Achieve p-type conduction in N-doped and (Al,N)-codoped ZnO thin films by oxidative annealing zinc nitride precursors

2007 ◽  
Vol 22 (10) ◽  
pp. 2668-2675 ◽  
Author(s):  
Z.W. Liu ◽  
S.W. Yeo ◽  
C.K. Ong
Keyword(s):  
Hole Concentration ◽  
Film Structure ◽  
Zno Films ◽  
Zno Film ◽  
Annealing Conditions ◽  
Zinc Nitride ◽  
Alternative Approach ◽  
Oxidative Annealing ◽  
P Type ◽  
Type Conduction

N-doped and (Al,N)-codoped ZnO films were synthesized by oxidative annealing of (Zn + Zn3N2) films, which were fabricated by reactive magnetron sputtering. Both n- and p-type conductions were obtained in these ZnO:N and ZnO:AlN films. Optimal oxidation treatments for achieving p-type ZnO are annealing at 400–600 °C for 10–60 min, depending on the film thickness and morphology. The electric properties were found to be very sensitive to the annealing conditions and film structure. As-deposited (Zn + Zn3N2) films with and without Al addition had carrier concentrations of 1021–1022 cm−3. After conversion to ZnO, the n-type films had a carrier concentrations up to 1019 cm−3, whereas the p-type ZnO:N films had hole concentrations of 1014–1016 cm−3. (Al,N)-codoping increased the hole concentration of p-type film to 1018 cm−3 despite a decrease in Hall mobility. The photoluminescence properties of the p-type ZnO films were also investigated. The synthesis of p-type ZnO:AlN by oxidative annealing is believed to provide an alternative approach to realize p-type conduction in codoped ZnO film by using N2 as the N source.

Obtainable P-Type ZnO Film Doped with Li by Sol-Gel Method

2015 ◽  
Vol 734 ◽  
pp. 796-801 ◽  
Author(s):  
Ting Ting Wang ◽  
Miao Miao Dai ◽  
Ya Jun Yan ◽  
Hong Zhang ◽  
Yi Min Yu
Keyword(s):  
Hole Concentration ◽  
Sol Gel ◽  
Green Emission ◽  
Hall Effect Measurement ◽  
Zno Films ◽  
Zno Film ◽  
Oriented Growth ◽  
Coating Method ◽  
Thermal Annealing Process ◽  
P Type

A series of Li-doped zinc oxide ( ZnO ) thin films were deposited on quartz glass by sol-gel and spin coating method. Their p-type conductivities could be achieved by subsequently thermal annealing process, which were characterized by Hall effect measurement. An optimized result with resistivity of 46.8 Ω cm, Hall mobility of 1.35 cm2/V s, and hole concentration of 9.89×1016 cm-3 was achieved at the annealing temperature of 700 °C. The films exhibited highly (002) oriented growth in all the cases. Strong green emission centered at 510 nm was observed by photoluminescence spectra in Li-doped ZnO films at room temperature.

Fabrication and Study of P-Type ZnO Films by RF Magnetron Sputtering of ZnO: In2O3 Powder Together with the N-Implantation

2012 ◽  
Vol 503-504 ◽  
pp. 350-353
Author(s):  
Mao Nan ◽  
Chun Yang Kong ◽  
Guo Ping Qin ◽  
Hai Bo Ruan
Keyword(s):  
Magnetron Sputtering ◽  
Hole Concentration ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
Electrical Characteristics ◽  
Radio Frequency Magnetron Sputtering ◽  
Glass Substrates ◽  
Powder Target ◽  
Post Annealing ◽  
P Type

The N-In codoped p-type ZnO films with preferential orientation along (002) plane have been fabricated on quartz glass substrates using radio frequency magnetron sputtering technique of ZnO:In2O3 powder target combining with N-implantation. The samples annealed at 700°C deserved the optimal properties, the best of which exhibits electrical characteristics with the hole concentration of 4.04×1018 cm-3, the lowest resistivity of 1.15 Ωcm and Hall mobility of about 1.35 cm2V-1s-1. The effects of post-annealing on the microstructure and electronic properties of the codoped ZnO films is analyzed via SEM, XRD, XPS and Hall measurements system, and the trend of carrier concentration with annealing time is discussed theoretically.

Phosphorus-Doped p-Type ZnS Nanowires and their Photodetecting Applications Based on Device Construction

2016 ◽  
Vol 42 ◽  
pp. 65-72 ◽  
Author(s):  
Xi Wei Zhang ◽  
Dan Hu ◽  
Dan Meng ◽  
Zhen Jie Tang ◽  
Zhi Wang
Keyword(s):  
High Performance ◽  
Uv Light ◽  
Hole Concentration ◽  
Chemical Deposition ◽  
Core Shell ◽  
Light Illumination ◽  
Chemical Deposition Method ◽  
P Type ◽  
Phosphorus Doped ◽  
Type Conduction

Phosphorus-doped p-type ZnS NWs were synthesized by chemical deposition method. The as-synthesized NWs shows obvious p-type conduction with a hole concentration of 8.35 × 1017 cm-3. ZnS-Si core-shell nanoheterojunction was fabricated by depositing Si thin film on the surface of ZnS NWs through a sputtering method. The core-shell nanostructure exhibited excellent photoresponse to white light and UV light. Under UV light illumination, a high performance with a responsibility of ~ 0.14 × 103 AW-1, a gain of ~ 0.69 × 103 and a detectivity of ~ 1.2 × 1010 cmHz1/2W-1 were obtained based on the ZnS-Si core-shell nanoheterojunction. This new nanostructure is expected to play an important role in the next-generation optoelectronic devices.

Zinc Oxide Thin Films with Reduced Native Compensative Defects Grown by Ultrasonic Spray Pyrolysis at Atmosphere

2007 ◽  
Vol 336-338 ◽  
pp. 589-592
Author(s):  
Jian Ling Zhao ◽  
Xiao Min Li ◽  
Ji Ming Bian ◽  
Wei Dong Yu ◽  
C.Y. Zhang
Keyword(s):  
Spray Pyrolysis ◽  
Deep Level ◽  
Hole Concentration ◽  
Ultrasonic Spray Pyrolysis ◽  
Zno Films ◽  
Near Band Edge ◽  
Dense Microstructure ◽  
Ultrasonic Spray ◽  
High Hole Concentration ◽  
P Type

ZnO films were deposited on Si (100) substrate by ultrasonic spray pyrolysis at atmosphere. The film grown at optimum conditions is well crystallized with uniform, smooth and dense microstructure. Photoluminescence measurement shows a strong near band edge UV emission at 379nm and an almost undetectable deep-level emission band centered at 502nm. The resistivity of ZnO film is reduced by an order after N-In codoping, which produces p-type conduction with high hole concentration and hall mobility.

High quality p-type ZnO film grown on ZnO substrate by nitrogen and tellurium co-doping

2009 ◽  
Vol 1201 ◽  
Author(s):  
Seunghwan Park ◽  
Tsutomu Minegishi ◽  
jinsub Park ◽  
Hyunjae Lee ◽  
Toshinori Taishi ◽  
...  
Keyword(s):  
Electron Concentration ◽  
Hole Concentration ◽  
Nitrogen Concentration ◽  
Zno Film ◽  
Acceptor Pair ◽  
High Quality ◽  
Co Doping ◽  
Donor Acceptor ◽  
Doped Zno ◽  
P Type

AbstractNitrogen and tellurium co-doped ZnO (ZnO:[N+Te]) films have been grown on (0001) ZnO substrate by plasma-assisted molecular beam epitaxy. The electron concentration of tellurium doped ZnO (ZnO:Te) gradually increases, compared that of undoped ZnO (u-ZnO). On the other hand, conductivity of ZnO:[N+Te] changes from n-type to p-type characteristic with a hole concentration of 4×1016 cm-3. However, nitrogen doped ZnO film (ZnO:N) still remain as n-type conductivity with a electron concentration of 2.5×1017 cm-3. Secondary ion mass spectroscopy reveals that nitrogen concentration ([N]) of ZnO:[N+Te] film (2×1021 cm-3) is relatively higher than that of ZnO:N film (3×1020 cm-3). 10 K photoluminescence spectra shows that considerable improvement of emission properties of ZnO:[N+Te] with an emergence of narrow acceptor bound exciton (A°X, 3.359 eV) and donor-acceptor pair (DAP, 3.217 eV), compared with those of u-ZnO. Consequently, high quality p-type ZnO with high N concentration is realized by using Te and N co-doping technique due to reduction of Madelung energy.

p-type in ZnO:N by codoping with Cr

2003 ◽  
Vol 786 ◽  
Author(s):  
E. Kaminska ◽  
A. Piotrowska ◽  
J. Kossut ◽  
R. Butkute ◽  
W. Dobrowolski ◽  
...  
Keyword(s):  
Time Scale ◽  
Room Temperature ◽  
Surface Passivation ◽  
Hole Concentration ◽  
Rf Sputtering ◽  
Zno Films ◽  
Type Conductivity ◽  
Chromium Doping ◽  
P Type ◽  
Over Time

ABSTRACTWe report on the fabrication of p-ZnO films by thermal oxidation of Zn3N2 deposited by reactive rf sputtering. With additional chromium doping we achieved p-type conductivity with the hole concentration ∼5×1017cm−3 and the mobility of 23.6 cm2/Vs at room temperature. We developed a method of surface passivation of p-ZnO that maintains its p-type conductivity over time-scale of months.

Effects of magnesium on phosphorus chemical states and p-type conduction behavior of phosphorus-doped ZnO films

2013 ◽  
Vol 138 (3) ◽  
pp. 034704 ◽  
Author(s):  
Jichao Li ◽  
Yongfeng Li ◽  
Bin Yao ◽  
Ying Xu ◽  
Shiwang Long ◽  
...  
Keyword(s):  
Zno Films ◽  
Conduction Behavior ◽  
Chemical States ◽  
Doped Zno ◽  
P Type ◽  
Phosphorus Doped ◽  
Type Conduction

Influence of Ag–S codoping on silver chemical states and stable p-type conduction behavior of the ZnO films

2014 ◽  
Vol 40 (1) ◽  
pp. 2161-2167 ◽  
Author(s):  
Y. Xu ◽  
T. Yang ◽  
B. Yao ◽  
Y.F. Li ◽  
Z.H. Ding ◽  
...  
Keyword(s):  
Zno Films ◽  
Conduction Behavior ◽  
Chemical States ◽  
P Type ◽  
Type Conduction

CHARACTERIZATION OF n AND p TYPE ZNO THIN FILMS DEPOSITED BY CATHODIC PULSED FILTERED VACUUM ARC SYSTEM

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1719-1724
Author(s):  
H. KAVAK ◽  
N. H. ERDOGAN ◽  
K. KARA ◽  
H. YANIS ◽  
Z. BAZ ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Wavelength Region ◽  
Zno Thin Films ◽  
Vacuum Arc ◽  
Zno Films ◽  
Zno Thin Film ◽  
Xrd Pattern ◽  
Zinc Nitride ◽  
P Type

The transparent, conductive n and p -type semiconducting ZnO thin films were prepared by pulsed filtered cathodic vacuum arc deposition (PFCVAD) method. The structural, optical and electrical properties of n and p -type ZnO thin films are investigated after annealing at 450°C. 197 nm thick n -type ZnO thin film was deposited with oxygen pressure of 8.5 × 10-4 Torr . XRD pattern of annealed ZnO thin film exhibits hexagonal structure with (100), (101) and (110) orientations. The crystallite size of semiconductor ZnO thin film is 18 nm, interplanar distance 0.16 nm and lattice constant c is 0.52 nm for (110) orientation. The optical transmittance spectra of n and p -type ZnO films are over 90% in the visible wavelength region with optical energy gap 3.3 eV. p -type ZnO thin films are produced by oxidation of PFCVAD deposited zinc nitride. Zinc nitride is deposited with nitrogen pressure of 8.6 × 10-4 Torr and the thickness of this film is 179 nm. The oxidation of zinc nitride thin films at 450°C results in hexagonal structures p -type ZnO thin films. XRD pattern of this film has the same (100), (101) and (110) orientations with the same crystalline structures as the directly deposited ZnO thin film. Hall measurements indicated that ZnO films were p -type and the highest carrier concentration of 1.08 × 1018 cm -3 and mobility of 93.53 cm2/Vs were obtained.

Fabrication and Characterization of Transparent P-Type ZnO Films Obtained by In Situ Oxidation of Sputtering Zn3N2 :Al

2011 ◽  
Vol 194-196 ◽  
pp. 2435-2439
Author(s):  
Jun Zhang ◽  
Le Xi Shao ◽  
Wei Xie ◽  
Chang Wei Zou
Keyword(s):  
Hall Effect ◽  
Hole Concentration ◽  
Visible Region ◽  
Optical Transmittance ◽  
Zno Films ◽  
Low Resistivity ◽  
Hall Effect Measurements ◽  
Quartz Glasses ◽  
P Type

Nitrogen and Aluminum co-doped ZnO thin films were prepared by In Situ thermal oxidation of RF magnetron sputtered Zn3N2:Al films on quartz glasses. The structural, optical and electrical properties of the samples were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), optical transmittance, photoluminescence (PL) and Hall effect measurements. XRD analyses revealed that Zn3N2:Al films entirely transformed into ZnO films after annealing in oxygen at 500 °C for one hour. Hall effect measurements confirmed p-type conduction in ZnO films with a low resistivity of 34.8Ω cm, a high hole concentration of 3.26×1017 cm-3 and a Hall mobility of 2.3 cm2/Vs. Optical transmission spectra shows that the films are highly transparent in the visible region . Our results demonstrate a promising approach to fabricate low resistivity p-type ZnO.

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