Determination of the anisotropic optical properties for perfluorinated vanadyl phthalocyanine thin films

2004 ◽  
Vol 19 (7) ◽  
pp. 2008-2013 ◽  
Author(s):  
O.D. Gordan ◽  
M. Friedrich ◽  
W. Michaelis ◽  
R. Kröger ◽  
T. Kampen ◽  
...  
Keyword(s):  
Thin Films ◽  
Physical Vapor Deposition ◽  
Optical Constants ◽  
High Vacuum ◽  
Visible Region ◽  
Fused Silica ◽  
Out Of Plane ◽  
The Difference ◽  
Silica Substrates

Thin films of perfluorinated vanadyl phthalocyanine F16PcVO were prepared by physical vapor deposition in high vacuum on KBr and fused silica substrates. The absorption spectra in the visible region show that the films on different substrates have different structure. The optical constants for F16PcVO films were obtained in the spectral range of 0.7–4.5 eV from the simulation of ellipsometry spectra with an anisotropic uniaxial model. From the difference between the in-plane and out-of-plane components of the extinction coefficient the average tilt angle of the F16PcVO molecular planes with respect to the substrate plane was found to be 56° for fused silica substrates and between 0° and 3° for KBr substrates.

scholarly journals Texture Control in Thin Films Using Ion Bombardment

2000 ◽  
Vol 34 (2-3) ◽  
pp. 105-118
Author(s):  
G. S. Was ◽  
H. Ji ◽  
Z. Ma
Keyword(s):  
Thin Films ◽  
Physical Vapor Deposition ◽  
Ion Bombardment ◽  
Preferential Growth ◽  
Aluminum Films ◽  
Ion Channeling ◽  
Preferential Sputtering ◽  
Thin Aluminum ◽  
Out Of Plane ◽  
The Difference

The development of texture in thin films under ion bombardment is believed to occur due to the preferential growth of the aligned grains in the film relative to the unaligned grains. The difference in growth rates between aligned and unaligned grains results in the development of texture with increasing thickness. Both out-of-plane (fiber) and in-plane texture can be controlled during ion bombardment. Experiments were performed to create a (110) out-of-plane texture in thin aluminum films and to create a (110) in-plane texture in niobium films. Results showed that the texture in both cases increases in strength with depth, and that for 500 nm Al films, the (110) texture was stronger than the thermodynamically-preferred (111) texture obtained by physical vapor deposition. Results confirm a texturing mechanism based on ion channeling and preferential sputtering.

Determination of the Optical Constants of Thin Films Using Photoacoustic Spectroscopy

1981 ◽  
Vol 20 (9) ◽  
pp. L665-L668 ◽  
Author(s):  
Satoshi Yamasaki ◽  
Hideyo Okushi ◽  
Akihisa Matsuda ◽  
Hidetoshi Oheda ◽  
Nobuhiro Hata ◽  
...  
Keyword(s):  
Thin Films ◽  
Photoacoustic Spectroscopy ◽  
Optical Constants

scholarly journals STUDY OF FILMS OF TRANSITION METALS AS MATERIALS FOR LASER NANOSTRUCTURING

2021 ◽  
Vol 8 ◽  
pp. 241-247
Author(s):  
Roman I. Kuts ◽  
Victor P. Korolkov ◽  
Vladimir N. Khomutov ◽  
Anatoly I. Malyshev ◽  
Sergey L. Mikerin
Keyword(s):  
Thin Films ◽  
Transition Metals ◽  
Fused Silica ◽  
Point Of View ◽  
Direct Laser Writing ◽  
Periodic Nanostructures ◽  
Laser Writing ◽  
Oxide Nanostructures ◽  
Direct Laser ◽  
Silica Substrates

This paper presents the results of a study of direct laser writing on thin films of transition metals (Hf, Ti, Zr, Ta, V). The films were deposited on fused silica substrates. A comparison of laser writing on the indicated films is carried out from the point of view of the presence of contour writing. As it was proved earlier, when writing on zirconium films, contour writing leads to formation of periodic nanostructures with a period equal to the writing step (250-500 nm). Materials were identified that are promising from the point of view of writing oxide nanostructures for the further formation of the diffraction phase microrelief of DOEs.

Accurate Determination of Optical Constants of Amorphous Absorbing Thin Films by Spectroscopic Ellipsometry

2015 ◽  
Vol 35 (4) ◽  
pp. 0431001 ◽  
Author(s):  
李江 Li Jiang ◽  
李沛 Li Pei ◽  
黄峰 Huang Feng ◽  
魏贤华 Wei Xianhua ◽  
葛芳芳 Ge Fangfang ◽  
...  
Keyword(s):  
Thin Films ◽  
Spectroscopic Ellipsometry ◽  
Optical Constants ◽  
Accurate Determination

scholarly journals Experimental Determination of Complex Optical Constants of Air‐Stable Inorganic CsPbI 3 Perovskite Thin Films

2020 ◽  
Vol 14 (6) ◽  
pp. 2000070 ◽  
Author(s):  
Wensheng Yan ◽  
Yi Guo ◽  
Deski Beri ◽  
Stephan Dottermusch ◽  
Haining Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Experimental Determination ◽  
Optical Constants

Determination of optical constants of thin films and multilayer stacks by use of concurrent reflectance, transmittance, and ellipsometric measurements

2001 ◽  
Vol 40 (28) ◽  
pp. 5088 ◽  
Author(s):  
Chubing Peng ◽  
Rongguang Liang ◽  
J. Kevin Erwin ◽  
Warren Bletscher ◽  
Kenichi Nagata ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Constants ◽  
Multilayer Stacks

Determination of the optical constants and thickness of amorphous V2O5 thin films

1983 ◽  
Vol 102 (1) ◽  
pp. 71-76 ◽  
Author(s):  
L. Michailovits ◽  
I. Hevesi ◽  
Liem Phan ◽  
ZS. Varga
Keyword(s):  
Thin Films ◽  
Optical Constants ◽  
V2o5 Thin Films

Contamination of TiO2 thin films spin coated on rutile and fused silica substrates

2018 ◽  
Vol 354 ◽  
pp. 369-382 ◽  
Author(s):  
I.I. Kabir ◽  
L.R. Sheppard ◽  
R. Liu ◽  
Y. Yao ◽  
Q. Zhu ◽  
...  
Keyword(s):  
Thin Films ◽  
Fused Silica ◽  
Tio2 Thin Films ◽  
Silica Substrates
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