Selective-area growth and transport properties of MnAs/InAs heterojunction nanowires

2019 ◽  
Vol 34 (23) ◽  
pp. 3863-3876 ◽  
Author(s):  
Shinjiro Hara ◽  
Matthias T. Elm ◽  
Peter J. Klar
Keyword(s):  
Transport Properties ◽  
Selective Area Growth ◽  
Selective Area ◽  
Area Growth ◽  
Image Position

Abstract

Selective-area growth of III-V nanowires and their applications

2011 ◽  
Vol 26 (17) ◽  
pp. 2127-2141 ◽  
Author(s):  
Katsuhiro Tomioka ◽  
Keitaro Ikejiri ◽  
Tomotaka Tanaka ◽  
Junichi Motohisa ◽  
Shinjiroh Hara ◽  
...  
Keyword(s):  
Selective Area Growth ◽  
Selective Area ◽  
Area Growth ◽  
Image Position

Abstract

scholarly journals Selective Area Growth (SAG) and Epitaxial Lateral Overgrowth (ELO) of GaN using Tungsten Mask

1999 ◽  
Vol 4 (S1) ◽  
pp. 441-446 ◽  
Author(s):  
Yasutoshi Kawaguchi ◽  
Shingo Nambu ◽  
Hiroki Sone ◽  
Masahito Yamaguchi ◽  
Hideto Miyake ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy ◽  
Epitaxial Lateral Overgrowth ◽  
Selective Area Growth ◽  
Crystal Axis ◽  
Lateral Overgrowth ◽  
Selective Area ◽  
Area Growth ◽  
Image Position

Selective area growth (SAG) and epitaxial lateral overgrowth (ELO) of GaN using tungsten (W) mask by metalorganic vapor phase epitaxy (MOVPE) and hydride vapor phase epitaxy (HVPE) have been studied. The selectivity of the GaN growth on the W mask as well as the SiO2 mask is excellent for both MOVPE and HVPE. The ELO-GaN layers are successfully obtained by HVPE on the stripe patterns along the <1 00> crystal axis with the W mask as well as the SiO2 mask. There are no voids between the SiO2 mask and the overgrown GaN layer, while there are triangular voids between the W mask and the overgrown layer. The surface of the ELO-GaN layer is quite uniform for both mask materials. In the case of MOVPE, the structures of ELO layers on the W mask are the same as those on the SiO2 mask for the <11 0> and <1 00> stripe patterns. No voids are observed between the W or SiO2 mask and the overgrown GaN layer by using MOVPE.

scholarly journals Selective Area Growth of GaN Directly on (0001) Sapphire by the HVPE Technique

1998 ◽  
Vol 3 ◽  
Author(s):  
Raj Singh ◽  
Richard J. Barrett ◽  
John J. Gomes ◽  
Ferdynand P. Dabkowski ◽  
T.D. Moustakas
Keyword(s):  
Stimulated Emission ◽  
Hydride Vapor Phase Epitaxy ◽  
Buffer Layers ◽  
Epitaxial Lateral Overgrowth ◽  
Selective Area Growth ◽  
Growth Technique ◽  
Sapphire Substrates ◽  
Selective Area ◽  
Area Growth ◽  
Image Position

In this paper, we report on the selective area growth (SAG) of GaN directly on patterned c-plane sapphire substrates by hydride vapor phase epitaxy (HVPE). A number of researchers have reported that the HVPE growth technique, unlike the MBE and MOCVD methods, is capable of producing device quality GaN films without the need for any low temperature nucleation/buffer layers. The density of edge dislocations in these HVPE films decreases dramatically as the film thickness is increased, and the dislocation density values for thick films (> 10μm) are comparable to those reported for the best GaN films grown by other methods on c-sapphire. These advantages of the HVPE growth technique makes it possible to achieve high quality selective area growth of GaN directly on c-sapphire substrates.C-plane sapphire substrates were coated with PECVD SiO2 and photolithographically patterned with different size and shape openings. Subsequently, these patterned substrates were introduced in a horizontal, hot-wall quartz reactor for the GaN growth. It was observed that single crystal GaN growth was preferentially initiated in the openings in the oxide layer. This selective area growth was followed by epitaxial lateral overgrowth (ELO), leading to the formation of hexagonal GaN prisms terminated in smooth, vertical (100) facets. We have been successful in shearing these pyramid structures from the sapphire substrates as individual devices, which do not require any post-growth etching for feature definition. This procedure allows for the dramatic reduction of the process complexity and the duration and expense for GaN growth for device applications. Stimulated emission results on these self-formed optical cavities are also presented.

scholarly journals Selective-area growth and optical properties of GaN nanowires on patterned SiOx/Si substrates

2021 ◽  
Vol 1851 (1) ◽  
pp. 012006
Author(s):  
V O Gridchin ◽  
R R Reznik ◽  
K P Kotlyar ◽  
A S Dragunova ◽  
L N Dvoretckaia ◽  
...  
Keyword(s):  
Optical Properties ◽  
Selective Area Growth ◽  
Si Substrates ◽  
Gan Nanowires ◽  
Selective Area ◽  
Area Growth

scholarly journals Fully in situ Nb/InAs-nanowire Josephson junctions by selective-area growth and shadow evaporation

2021 ◽  
Author(s):  
Pujitha Perla ◽  
H. Aruni Fonseka ◽  
Patrick Zellekens ◽  
Russell Deacon ◽  
Yisong Han ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Josephson Junctions ◽  
Quantum Circuits ◽  
Selective Area Growth ◽  
Selective Area ◽  
Area Growth ◽  
Shadow Evaporation ◽  
Superconducting Quantum Circuits

Nb/InAs-nanowire Josephson junctions are fabricated in situ by a special shadow evaporation scheme for the superconducting Nb electrode. The junctions are interesting candidates for superconducting quantum circuits requiring large magnetic fields.

scholarly journals Selective area growth of cubic gallium nitride on silicon (001) and 3C-silicon carbide (001)

AIP Advances ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 075013
Author(s):  
F. Meier ◽  
M. Protte ◽  
E. Baron ◽  
M. Feneberg ◽  
R. Goldhahn ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Gallium Nitride ◽  
Selective Area Growth ◽  
Selective Area ◽  
Area Growth
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