The microstructural evolution and thermal stability of nanocrystalline ball-milled Ni–15 at.% W powder

2013 ◽  
Vol 28 (6) ◽  
pp. 873-886 ◽  
Author(s):  
Gayatri K. Rane ◽  
Daniel Apel ◽  
Udo Welzel ◽  
Eric Jan Mittemeijer

Abstract

2020 ◽  
Vol 35 (12) ◽  
pp. 1556-1571
Author(s):  
Lavanya Raman ◽  
G. Karthick ◽  
K. Guruvidyathri ◽  
Daniel Fabijanic ◽  
S. V. S. Narayana Murty ◽  
...  

Abstract


1999 ◽  
Vol 14 (5) ◽  
pp. 1760-1770 ◽  
Author(s):  
H. G. Jiang ◽  
H. M. Hu ◽  
E. J. Lavernia

The synthesis of nanocrystalline Fe, Fe–4 wt% Al, and Fe–10 wt% Al solid solutions by SPEX ball milling has been studied. The microstructural evolution during ball milling, as well as subsequent heat treatment, has been characterized. The results demonstrate that ball milling promotes the formation of αFe–4 wt% Al and αFe–10 wt% Al solid solutions by reducing the activation energy of these alloys and generating thermal energy during this process. For Fe–10 wt% Al powders milled for various time intervals up to approximately 20 min, the FeAl intermetallic compound is formed. For alloys annealed at temperatures ranging from 600 to 1000 °C, the addition of 10 wt% Al to Fe significantly enhances the thermal stability of the nanocrystalline Fe–Al alloys. Interestingly, the addition of Al within the range of 4–10 wt% seems to have little effect on the thermal stability of these alloys annealed under the same conditions. Also, the thermal stability improves for alloys milled in air as opposed to those processed using Ar.


2014 ◽  
Vol 29 (8) ◽  
pp. 996-1005 ◽  
Author(s):  
Dengshan Zhou ◽  
Deliang Zhang ◽  
Charlie Kong ◽  
Paul Munroe ◽  
Rob Torrens

Abstract


1992 ◽  
Vol 280 ◽  
Author(s):  
Y. W. Kim ◽  
I. K. Kim ◽  
N. I. Lee ◽  
J. W. Ko ◽  
S. T. Ahn ◽  
...  

ABSTRACTThe effect of the crystallographic orientation of underlying poly-Si film on the thermal stability of the TiSi2 film was studied. Different preferred orientations of the poly-Si film were obtained by annealing poly-Si or amorphous Si films at various temperatures. The TiSi2 film was formed by the solid-state reaction of the Ti film sputtered on the poly-Si film. The thermal stability of the TiSi2 film was evaluated by changes in the sheet resistance and microstructural evolution during furnace anneals. The TiSi2 film on poly-Si with the <110> preferred orientation shows more stable conductivity during high temperature anneals than with the <111> orientation. The surface energy of underlying poly-Si is expected to influence the thermal stability of the TiSi2/poly-Si structure significantly. Better thermal stability of the TiSi2 film can be obtained by the higher surface energy of underlying poly-Si.


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