Electrical properties of SnO2:Sb ultrathin films prepared by colloidal deposition process

2016 ◽  
Vol 31 (1) ◽  
pp. 148-153
Author(s):  
Tiago G. Conti ◽  
Adenilson J. Chiquito ◽  
Edson R. Leite
Keyword(s):  
Electrical Properties ◽  
Ultrathin Films ◽  
Deposition Process ◽  
Colloidal Deposition ◽  
Image Position

Abstract

SUPERCONDUCTING PROPERTIES OF BSCCO (2223) ULTRATHIN FILMS

2002 ◽  
Vol 09 (05n06) ◽  
pp. 1757-1760
Author(s):  
L. NAVARRETE ◽  
A. MARIÑO ◽  
H. SÁNCHEZ
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Structural Characterization ◽  
Ultrathin Films ◽  
Rf Magnetron Sputtering ◽  
Ex Situ ◽  
Thermal Treatments ◽  
Superconducting Properties

Ultrathin films of (Bi–Pb)–Sr–Ca–Cu–O (2223) were produced by ex situ RF magnetron sputtering on MgO (100) substrates. Films with different thermal treatments and thickness varying between 30 nm and 300 nm were obtained and studied systematically. A structural characterization of these samples was carried out and correlated with their electrical properties and thickness.

Formation of silver films for advanced electrical properties by using aerosol deposition process

2018 ◽  
Vol 57 (11S) ◽  
pp. 11UF05 ◽  
Author(s):  
Myung-Yeon Cho ◽  
Dong-Won Lee ◽  
Ik-Soo Kim ◽  
Won-Ho Lee ◽  
Je-Wook Yoo ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Aerosol Deposition ◽  
Deposition Process ◽  
Silver Films

Improved Deposition Process of CVD-(Ba,Sr)TiO3 on Ru

2000 ◽  
Vol 655 ◽  
Author(s):  
M. Tarutani ◽  
T. Sato ◽  
M. Yamamuka ◽  
T. Kawahara ◽  
T. Horikawa ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Inductively Coupled Plasma ◽  
Deposition Process ◽  
Molar Ratio ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Plasma Mass Spectrometry ◽  
Bst Films ◽  
20 Nm ◽  
Uniform Composition

Abstract(Ba,Sr)TiO3 [BST] films were deposited by the flash vaporization CVD method with a unique liquid delivery system. An inductively coupled plasma mass spectrometry [ICP-MS] analysis revealed the decline of (Ba+Sr)/Ti molar ratio of the initial BST-layer on Ru. By readjusting the flow ratio of liquid sources and using a two-step deposition method, we obtained 30-nm-thick BST films with uniform composition profile, exhibiting good electrical properties. The leakage property, however, was severely deteriorated in BST films less than 24 nm thick. A SEM observation showed the presence of micro-roughness or micro-hillocks in these films, which were confirmed to be caused by Ru oxidation. Therefore, an annealing process of the Ru electrode was added for its planarization, and the CVD process was also improved. As a result, we obtained smooth and finely crystallized ∼ 20-nm-thick BST films with good electrical properties of equivalent SiO2 thickness (teq) ∼ 0.45 nm and leakage current < 1 × 10−7 A/cm2. We also measured properties of BST films deposited on the 3-D Ru electrode. The results are briefly discussed.

Crystallization Behavior and Electrical Properties of Wet-Chemically Deposited Lead Zirconate Titanate Thin Films

1993 ◽  
Vol 310 ◽  
Author(s):  
S. Merklein ◽  
D. Sporn ◽  
A. SchÖnecker
Keyword(s):  
Electrical Properties ◽  
Lead Zirconate Titanate ◽  
Lead Acetate ◽  
Ferroelectric Properties ◽  
Chemical Deposition ◽  
Deposition Process ◽  
Lead Zirconate ◽  
Lead Acetate Trihydrate ◽  
Acetate Trihydrate ◽  
Wet Chemical

AbstractA wet chemical deposition process for smooth and crackfree films in the system Pb(Zr 1-x Tix)O3 (PZT) has been developed. Final film thicknesses, reached with one coating step, were in the region of 1 μm. Starting from lead acetate trihydrate, zirconium- and titanium-n-propoxide, high molarity (> 2M) coating sols have been prepared that could be handled in air and were stable for more than 170 days.Films with compositions near the morphotropic phase boundary (x=47) and various lead contents were deposited on Pt-coated Si-wafers and Al2O3-substrates by a spin-on method. Wet films could be pyrolyzed and densified with a fast heat treatment without cracking. The crystallization of films into the desired perovskite structure started at comparatively low temperatures (ca. 530 °C) and proceeded rapidly at temperatures above 650 °C. A slight molar excess of lead and a proper heating rate were found to produce films with the best electrical properties. The films on platinized A12O3 substrates showed device-worthy dielectric and ferroelectric properties with typical values for Pn, EC, and ε, of 24 μC/cm2, 4.5 KV/mm and 650, respectively.

Discovering a selective semimetal element to increase hematite photoanode charge separation efficiency

2019 ◽  
Vol 7 (28) ◽  
pp. 16992-16998 ◽  
Author(s):  
André Esteves Nogueira ◽  
Mario Rodrigo Santos Soares ◽  
João Batista Souza Junior ◽  
Carlos Alberto Ospina Ramirez ◽  
Flavio Leandro Souza ◽  
...  
Keyword(s):  
Water Oxidation ◽  
Charge Separation ◽  
Separation Efficiency ◽  
Deposition Process ◽  
Colloidal Deposition ◽  
Charge Separation Efficiency

A colloidal deposition process combined with the thermal spreading ability of Sb over hematite surface is used to obtain a mesoporous photoanode for water oxidation.

Relationship between electrical properties and crystallinity of YBa/sub 2/Cu/sub 3/O/sub 7-x/ ultrathin films

1997 ◽  
Vol 7 (2) ◽  
pp. 1494-1497
Author(s):  
Y.N. Drozdov ◽  
Y.N. Nozdrin ◽  
A.E. Parafin ◽  
S.A. Pavlov ◽  
V.V. Talanov ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Ultrathin Films

The colloidal nanocrystal deposition process: an advanced method to prepare high performance hematite photoanodes for water splitting

2014 ◽  
Vol 7 (7) ◽  
pp. 2250-2254 ◽  
Author(s):  
Ricardo H. Gonçalves ◽  
Edson R. Leite
Keyword(s):  
Magnetic Field ◽  
External Magnetic Field ◽  
Water Splitting ◽  
High Performance ◽  
Magnetorheological Fluid ◽  
Deposition Process ◽  
Sintering Process ◽  
Advanced Method ◽  
Colloidal Deposition

The association of colloidal deposition of magnetorheological fluid in the presence of an external magnetic field with a sintering process facilitates the attainment of hematite photoanodes with high performance for water splitting.

scholarly journals The effect of oxidation on structural and electrical properties of single wall carbon nanotubes

2011 ◽  
Vol 65 (4) ◽  
pp. 363-370 ◽  
Author(s):  
Zoran Markovic ◽  
Davor Perusko ◽  
Dragana Tosic ◽  
Nebojsa Romcevic ◽  
Miroslav Dramicanin ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Electrical Properties ◽  
Elevated Temperatures ◽  
Sodium Dodecyl ◽  
Copper Substrate ◽  
Carbon Matrix ◽  
Deposition Process ◽  
Single Wall Carbon Nanotubes ◽  
Single Wall Carbon ◽  
Deposited Films

Single wall carbon nanotubes (SWCNTs) represent an important group of nanomaterials with attractive electrical, chemical, and mechanical properties. In this work we have investigated the structural, optical and electrical properties of single wall carbon nanotube films deposited on copper substrate and then transferred to polymethyl methacrylate (PMMA). The properties of deposited films were varied by changing different parameters: substrate temperature, deposition time and electric field strength. Atomic force microscopy (AFM) has been used to study the deposition process of SWCNT films on copper substrate. AFM analysis has shown that sodium dodecyl sulfate (SDS) micellas were deposited on copper substrate before carbon nanotubes because of their higher mobility. Raman spectroscopy revealed that SWCNTs deposited at elevated temperatures are oxidized. FTIR results showed that COOH groups and Cu2O were generated during electrophoretic process. The SWCNT films were transferred to PMMA substrate and they achieved a sheet resistance of 360 ?/sq with 79% transparency at 550 nm wavelength and a strong adhesion to the substrate. The main reasons for higher values of sheet resistances of SWCNT thin films compared to those of other authors are oxidation of carbon nanotubes during electrophoresis and the presence of used surfactans in carbon matrix of deposited films.

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