Reliability analysis of Au–Sn flip-chip solder bump fabricated by co-electroplating

2007 ◽  
Vol 22 (5) ◽  
pp. 1219-1229 ◽  
Author(s):  
Jeong-Won Yoon ◽  
Hyun-Suk Chun ◽  
Seung-Boo Jung
Keyword(s):  
Brittle Failure ◽  
Flip Chip ◽  
Solder Bump ◽  
Solder Matrix ◽  
Average Diameter ◽  
Under Bump Metallization ◽  
Mechanical Reliability ◽  
Shear Tests ◽  
Solder Bumps ◽  
Δ Phase

In this study, we fabricated eutectic Au–Sn (Au–20 wt% Sn) flip-chip solder bumps from a single electroplating bath. After reflowing, the average diameter of the solder bump was approximately 80 μm. The (Ni,Au)3Sn2 phase was initially formed when the liquid Au–Sn solder reacted with the Ni UBM (under bump metallization). After aging at 150 °C, the (Ni,Au)3Sn2 intermetallic compound (IMC), which formed at the interface during reflow, was fully transformed into the (Au,Ni)Sn IMC due to the restricted supply of Ni atoms from the UBM to the interface. On the other hand, after aging at 250 °C for 1000 h, two IMC layers, (Au,Ni)Sn and (Ni,Au)3Sn2, were formed at the interface. The lower (Ni,Au)3Sn2 phase was formed when the (Au,Ni)Sn phase reacted with the Ni UBM. The interfacial (Au,Ni)Sn IMC grew with the preferential consumption of the available δ-phase in the solder matrix. Eventually, the ζ-phase covered most of the interfacial layer. In the bump shear tests, the Au–Sn/Ni joint aged at 150 °C fractured through the bulk of the solder, confirming the mechanical reliability of the interface. In contrast, the Au–Sn/Ni joint aged at 250 °C fractured along the interface, thereby demonstrating brittle failure, possibly a result of the brittle IMC layer at the interface.

The Use of Precision Selective Area Milling for Failure Analysis of Flip-Chip Packages

2002 ◽  
Author(s):  
George F. Gaut
Keyword(s):  
Failure Analysis ◽  
Flip Chip ◽  
Solder Bump ◽  
Selective Area ◽  
Fill Material ◽  
Solder Bumps ◽  
Time Required

Abstract Access to the solder bump and under-fill material of flip-chip devices has presented a new problem for failure analysts. The under-fill and solder bumps have also added a new source for failure causes. A new tool has become available that can reduce the time required to analyze this area of a flip-chip package. By using precision selective area milling it is possible to remove material (die or PCB) that will allow other tools to expose the source of the failure.

Defect Detection of Flip Chip Solder Bumps Through Local Temporal Coherence Analysis of Laser Ultrasound Signals

2007 ◽  
Author(s):  
Jin Yang ◽  
Charles Ume
Keyword(s):  
Defect Detection ◽  
Flip Chip ◽  
Solder Bump ◽  
Temporal Coherence ◽  
Coherence Analysis ◽  
Laser Ultrasound ◽  
Surface Mount ◽  
Flip Chips ◽  
Solder Bumps ◽  
Ultrasound Signals

Microelectronics packaging technology has evolved from through-hole and bulk configuration to surface-mount and small-profile ones. In surface mount packaging, such as flip chips, chip scale packages (CSP), and ball grid arrays (BGA), chips/packages are attached to the substrates or printed wiring boards (PWB) using solder bump interconnections. Solder bumps, which are hidden between the device and the substrate/board, are no longer visible for inspection. A novel solder bump inspection system has been developed using laser ultrasound and interferometric techniques. This system has been successfully applied to detect solder bump defects including missing, misaligned, open, and cracked solder bumps in flip chips, and chip scale packages. This system uses a pulsed Nd:YAG laser to induce ultrasound in the thermoelastic regime and the transient out-of-plane displacement response on the device surface is measured using the interferometric technique. In this paper, local temporal coherence (LTC) analysis of laser ultrasound signals is presented and compared to previous signal processing methods, including Error Ratio and Correlation Coefficient. The results show that local temporal coherence analysis increases measurement sensitivity for inspecting solder bumps in packaged electronic devices. Laser ultrasound inspection results are also compared with X-ray and C-mode Scanning Acoustic Microscopy (CSAM) results. In particular, this paper discusses defect detection for a 6.35mm×6.35mm×0.6mm PB18 flip chip and a flip chip (SiMAF) with 24 lead-free solder bumps. These two flip chip specimens are both non-underfilled.

Electromigration Performance of Flip-Chips with Lead-Free Solder Bumps between 30 μm and 60 μm Diameter

2012 ◽  
Vol 2012 (1) ◽  
pp. 000891-000905 ◽  
Author(s):  
Rainer Dohle ◽  
Stefan Härter ◽  
Andreas Wirth ◽  
Jörg Goßler ◽  
Marek Gorywoda ◽  
...  
Keyword(s):  
Flip Chip ◽  
Failure Modes ◽  
Solder Bump ◽  
Void Formation ◽  
Lead Free ◽  
Large Temperature ◽  
Flip Chips ◽  
Solder Bumps ◽  
Current Densities

As the solder bump sizes continuously decrease with scaling of the geometries, current densities within individual solder bumps will increase along with higher operation temperatures of the dies. Since electromigration of flip-chip interconnects is highly affected by these factors and therefore an increasing reliability concern, long-term characterization of new interconnect developments needs to be done regarding the electromigration performance using accelerated life tests. Furthermore, a large temperature gradient exists across the solder interconnects, leading to thermomigration. In this study, a comprehensive overlook of the long-term reliability and analysis of the achieved electromigration performance of flip-chip test specimen will be given, supplemented by an in-depth material science analysis. In addition, the challenges to a better understanding of electromigration and thermomigration in ultra fine-pitch flip-chip solder joints are discussed. For all experiments, specially designed flip-chips with a pitch of 100 μm and solder bump diameters of 30–60 μm have been used [1]. Solder spheres can be made of every lead-free alloy (in our case SAC305) and are placed on a UBM which has been realized for our test chips in an electroless nickel process [2]. For the electromigration tests within this study, multiple combinations of individual current densities and temperatures were adapted to the respective solder sphere diameters. Online measurements over a time period up to 10,000 hours with separate daisy chain connections of each test coupon provide exact lifetime data during the electromigration tests. As failure modes have been identified: UBM consumption at the chip side or depletion of the Nickel layer at the substrate side, interfacial void formation at the cathode contact interface, and - to a much lesser degree - Kirkendall-like void formation at the anode side. A comparison between calculated life time data using Weibull distribution and lognormal distribution will be given.

The Effect of Intermetallic Growth on Bump Pull Test Responses of SAC105 Solder Bumps

2009 ◽  
Vol 131 (4) ◽  
Author(s):  
Jose Omar S. Amistoso ◽  
Alberto V. Amorsolo
Keyword(s):  
Failure Modes ◽  
Solder Bump ◽  
Diffusion Processes ◽  
Under Bump Metallization ◽  
Wafer Level ◽  
Intermetallic Growth ◽  
Solder Bumps ◽  
Sac105 Solder ◽  
Solder Bulk ◽  
Pull Tests

Cold bump pull tests performed on wafer level chip scale packages using SAC105 solder bumps show an increase in the occurrence of brittle failure modes with aging temperature and time. Fast intermetallic growth at 0–1000 h can be attributed to (Cu,Ni)6Sn5, while the decrease in intermetallic growth rate at t>1000 h can be attributed to diffusion processes leading to (Cu,Ni)6Sn5 and (Ni,Cu)3Sn4 formation and growth. Ni diffuses toward the solder bulk and saturates at 175–200°C, while Cu diffuses from the under bump metallization (UBM) toward the solder bump at 125–150°C. Interactions between Cu and Ni atoms lead to saturation of their atomic % gradients due to intermetallic formation. Sn diffusion from the solder toward the UBM occurs at 125–150°C. The activation energy for total intermetallic growth was calculated at 0.2 eV.

A Theoretical Analysis of the Concept of Critical Clearance Toward a Design Methodology for the Flip-Chip Package

2007 ◽  
Vol 129 (4) ◽  
pp. 473-478 ◽  
Author(s):  
J. W. Wan ◽  
W. J. Zhang ◽  
D. J. Bergstrom
Keyword(s):  
Flip Chip ◽  
Solder Bump ◽  
Flow Characteristics ◽  
Quantitative Relation ◽  
Package Design ◽  
Solder Bumps ◽  
Filling Time ◽  
Encapsulation Process ◽  
Advanced Packaging ◽  
Gap Height

In this article, we present a theoretical study on the concept known as critical clearance for flip-chip packages. The critical clearance phenomenon was first observed in an experiment reported by Gordon et al. (1999, “A Capillary-Driven Underfill Encapsulation Process,” Advanced Packaging, 8(4), pp. 34–37). When the clearance is below a critical value, filling time begins to increase dramatically, and when the clearance is above this value, the influence of clearance on filling time is insignificant. Therefore, the optimal solder bump density in a flip-chip package should be one with a clearance larger than the critical clearance. The contribution of our study is the development of a quantitative relation among package design features, flow characteristics, and critical clearance based on an analytical model we developed and reported elsewhere. This relation is further used to determine critical clearance given a type of underfill material (specifically the index n of the power-law constitutive equation), the solder bump pitch, and the gap height; further the flip-chip package design can be optimized to make the actual clearance between solder bumps greater than its corresponding critical clearance.

The size effect on intermetallic microstructure evolution of critical solder joints for flip chip assemblies

2015 ◽  
Vol 27 (4) ◽  
pp. 178-184 ◽  
Author(s):  
Ye Tian ◽  
Justin Chow ◽  
Xi Liu ◽  
Suresh K. Sitaraman
Keyword(s):  
Solder Joint ◽  
Design Methodology ◽  
Growth Process ◽  
Flip Chip ◽  
Solder Bump ◽  
Solder Joints ◽  
Solder Matrix ◽  
Industrial Practice ◽  
Content Type ◽  
Flip Chips

Purpose – The purpose of this paper is to study the intermetallic compound (IMC) thickness, composition and morphology in 100-μm pitch and 200-μm pitch Sn–Ag–Cu (SAC305) flip-chip assemblies after bump reflow and assembly reflow. In particular, emphasis is placed on the effect of solder joint size on the interfacial IMCs between metal pads and solder matrix. Design/methodology/approach – This work uses 100-μm pitch and 200-μm pitch silicon flip chips with nickel (Ni) pads and stand-off height of approximately 45 and 90 μm, respectively, assembled on substrates with copper (Cu) pads. The IMCs evolution in solder joints was investigated during reflow by using 100- and 200-μm pitch flip-chip assemblies. Findings – After bump reflow, the joints size controls the IMC composition and dominant IMC type as well as IMC thickness and also influences the dominant IMC morphology. After assembly reflow, the cross-reaction of the pad metallurgies promotes the dominant IMC transformation and shape coarsened on the Ni pad interface for smaller joints and promotes a great number of new dominate IMC growth on the Ni pad interface in larger joints. On the Cu pad interface, many small voids formed in the IMC in larger joints, but were not observed in smaller joints, combined with the drawing of the IMC growth process. Originality/value – With continued advances in microelectronics, it is anticipated that next-generation microelectronic assemblies will require a reduction of the flip-chip solder bump pitch to 100 μm or less from the current industrial practice of 130 to150 μm. This work shows that as the packaging size reduced with the solder joint interconnection, the solder size becomes an important factor in the intermetallic composition as well as morphology and thickness after reflow.

A cost effective PoP structure with high I/O density

2014 ◽  
Vol 2014 (DPC) ◽  
pp. 000768-000785
Author(s):  
Hongjie Wang ◽  
Weidong Huang ◽  
Fei Geng ◽  
Yuan Lu ◽  
Bo Zhang ◽  
...  
Keyword(s):  
Solder Ball ◽  
Flip Chip ◽  
Solder Bump ◽  
Cost Effective ◽  
Wire Bonding ◽  
Manufacturing Cost ◽  
Good Reliability ◽  
Solder Bumps ◽  
Package Size ◽  
Interconnection Structure

Package-on-package (PoP) structure is widely used in smart phones and tablets in which memory package is directly attached to the top of the application processor. As the market demands more speed and bandwidth, memory devices need more than 1000 I/Os to support future requirements. However← since the package size also becomes smaller and smaller, finer I/O pitch is absolutely required. Although using some new technology can achieve finer I/O pitch, it increases the manufacturing cost. Using traditional mature technology can reduce manufacturing cost, but has limitation in finer I/O pitch. So, it demands a reasonable balance between design, process and cost to develop an applicable PoP structure. In this paper we proposed a novel and cost effective PoP interconnection structure and a multi-layer PoP model. The PoP interconnection was formed by the solder ball on the top package connected to the solder bumps on the bottom package. The solder bump was made of a smaller solder ball attached on a Cu stud bump on the top of bottom substrate. The Cu stud bump was made through wire bonding machines and was coined so that the small solder ball can be attached to it. Using film assist molding technology, a half of the solder ball is exposed outside of molding compound, which can be connected with the solder ball of the top package through reflow process. This PoP interconnection structure was named solder bump through molding (BTM). A three layer PoP vehicle package was designed in our experiments. The top package was a wire bonding BGA, the middle and bottom packages were both flip chip BGA with BTM interconnection structure. The package size of these three packages was 10×10mm2 and ball pitch was 0.4mm. The assembly process of top package was as normal as other wire bonding BGA. The assembly processes of middle and bottom packages were as follows: The Cu stud bumps were first bonded to the top surface of the substrate using wire bonding machines. Small solder balls were attached to the top of Cu stud bumps using stencil tool and then reflowed. After solder bumps were made, all chips were flip bonded to the substrates. Then, using film assist molding and MUF technology, the chips were encapsulated and Cu stud bumps were half exposed. After all the packages were ready, the package stacking and reflow was performed one by one from top to the bottom and the overall three layer PoP was formed. C-scan test and cross section analysis showed that the encapsulation had no voids in most samples. Electrical test results showed the interconnection was good. Reliability study will be also discussed in this paper, which is still in research now. In BTM structure, both Cu stud and solder ball attach can be easily realized. The ball pitch can be 0.4mm or smaller and the process is also applicable for more layer PoP. Thus, BTM PoP structure provides a good solution considering the balance among cost, performance and manufacturing for 3D package. Acknowledgments The authors acknowledge the support of National Science and Technology Major Project (Project number：2013ZX02501003).

Accelerated Life Tests of Flip-Chips With Solder Bumps Down to 30 μm Diameter

2011 ◽  
Vol 2011 (1) ◽  
pp. 000985-000996 ◽  
Author(s):  
Rainer Dohle ◽  
Stefan Härter ◽  
Jörg Goßler ◽  
Jörg Franke
Keyword(s):  
Thermal Diffusion ◽  
Flip Chip ◽  
Solder Bump ◽  
Temperature Cycling ◽  
Sphere Diameter ◽  
Accelerated Life Tests ◽  
Flip Chips ◽  
Accelerated Life ◽  
Solder Bumps ◽  
Life Tests

In this study, accelerated life tests with ultra fine-pitch flip-chips with solder bumps down to 30 microns diameter have been performed. Tests commonly used like temperature cycling, high temperature storage, and humidity bias tests are not sufficient for such small packaging feature sizes any more. As solder bump sizes continue to decrease, along with the shrinkage of the solder pads and the scaling of line/space geometries, thermal diffusion has even more impact on reliability and lifetime of the solder connections, and current densities within single solder bumps increase. Therefore, electromigration of flip-chip interconnects is a significant reliability concern, especially when it comes to further miniaturization for high reliability applications. Since electromigration is a function of interconnect sizes and metallurgies, new interconnect developments need to be characterized for electromigration reliability. Flip-chips 10 mm × 10 mm × 0.8 mm in size with a die layout providing a pitch of 100 μm for solder bump sizes of 60 μm, 50 μm, 40 μm, or 30 μm diameter, respectively, have been used [1]. The SnAgCu alloy solder spheres were placed on a NiAu UBM realized in an electroless nickel process [2]. A daisy chain connection is integrated for each of the solder sphere sizes and each chip can separately be connected for online measurements during electromigration or reliability testing. A variety of current density and temperature combinations which is individually adapted to the respective solder sphere diameter has been used. Lifetime data were collected using online measurement through the daisy chains. Cross sectioning has been employed to analyze the influence of thermal diffusion as well as electromigration on the failure mechanism of the highly miniaturized solder joints. A prediction model for flip-chip interconnects with solder spheres down to 30 μm diameter will be outlined using Black’s equation.

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