Texture in Ti/Al and Nb/Al multilayer thin films: Role of Cu

2001 ◽  
Vol 16 (5) ◽  
pp. 1449-1459 ◽  
Author(s):  
G. Lucadamo ◽  
K. Barmak ◽  
K. P. Rodbell
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Fiber Texture ◽  
Fiber Axis ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
X Ray ◽  
Transmission Electron ◽  
Pole Figures

Fiber texture in Ti/Al and Nb/Al polycrystalline multilayer thin films, with bilayer thicknesses (Λ) ranging from 20–333 nm and having a fixed stoichiometry of 1/3, has been investigated by using x-ray pole figures and transmission electron microscopy. Two sets of films were deposited; one set contained pure Al and the other Al–1.0 wt% Cu. The results indicated that texture was strengthened by the formation of a coherent superlattice for the Nb/pure-Al film with the smallest bilayer thickness. By contrast, the texture in Ti/pure-Al films with a similar period was not as strong. The texture also decreased with increasing Λ for both the Ti/pure-Al and Nb/pure-Al films. An increase in the width of the Al (111) peak and an offset of the fiber axis from the substrate normal of 5–8° was observed in the Λ = 333 nm films prepared by using Al–1.0 wt% Cu. The decrease in texture on addition of Cu to Al was attributed primarily to an increase in interlayer roughness as a consequence of reduction in the Al(Cu) grain size. These observations were interpreted in the context of structure zone and dynamic roughness models of film growth.

Nano-Structured TiN/TiBN Multilayer Thin Films

2007 ◽  
Vol 334-335 ◽  
pp. 889-892
Author(s):  
K. Chu ◽  
Yao Gen Shen
Keyword(s):  
Thin Films ◽  
Multilayer Film ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
X Ray ◽  
Significant Relationships ◽  
Transmission Electron

Nano-structured TiN/TiBN multilayer thin films were deposited onto unheated Si(100) substrates by reactive unbalanced dc-magnetron sputtering in an Ar-N2 gas mixture at a pulsed-bias voltage of –60 V. The effects of the bilayer thickness (Λ = 1.8-7.7 nm) on microstructures and mechanical properties have been analyzed using X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), and microindentation measurements. Microstructure studies revealed that the TiN layers were fcc B1-NaCl structure comprising of (111)- and (200)-oriented grains depending on Λ, while the TiBN layers were amorphous. Significant relationships were found between hardness (H) and Λ. A maximum hardness of ~30 GPa was observed in a multilayer film with = 1.8 nm. The possible hardness enhancement mechanism was also discussed.

Microstructure Characterization of Si/C Multilayer Thin Films

2013 ◽  
Vol 743-744 ◽  
pp. 910-914
Author(s):  
Ting Han ◽  
Geng Rong Chang ◽  
Yun Jin Sun ◽  
Fei Ma ◽  
Ke Wei Xu
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Multilayer Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Post Annealing ◽  
Transmission Electron ◽  
Twin Defects ◽  
Modulation Ratio

Si/C multilayer thin films were prepared by magnetron sputtering and post-annealing in N2 atmosphere at 1100 for 1h. X-ray diffraction (XRD), Raman scattering and high-resolution transmission electron microscopy (HRTEM) were applied to study the microstructures of the thin films. For the case of Si/C modulation ratio smaller than 1,interlayer diffusion is evident, which promotes the formation of α-SiC during thermal annealing. If the modulation ratio is larger than 1, the Si sublayers are partially crystallized, and the thicker the Si sublayers are, the crystallinity increases. To be excited, brick-shaped nc-Si is directly observed by HRTEM. The brick-shaped nc-Si appears to be more regular near the Si (100) substrate but with twin defects. The results are instructive in the application of solar cells.

The Ti-B-N System: Nanocomposite nc-TiN/a-(TiB2, BN) and Nano-Multilayer nc-TiN/a-TiBN Thin Films

2008 ◽  
Vol 8 (5) ◽  
pp. 2713-2718
Author(s):  
Y. H. Lu ◽  
K. Chu ◽  
Y. G. Shen
Keyword(s):  
Thin Films ◽  
Dislocation Motion ◽  
Structural Barriers ◽  
Mechanical Behaviors ◽  
Bilayer Thickness ◽  
Maximum Hardness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Grain Sizes ◽  
Transmission Electron

The nanostructures and mechanical properties of nanocomposite nc-TiN/a-(TiB2, BN) and nanostructured multilayers nc-TiN/a-TiBN were investigated using X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), microindentation, and stress measurements. It was found that the monolayer Ti-B-N thin films consisted of nanometer-sized crystalline (nc-) Ti(N, B) embedded into amorphous (a-) (TiB2, BN) matrix. When B content was below ∼16 at.%, two different-sized nanocrystallites with mean grain sizes of ∼3 and 9 nm respectively were embedded in a-TiB2. With increasing B incorporation (>∼27 at.%), more uniform nanograins was embedded a-(TiB2, BN). Incorporation of B not only decreased the size of nanocrystallites, but also gave rise to twinning deformation in nanocrystallites. A maximum hardness of ∼44 GPa was achieved at B content of 19 at.%. It was also found that the nanostructure and mechanical behaviors of nc-TiN/a-TiBN multilayers was dependent on the modulation length (bilayer thickness Λ). Decrease of Λ made the preferred orientation of nc-TiN gradually transform from (200) to (111). A maximum hardness of ∼30 GPa was achieved at Λ = 1.8 nm. Deflection from this Λ value decreased hardness. By contrast, the residual compressive stress value monotonically increased with decrease of Λ. The enhancement of the hardness was due to the coherent stresses and the structural barriers to dislocation motion in the interface.

Residual Stress of Aluminum Thin Films Sputtered on Silicon Wafers Measured by X-Ray Diffraction

1995 ◽  
Vol 39 ◽  
pp. 267-279
Author(s):  
Keisuke Tanaka ◽  
Keisaku Ishihara ◽  
Yoshiaki Akiniwa
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Stress Measurement ◽  
Biaxial Tension ◽  
Film Surface ◽  
Fiber Texture ◽  
Fiber Axis ◽  
X Ray ◽  
Plane Normal ◽  
Out Of Plane

A new method of the X-ray stress measurement was proposed for measuring the residual stress in Al thin films having the [111] fiber texture with the fiber axis perpendicular to the film surface. The strain was measured from Al 222 and 311 diffractions obtained by Cr-Kα radiation. The values of in-plane residual stresses σ11, σ22 and σ12, and out-of-plane normal residual stress, σ33 were determined from the measured strains by using the fundamental formulae derived on the basis of Reuss and Voigt models. The measured residual stress in the thin films was nearly equi-biaxial tension. The magnitude of the tensile residual stress decreased with increasing film thickness.

Correlation of stress state and nanohardness via heat treatment of nickel-aluminide multilayer thin films

2004 ◽  
Vol 19 (11) ◽  
pp. 3374-3381 ◽  
Author(s):  
Evan A. Sperling ◽  
Peter M. Anderson ◽  
Jennifer L. Hay
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Stress State ◽  
Internal Stress ◽  
Biaxial Stress ◽  
Multilayer Thin Films ◽  
Bilayer Thickness ◽  
X Ray Diffraction ◽  
X Ray ◽  
Biaxial Stress State

Heat treatment of γ-Ni(Al)/γ′-Ni3Al multilayer thin films demonstrates that multilayer hardness correlates with the magnitude of biaxial stress in alternating layers. Films with a columnar grain morphology and (001) texture were fabricated over a range of volume fraction and bilayer thickness via direct current magnetron sputtering onto NaCl (001) substrates at 623 K. The films were removed from substrates, heat-treated at either 673 K or 1073 K in argon, and then mounted for nanoindentation and x-ray diffraction. The biaxial stress state in each phase was furnished from x-ray diffraction measurement of (002) interplanar spacings. The 673 K treatment increases the magnitude of alternating biaxial stress state by 70 to 100% and increases hardness by 25 to 100%, depending on bilayer thickness. In contrast, the 1073 K heat treatment decreases the stress magnitude by 70% and decreases hardness by 50%. The results suggest that the yield strength of these thin films is controlled, in part, by the magnitude of internal stress. Further, thermal treatments are demonstrated to be an effective means to manipulate internal stress.

Studies of Interface and Surface Structures of BaTiO3 Thin Films Grown on SrTiO3 (001) Substrates by Mbe

1996 ◽  
Vol 440 ◽  
Author(s):  
Hisashi Shigetani ◽  
Kazuyoshi Kobayashi ◽  
Masayuki Fujimoto ◽  
Wataru Sugimura ◽  
Yoshio Matsui ◽  
...  
Keyword(s):  
Thin Films ◽  
Photoelectron Spectroscopy ◽  
Lattice Distortion ◽  
Film Growth ◽  
High Energy ◽  
Adsorbed Oxygen ◽  
Diffraction Reflection ◽  
Ion Scattering ◽  
X Ray ◽  
Transmission Electron

AbstractWe studied a lattice distortion and relaxation of BaTiO3(BT) thin films grown on SrTiO3 (001) substrates(ST) by a molecular beam epitaxy method using an oxygen radical source RT were prepared by alternately deposition of BaO and TiO2 layers, and the structure of the thin films was evaluated by X-ray diffraction, reflection high energy electron diffraction, transmission electron microscopy, atomic force microscopy, coaxial impact collision ion scattering spectroscopy and X-ray photoelectron spectroscopy The lattice constants of the films varied with distance from the interface of BT and ST It was found that lattice distortion and relaxation of BT On the other hand, the surface analysis indicated that adsorbed oxygen was enriched on the BaO-terminated surface in comparison with the TiO2-terminated surface Then we proposed new mechanism of BT thin film growth with adsorbed oxygen.

scholarly journals Texture Analysis in LD-MOCVD Processed Thin Film Giant Magnetoresistant (LaM)MnO3 Materials

2000 ◽  
Vol 34 (2-3) ◽  
pp. 65-74 ◽  
Author(s):  
H. Garmestani ◽  
X. Dong ◽  
L. Brandao ◽  
K. -H. Dahmen
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Film Growth ◽  
Lattice Mismatch ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
X Ray ◽  
Mismatch Strain ◽  
Pole Figures ◽  
Lattice Mismatch Strain

Thin films of La0.67M0.33MnO3 (M=Sr), LSMO were deposited on three different substrates of LAO, Sapphire, and Y-ZrO2 (YSZ) using metal–organic chemical vapor deposition methods. The effect of texture and orientation on the resistance (0 and 6T) and magnetoresistance (MR) of (LSMO) thin films on various substrates has been investigated. X-ray pole figures were measured using Philips X’Pert X-ray diffractometer equipped with the PopLa analysis package. A direct correlation was observed between the lattice mismatch strain and the structure of the thin film growth. LSMO/LAO seems to be the most perfect system for epitaxial growth due to the negligible lattice-mismatch (∼2%). The dominant orientation changes for the films deposited on LAO [100] and LAO [110] substrates while the transition temperature from ferromagnetic to paramagnetic state of the film on LAO [100] is 50 K higher than that of the film on LAO [100]. The MR data and TMI temperature were measured using standard 4-point resistivity devices and SQUID.

Grain Growth in Al-(Cu, Pd, Nb) Thin Films

1993 ◽  
Vol 309 ◽  
Author(s):  
J.D. Mis ◽  
K.P. Rodbell
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Grain Growth ◽  
Weight Percent ◽  
Size Distributions ◽  
Precipitate Morphology ◽  
X Ray ◽  
Transmission Electron ◽  
Grain Size Distributions

AbstractThe microstructure of 1 μim thick Al films containing 0.5 and 2%Cu (weight percent), 0.3%Pd, and 0.3%Pd-0.3%Nb were investigated by transmission electron microscopy (TEM) and energy dispersive x-ray spectroscopy (EDS) as a function of isochronal and isothermal anneals. The grain size, grain size distribution, and precipitate morphology of these films was measured from 200 to 500ºC, with the activation energy for grain growth (Ea) determined for I h anneals at 200, 300, 400 and 500ºC. Normal grain growth was recorded for the A1Cu films annealed at temperatures ≤400ºC; however secondary grain growth occurred in the AI-2Cu film annealed for I h at 500ºC, with grains as large as 16 μm in diameter observed. Grain growth in the AI-0.3Pd films resulted in strongly bi-modal grain size distributions, with the onset ofsignificant grain growth retarded for I h anneals at temperatures ≤300ºC.The addition of Nb to the AI-0.3Pd film resulted in monomodal grain size distributions over the entire temperature range. The role of crystallographic texture on grain growth in thin films is discussed.

Role of Ag in the Epitaxial Growth of Oxide Thin Films

1997 ◽  
Vol 474 ◽  
Author(s):  
Clinton B. Lee ◽  
D. Kumar ◽  
Rajiv K. Singh ◽  
Derrick Mathis ◽  
Donovan Moxey
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Optical Emission ◽  
X Ray Diffraction ◽  
Additional Source ◽  
X Ray ◽  
Colossal Magnetoresistive ◽  
Emission Studies

ABSTRACTIn this paper, we have reported our investigations related to the growth of high temperature superconducting YBa2Cu3O7-δ (YBCO) and colossal magnetoresistive La0.7MnxO3-δ (LMO) thin films in presence of silver. The films were grown using pulsed laser deposition (PLD) techniques and characterized using x-ray diffraction, scanning electron microscopy, Squid magnetometer. The focus of our work is on the realization of significant improvement in microstructural and physical properties of these films by the addition of a common material (silver) to the films during their in-situ formation. Optical emission studies of plumes emanating from Ag target have been carried out to find the role of Ag acting as additional source of oxygen-supply to oxide lattices during film-growth.

Transmission Electron Microscopy studies of texture of Cr underlayer of magnetic recording hard disk

1991 ◽  
Vol 49 ◽  
pp. 580-581
Author(s):  
L. Tang ◽  
G. Thomas ◽  
M. R. Khan ◽  
S. L. Duan
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Magnetic Recording ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
Substrate Bias ◽  
Epitaxial Relationship ◽  
Transmission Electron

Cr thin films are often used as underlayers for Co alloy magnetic thin films, such as Co1, CoNi2, and CoNiCr3, for high density longitudinal magnetic recording. It is belived that the role of the Cr underlayer is to control the growth and texture of the Co alloy magnetic thin films, and, then, to increase the in plane coercivity of the films. Although many epitaxial relationship between the Cr underlayer and the magnetic films, such as ﹛1010﹜Co/ {110﹜Cr4, ﹛2110﹜Co/ ﹛001﹜Cr5, ﹛0002﹜Co/﹛110﹜Cr6, have been suggested and appear to be related to the Cr thickness, the texture of the Cr underlayer itself is still not understood very well. In this study, the texture of a 2000 Å thick Cr underlayer on Nip/Al substrate for thin films of (Co75Ni25)1-xTix dc-sputtered with - 200 V substrate bias is investigated by electron microscopy.

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