and Wafer Processing

MRS Bulletin ◽  
2000 ◽  
Vol 25 (6) ◽  
pp. 28-32 ◽  
Author(s):  
R. Falster ◽  
V. V. Voronkov

Silicon produced for the microelectronics industry is far and away the purest and most perfect crystalline material manufactured today. It is fabricated routinely and in very large volumes. Many of the advances in integrated-circuit (IC) manufacturing achieved in recent years would not have been possible without parallel advances in silicon-crystal quality and defect engineering. Transition-metal contamination is a case in point. Essentially all practical problems (minority carrier lifetime, metal precipitation, stacking faults, etc.) associated with metal contaminants have largely been solved through advances in crystal purity.

AIP Advances ◽  
2019 ◽  
Vol 9 (10) ◽  
pp. 105219 ◽  
Author(s):  
Takefumi Kamioka ◽  
Yuki Isogai ◽  
Yutaka Hayashi ◽  
Yoshio Ohshita ◽  
Atsushi Ogura

2011 ◽  
Vol 415-417 ◽  
pp. 1323-1326 ◽  
Author(s):  
Qiu Yan Hao ◽  
Xin Jian Xie ◽  
Bing Zhang Wang ◽  
Cai Chi Liu

In order to investigate the performance of silicon single crystal depended on the annealing temperature, the minority carrier lifetime, the resistivity and oxygen concentration after different temperature annealing in Ar ambient were examined. And the effect of oxygen and related defects formed during annealed on the minority carrier lifetime were analyzed by microwave photoconductivity method, Fourier transform infrared spectrometer and four-probe measurement. The results indicate that after 450°C annealing for 30h, the resistivity and minority carrier lifetime of silicon increase significantly, while the concentration of interstitial oxygen decreases. After the annealing at 650°C, oxygen donor can be removed and the resistivity and the minority carrier lifetime decrease. During the high-temperature (above 650°C) annealing, the oxygen precipitation can decrease the minority carrier lifetime silicon.


2016 ◽  
Vol 858 ◽  
pp. 380-383 ◽  
Author(s):  
Stefania Privitera ◽  
Grazia Litrico ◽  
Massimo Camarda ◽  
Nicolò Piluso ◽  
Francesco La Via

In this paper we have studied the connection between crystal quality and electrical transport in 4H-SiC by simultaneous micro-photoluminescence (μPL) and photocurrent (PC) measurements. We have used a focused HeCd laser at 325 nm (i.e. above bandgap) to measure with a spatial resolution of few microns both the μPL spectra and the I-V characteristics in 4H-SiC/Ni Schottky diodes. We found that the PC signal acquired along a defect can give information on its spatial distribution in depth. The minority carrier lifetime has been also estimated and its dependence on the emission wavelength has been determined for several stacking faults.


1971 ◽  
Vol 7 (25) ◽  
pp. 754
Author(s):  
R.E. Thomas ◽  
V. Makios ◽  
S. Ogletree ◽  
R. Mckillican

2019 ◽  
Vol 3 (6) ◽  
Author(s):  
Zhihao Xu ◽  
Denis A. Shohonov ◽  
Andrew B. Filonov ◽  
Kazuhiro Gotoh ◽  
Tianguo Deng ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document