scholarly journals Electronically Pure Single Chirality Semiconducting Single-Walled Carbon Nanotube for Large Scale Electronic Devices

MRS Advances ◽  
2017 ◽  
Vol 2 (02) ◽  
pp. 83-88
Author(s):  
Huaping Li

Abstract Carbon nanotube thin film transistors (TFTs) with characteristics resembling those of TFTs constructed on amorphous silicon, low-temperature polycrystalline silicon and metal oxides were fabricated on (6,5) single chirality single-walled carbon nanotube (SWCNT) thin film deposited from electronically pure semiconducting (6,5) single chirality single-walled carbon nanotube (SWCNT) ink. This ink was extracted in industrial scale from raw SWCNTs produced using high pressure carbon monoxide conversion, and deposited on pretreated substrates to form uniform and consistent (6,5) HiPCO SWCNT thin film using solution process. The (6,5) HiPCO SWCNT thin films were characterized as pure semiconductor without metallic impurities showing classic nonlinear current-bias curves in Schottky-type diodes. Both N-type and P-type (6,5) HiPCO SWCNT TFTs were fabricated with femto Ampere off-current and ION/IOFF ratio of 108 by depositing SiNx and HfO2 dielectrics on the top of (6,5) HiPCO SWCNT thin films, respectively. The (6,5) HiPCO SWCNT inverter with voltage gain of 52 was also demonstrated by wire-bonding one P-type HiPCO SWCNT TFT to one N-type HiPCO SWCNT TFT.

2017 ◽  
Vol 10 (10) ◽  
pp. 2168-2179 ◽  
Author(s):  
Bradley A. MacLeod ◽  
Noah J. Stanton ◽  
Isaac E. Gould ◽  
Devin Wesenberg ◽  
Rachelle Ihly ◽  
...  

Polymer-free semiconducting carbon nanotube networks demonstrate unprecedented equivalent n- and p-type thermoelectric performance.


2010 ◽  
Vol 16 (6) ◽  
pp. 955-959 ◽  
Author(s):  
Hui Cao ◽  
Zhiyin Gan ◽  
Qiang Lv ◽  
Han Yan ◽  
Xiaobin Luo ◽  
...  

RSC Advances ◽  
2017 ◽  
Vol 7 (83) ◽  
pp. 52517-52523 ◽  
Author(s):  
Jun Li ◽  
Chuan-Xin Huang ◽  
Jian-Hua Zhang

Solution-processed semiconducting single-walled carbon nanotube (s-SWCNT) thin film transistors (TFTs) based on different atomic layer deposited AlZrOx insulators are fabricated and characterized.


2011 ◽  
Vol 50 (7) ◽  
pp. 070207 ◽  
Author(s):  
Xun Yi ◽  
Hiroaki Ozawa ◽  
Gou Nakagawa ◽  
Tsuyohiko Fujigaya ◽  
Naotoshi Nakashima ◽  
...  

2018 ◽  
Vol 140 (31) ◽  
pp. 9797-9800 ◽  
Author(s):  
Yongping Liao ◽  
Hua Jiang ◽  
Nan Wei ◽  
Patrik Laiho ◽  
Qiang Zhang ◽  
...  

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