Unusual irradiation-induced disordering in Cu3Au near the critical temperature: An in situ study using electron diffraction

2018 ◽  
Vol 33 (22) ◽  
pp. 3841-3848
Author(s):  
Calvin Robert Lear ◽  
Robert S. Averback ◽  
Pascal Bellon ◽  
Andrea E. Sand ◽  
Marquis A. Kirk
Keyword(s):  
Critical Temperature ◽  
Electron Diffraction ◽  
In Situ Study ◽  
Image Position

Abstract

In situ study on Cu–Ni cross-interaction in Cu/Sn/Ni solder joints under temperature gradient

2016 ◽  
Vol 31 (5) ◽  
pp. 609-617 ◽  
Author(s):  
Yi Zhong ◽  
Mingliang Huang ◽  
Haitao Ma ◽  
Wei Dong ◽  
Yunpeng Wang ◽  
...  
Keyword(s):  
Temperature Gradient ◽  
Solder Joints ◽  
In Situ Study ◽  
Image Position

Abstract

In Situ Study of Zirconia Stabilization by Anion Exchange (N for O) Using High-Temperature, Controlled Atmosphere Electron Diffraction

1999 ◽  
Vol 589 ◽  
Author(s):  
Renu Sharma ◽  
Eberhard Schweda ◽  
Dirk Naedele
Keyword(s):  
High Temperature ◽  
Electron Diffraction ◽  
Anion Exchange ◽  
High Temperatures ◽  
Controlled Atmosphere ◽  
In Situ Study ◽  
Environmental Cell ◽  
Temperature Controlled ◽  
Cubic Structure

AbstractStabilization of zirconia by anion exchange (N for O) is a novel idea. A number of oxy-nitrides with flourite-related (cubic) structure have been reported to form at high temperatures (1100°C). We have used a TEM equipped with environmental cell and Gatan Imaging Filter (GIF) to study the nitridation behavior of zirconia. The in situ observations reveal the formation of a cubic structure at ≈800°C when the Zr(OH) 4×H2O precursor was heated in ≈2 torr of NH3. The presence of N in the lattice is confirmed by electron energyloss spectroscopy.

In-situ study of microscale fracture of diffusion aluminide bond coats: Effect of platinum

2015 ◽  
Vol 30 (21) ◽  
pp. 3343-3353 ◽  
Author(s):  
Balila Nagamani Jaya ◽  
Sanjit Bhowmick ◽  
S.A. Syed Asif ◽  
Vikram Jayaram
Keyword(s):  
Bond Coats ◽  
In Situ Study ◽  
Image Position

Abstract

In situ study of thermally activated flow and dynamic restoration of ultrafine-grained pure Cu at 373 K

2017 ◽  
Vol 32 (24) ◽  
pp. 4514-4521
Author(s):  
Wolfgang Blum ◽  
Petr Král ◽  
Jiri Dvořák ◽  
Martin Petrenec ◽  
Philip Eisenlohr ◽  
...  
Keyword(s):  
Thermally Activated ◽  
In Situ Study ◽  
Ultrafine Grained ◽  
Image Position ◽  
Pure Cu

Abstract

scholarly journals An in situ study on Kr ion–irradiated crystalline Cu/amorphous-CuNb nanolaminates

2019 ◽  
Vol 34 (13) ◽  
pp. 2218-2228 ◽  
Author(s):  
Zhe Fan ◽  
Cuncai Fan ◽  
Jin Li ◽  
Zhongxia Shang ◽  
Sichuang Xue ◽  
...  
Keyword(s):  
In Situ Study ◽  
Image Position

Abstract

Simple Identification of Electron Diffraction Ring Patterns

1969 ◽  
Vol 27 ◽  
pp. 160-161
Author(s):  
Carolyn Nohr ◽  
Ann Ayres
Keyword(s):  
Electron Microscope ◽  
Electron Diffraction ◽  
Diffraction Ring ◽  
Image Position

Texts on electron diffraction recommend that the camera constant of the electron microscope be determine d by calibration with a standard crystalline specimen, using the equation

Transmission Electron Microscopy of Epitaxial silicides grown by ultra high vacuum deposition

1989 ◽  
Vol 47 ◽  
pp. 462-463
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Transmission Electron

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.

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