Kinetically stable glassy phase formation in neodymium nickelate thin films as evidenced by Hall effect and electrical resistivity measurements

2013 ◽  
Vol 28 (13) ◽  
pp. 1699-1706 ◽  
Author(s):  
Megan Campbell Prestgard ◽  
Ashutosh Tiwari
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Hall Effect ◽  
Phase Formation ◽  
Glassy Phase ◽  
Resistivity Measurements ◽  
Image Position ◽  
Neodymium Nickelate

Abstract

Homogeneous Al-Ti and Al-Ti-Si Thin Alloy Films

1985 ◽  
Vol 54 ◽  
Author(s):  
Albertus G. Dirks ◽  
Tien Tien ◽  
Janet M. Towner
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Grain Size ◽  
Electrical Resistivity ◽  
Phase Formation ◽  
Alloy Composition ◽  
Al Alloy ◽  
Second Phase ◽  
Alloy Films ◽  
Microstructure And Properties

ABSTRACTThe microstructure and properties of thin films depends strongly upon the alloy composition. A study was made of the metallurgical aspects of homogeneous Al alloy films, particularly the binary Al-Ti and the ternary Al-Ti-Si systems. Electrical resistivity, grain size morphology, second phase formation and electromigration have been studied as a function of the alloy composition and its heat treatment.

Electric Resistivity and Hall Effect of Ni(Co)-Mn-Al Melt Spun Ribbons

2016 ◽  
Vol 845 ◽  
pp. 65-68 ◽  
Author(s):  
Marina Seredina ◽  
Mariya Lyange ◽  
Vladimir V. Khovaylo ◽  
Sergey Taskaev ◽  
Hiroyuki Miki ◽  
...  
Keyword(s):  
Electrical Resistivity ◽  
Martensitic Transformation ◽  
Hall Effect ◽  
Carrier Mobility ◽  
Electric Resistivity ◽  
Temperature Hysteresis ◽  
Resistivity Measurements ◽  
First Order ◽  
Melt Spun ◽  
Melt Spun Ribbons

In the present work the influence of Co alloying on transport properties of Ni-Mn-Al melt-spun ribbons was investigated. Results of electrical resistivity measurements showed that Ni50Mn31Al19 and Ni45Co5Mn32Al18 samples exhibit a temperature hysteresis of the electrical resistivity which was attributed to a first order martensitic transformation while no hysteresis was observed in Ni40Co10Mn33Al17 sample. Measurements of the Hall effect indicated that the Co alloying leads to an increase of carrier mobility.

Characterization of Al and Al-Cr-Al Thin Films

1986 ◽  
Vol 77 ◽  
Author(s):  
O. F. De Lima ◽  
Y. Lepetre ◽  
M. B. Brodsky
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Electrical Resistivity ◽  
X Ray Diffraction ◽  
X Ray ◽  
Resistivity Measurements ◽  
The Individual ◽  
Perfect Continuity ◽  
Substrate Temperatures

ABSTRACTTEM, X-ray diffraction, and electrical resistivity measurements were used to study the microstructure and the growth of AI-Cr-AI film sandwiches, where the individual Al layers were 300 Å thick and the Cr thickness was varied between 0–10 atomic layers. The base vacuum was around 1.0 × 10−10 torr, substrate temperatures varied between 100–350 °C, and evaporation rates were 3Å/s for Al and ∼0.1 – 0.2 Å/s for Cr. All Al films had a strong (111) texture and showed a non-percolative island structure at 350 °C. The films became connected at lower substrate temperatures, reaching perfect continuity at 100°C. However, electrical conductivity is achieved also for the films deposited at 350 °C when one or more atomic layers of Cr are sandwiched between the Al layers. Results for the superconducting critical temperature and resistivity are discussed in terms of Cr diffusion into Al and the film size effect.

scholarly journals On the Electrical and Optical Properties Stability of P3HT Thin Films Sensitized with Nitromethane Ferric Chloride Solutions

Coatings ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1074
Author(s):  
Laura Hrostea ◽  
Liviu Leontie ◽  
Marius Dobromir ◽  
Corneliu Doroftei ◽  
Mihaela Girtan
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Optical Properties ◽  
Ferric Chloride ◽  
Electrical And Optical Properties ◽  
Chloride Solutions ◽  
Resistivity Measurements ◽  
Heating And Cooling ◽  
Fecl3 Solution ◽  
Electrical Characterizations

The electrical and optical properties stability of poly(3-hexylthiophene) (P3HT) thin films sensitized with nitromethane ferric chloride (FeCl3) solution was investigated. The optical properties modifications were studied by spectrophotometry and ellipsometry. For electrical characterizations, electrical resistivity measurements were performed. In agreement with the observations of other authors, an important decrease in the electrical resistivity by six orders of magnitude was noticed. In addition, the repeatability and stability of this phenomenon were investigated over a few weeks after sensitization and during different cycles of heating and cooling, both in the dark and under illumination.

the Microstructure and Electrical Resistivity of Cluster-Based thin Films

1993 ◽  
Vol 317 ◽  
Author(s):  
Jeffery D. Bielefeld ◽  
Ronald P. Andres
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Metal Films ◽  
Thin Metal ◽  
Silver Clusters ◽  
Vacuum Deposition ◽  
Thin Metal Films ◽  
Resistivity Measurements ◽  
Glass Substrates

ABSTRACTCluster-assembled thin metal films exhibit properties which are different from those of films obtained by conventional atomic-deposition. We present TEM data on the evolution of 2-D Microstructure and SFM data on the evolution of 3-D Microstructure in thin films grown by vacuum deposition of preformed silver clusters and of preformed acetylene-silver clusters on flat SiO2, and Mica. Electrical resistivity measurements of cluster-based Ag and Ag/C2H2 films deposited on glass substrates with nominal film thicknesses of 5 nm - 50 nm are also presented and discussed.

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